ITTO980747A0 - Procedimento per l'incisione superficialedi vetro in silice, ad esem- pio per la realizzazione di maschere di fase. - Google Patents
Procedimento per l'incisione superficialedi vetro in silice, ad esem- pio per la realizzazione di maschere di fase.Info
- Publication number
- ITTO980747A0 ITTO980747A0 IT98TO000747A ITTO980747A ITTO980747A0 IT TO980747 A0 ITTO980747 A0 IT TO980747A0 IT 98TO000747 A IT98TO000747 A IT 98TO000747A IT TO980747 A ITTO980747 A IT TO980747A IT TO980747 A0 ITTO980747 A0 IT TO980747A0
- Authority
- IT
- Italy
- Prior art keywords
- creation
- procedure
- silica glass
- phase masks
- surface engraving
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Drying Of Semiconductors (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Glass (AREA)
- Weting (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT1998TO000747A IT1303561B1 (it) | 1998-09-04 | 1998-09-04 | Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase. |
CA002281291A CA2281291A1 (en) | 1998-09-04 | 1999-09-02 | A method of surface etching silica glass, for instance for fabricating phase masks |
JP24865399A JP2000155406A (ja) | 1998-09-04 | 1999-09-02 | 位相マスク等を作るための石英ガラスの表面エッチング法 |
EP99117300A EP0984328A3 (en) | 1998-09-04 | 1999-09-02 | A method of surface etching silica glass, for instance for fabricating phase masks |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT1998TO000747A IT1303561B1 (it) | 1998-09-04 | 1998-09-04 | Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase. |
Publications (3)
Publication Number | Publication Date |
---|---|
ITTO980747A0 true ITTO980747A0 (it) | 1998-09-04 |
ITTO980747A1 ITTO980747A1 (it) | 2000-03-04 |
IT1303561B1 IT1303561B1 (it) | 2000-11-14 |
Family
ID=11417016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT1998TO000747A IT1303561B1 (it) | 1998-09-04 | 1998-09-04 | Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase. |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0984328A3 (it) |
JP (1) | JP2000155406A (it) |
CA (1) | CA2281291A1 (it) |
IT (1) | IT1303561B1 (it) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4568445B2 (ja) * | 2001-03-27 | 2010-10-27 | 株式会社アルバック | ドライエッチング法 |
DE102006051550B4 (de) * | 2006-10-30 | 2012-02-02 | Fhr Anlagenbau Gmbh | Verfahren und Vorrichtung zum Strukturieren von Bauteilen unter Verwendung eines Werkstoffs auf der Basis von Siliziumoxid |
CN107015300A (zh) * | 2016-01-28 | 2017-08-04 | 青岛海信宽带多媒体技术有限公司 | 光栅制造方法及光栅 |
CN107290812A (zh) * | 2016-03-31 | 2017-10-24 | 株式会社岛津制作所 | 衍射光栅的制造方法、衍射效率计算方法及衍射光栅 |
RU2649695C1 (ru) * | 2017-06-21 | 2018-04-04 | Акционерное общество "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха" | Способ очистки подложек из ситалла в струе высокочастотной плазмы пониженного давления |
US10732351B2 (en) * | 2018-04-23 | 2020-08-04 | Facebook Technologies, Llc | Gratings with variable depths formed using planarization for waveguide displays |
CN113184800B (zh) * | 2021-04-14 | 2023-11-14 | 北京北方华创微电子装备有限公司 | 微机电系统器件的制造方法及微机电系统器件 |
WO2024004712A1 (ja) * | 2022-06-27 | 2024-01-04 | 日本電気硝子株式会社 | 光学素子の製造方法及び光学素子 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02211450A (ja) * | 1989-02-10 | 1990-08-22 | Fujitsu Ltd | 位相シフトマスクおよびその製造方法 |
JPH04365044A (ja) * | 1991-06-11 | 1992-12-17 | Toppan Printing Co Ltd | 位相シフト用マスクブランクおよび位相シフトマスクの製造方法 |
JPH05114118A (ja) * | 1991-10-23 | 1993-05-07 | Sharp Corp | 薄膜磁気ヘツドの製造方法 |
-
1998
- 1998-09-04 IT IT1998TO000747A patent/IT1303561B1/it active IP Right Grant
-
1999
- 1999-09-02 JP JP24865399A patent/JP2000155406A/ja active Pending
- 1999-09-02 EP EP99117300A patent/EP0984328A3/en not_active Withdrawn
- 1999-09-02 CA CA002281291A patent/CA2281291A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP0984328A3 (en) | 2004-12-29 |
ITTO980747A1 (it) | 2000-03-04 |
IT1303561B1 (it) | 2000-11-14 |
JP2000155406A (ja) | 2000-06-06 |
EP0984328A2 (en) | 2000-03-08 |
CA2281291A1 (en) | 2000-03-04 |
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Legal Events
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0001 | Granted |