JP1582994S - - Google Patents

Info

Publication number
JP1582994S
JP1582994S JPD2016-26914F JP2016026914F JP1582994S JP 1582994 S JP1582994 S JP 1582994S JP 2016026914 F JP2016026914 F JP 2016026914F JP 1582994 S JP1582994 S JP 1582994S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2016-26914F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2016-26914F priority Critical patent/JP1582994S/ja
Priority to US29/606,998 priority patent/USD839224S1/en
Priority to TW106303210F priority patent/TWD194194S/en
Application granted granted Critical
Publication of JP1582994S publication Critical patent/JP1582994S/ja
Priority to US29/672,852 priority patent/USD913977S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2016-26914F 2016-12-12 2016-12-12 Active JP1582994S (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JPD2016-26914F JP1582994S (en) 2016-12-12 2016-12-12
US29/606,998 USD839224S1 (en) 2016-12-12 2017-06-09 Elastic membrane for semiconductor wafer polishing
TW106303210F TWD194194S (en) 2016-12-12 2017-06-12 Part of the elastic film for semiconductor surface polishing
US29/672,852 USD913977S1 (en) 2016-12-12 2018-12-10 Elastic membrane for semiconductor wafer polishing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2016-26914F JP1582994S (en) 2016-12-12 2016-12-12

Publications (1)

Publication Number Publication Date
JP1582994S true JP1582994S (en) 2018-07-30

Family

ID=62976783

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2016-26914F Active JP1582994S (en) 2016-12-12 2016-12-12

Country Status (2)

Country Link
JP (1) JP1582994S (en)
TW (1) TWD194194S (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD363464S (en) 1992-08-27 1995-10-24 Tokyo Electron Yamanashi Limited Electrode for a semiconductor processing apparatus
USD411516S (en) 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
USD553104S1 (en) 2004-04-21 2007-10-16 Tokyo Electron Limited Absorption board for an electric chuck used in semiconductor manufacture
USD546784S1 (en) 2005-09-29 2007-07-17 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production

Also Published As

Publication number Publication date
TWD194194S (en) 2018-11-21

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