JP1438320S - - Google Patents

Info

Publication number
JP1438320S
JP1438320S JPD2011-21504F JP2011021504F JP1438320S JP 1438320 S JP1438320 S JP 1438320S JP 2011021504 F JP2011021504 F JP 2011021504F JP 1438320 S JP1438320 S JP 1438320S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2011-21504F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2011-21504F priority Critical patent/JP1438320S/ja
Priority to US29/416,088 priority patent/USD694791S1/en
Application granted granted Critical
Publication of JP1438320S publication Critical patent/JP1438320S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2011-21504F 2011-09-20 2011-09-20 Active JP1438320S (enrdf_load_stackoverflow)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JPD2011-21504F JP1438320S (enrdf_load_stackoverflow) 2011-09-20 2011-09-20
US29/416,088 USD694791S1 (en) 2011-09-20 2012-03-19 Baffle plate for manufacturing semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2011-21504F JP1438320S (enrdf_load_stackoverflow) 2011-09-20 2011-09-20

Publications (1)

Publication Number Publication Date
JP1438320S true JP1438320S (enrdf_load_stackoverflow) 2015-04-06

Family

ID=49641239

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2011-21504F Active JP1438320S (enrdf_load_stackoverflow) 2011-09-20 2011-09-20

Country Status (2)

Country Link
US (1) USD694791S1 (enrdf_load_stackoverflow)
JP (1) JP1438320S (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD735786S1 (en) * 2013-07-11 2015-08-04 Sievert Ab Blowtorch
USD873782S1 (en) * 2016-05-17 2020-01-28 Electro Scientific Industries, Inc Component carrier plate
USD826300S1 (en) * 2016-09-30 2018-08-21 Oerlikon Metco Ag, Wohlen Rotably mounted thermal plasma burner for thermalspraying
USD890443S1 (en) * 2017-06-27 2020-07-14 Kimberly Ann Virus Feed bucket lid
JP1648519S (enrdf_load_stackoverflow) * 2018-10-04 2019-12-23
JP1640255S (enrdf_load_stackoverflow) 2018-10-25 2019-09-02
USD937330S1 (en) * 2019-05-21 2021-11-30 Sumitomo Electric Hardmetal Corp. Cutting tool
USD943539S1 (en) * 2020-03-19 2022-02-15 Applied Materials, Inc. Confinement plate for a substrate processing chamber
USD1066275S1 (en) * 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1073758S1 (en) * 2022-10-13 2025-05-06 Lam Research Corporation Baffle for substrate processing system
USD1076837S1 (en) * 2023-01-19 2025-05-27 Lam Research Corporation Baffle

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6889468B2 (en) * 2001-12-28 2005-05-10 3M Innovative Properties Company Modular systems and methods for using sample processing devices
US7479304B2 (en) * 2002-02-14 2009-01-20 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
KR20030090305A (ko) * 2002-05-22 2003-11-28 동경엘렉트론코리아(주) 플라즈마 발생장치의 가스 배기용 배플 플레이트
US20050150452A1 (en) * 2004-01-14 2005-07-14 Soovo Sen Process kit design for deposition chamber
US7754474B2 (en) * 2005-07-05 2010-07-13 3M Innovative Properties Company Sample processing device compression systems and methods
USD557266S1 (en) * 2006-05-02 2007-12-11 Sanford, L.P. Monitor and printer stand
TWD130501S1 (zh) * 2006-12-15 2009-08-21 東京威力科創股份有限公司 電漿處理裝置的加熱平台用遮罩
US20090096349A1 (en) * 2007-04-26 2009-04-16 Moshtagh Vahid S Cross flow cvd reactor
US8291857B2 (en) * 2008-07-03 2012-10-23 Applied Materials, Inc. Apparatuses and methods for atomic layer deposition
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
US20130125818A1 (en) * 2011-11-22 2013-05-23 Intermolecular, Inc. Combinatorial deposition based on a spot apparatus

Also Published As

Publication number Publication date
USD694791S1 (en) 2013-12-03

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