JP1548462S - - Google Patents

Info

Publication number
JP1548462S
JP1548462S JPD2015-19681F JP2015019681F JP1548462S JP 1548462 S JP1548462 S JP 1548462S JP 2015019681 F JP2015019681 F JP 2015019681F JP 1548462 S JP1548462 S JP 1548462S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-19681F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-19681F priority Critical patent/JP1548462S/ja
Priority to TW105300948F priority patent/TWD177637S/en
Priority to US29/556,684 priority patent/USD790490S1/en
Application granted granted Critical
Publication of JP1548462S publication Critical patent/JP1548462S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-19681F 2015-09-04 2015-09-04 Active JP1548462S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-19681F JP1548462S (en) 2015-09-04 2015-09-04
TW105300948F TWD177637S (en) 2015-09-04 2016-02-26 part of reaction tube
US29/556,684 USD790490S1 (en) 2015-09-04 2016-03-02 Reaction tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-19681F JP1548462S (en) 2015-09-04 2015-09-04

Publications (1)

Publication Number Publication Date
JP1548462S true JP1548462S (en) 2016-04-25

Family

ID=55761951

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-19681F Active JP1548462S (en) 2015-09-04 2015-09-04

Country Status (3)

Country Link
US (1) USD790490S1 (en)
JP (1) JP1548462S (en)
TW (1) TWD177637S (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6462161B2 (en) 2016-02-09 2019-01-30 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ Substrate processing apparatus and semiconductor device manufacturing method
JP1582475S (en) * 2016-10-14 2017-07-31
JP1605462S (en) * 2017-08-10 2021-05-31

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR890008922A (en) * 1987-11-21 1989-07-13 후세 노보루 Heat treatment device
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
JP2000243747A (en) * 1999-02-18 2000-09-08 Kokusai Electric Co Ltd Substrate preparing apparatus
JP3985899B2 (en) * 2002-03-28 2007-10-03 株式会社日立国際電気 Substrate processing equipment
JP5157100B2 (en) * 2006-08-04 2013-03-06 東京エレクトロン株式会社 Film forming apparatus and film forming method
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP5096182B2 (en) * 2008-01-31 2012-12-12 東京エレクトロン株式会社 Heat treatment furnace
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP4930438B2 (en) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 Reaction tube and heat treatment equipment
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
TWD167985S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD168774S (en) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 part of reaction tube
TWD167987S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD167986S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
JP1535455S (en) * 2015-02-25 2015-10-19
JP1546345S (en) * 2015-09-04 2016-03-22

Also Published As

Publication number Publication date
TWD177637S (en) 2016-08-11
USD790490S1 (en) 2017-06-27

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