IT1303561B1 - Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase. - Google Patents

Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase.

Info

Publication number
IT1303561B1
IT1303561B1 IT1998TO000747A ITTO980747A IT1303561B1 IT 1303561 B1 IT1303561 B1 IT 1303561B1 IT 1998TO000747 A IT1998TO000747 A IT 1998TO000747A IT TO980747 A ITTO980747 A IT TO980747A IT 1303561 B1 IT1303561 B1 IT 1303561B1
Authority
IT
Italy
Prior art keywords
creation
procedure
silica glass
phase masks
surface engraving
Prior art date
Application number
IT1998TO000747A
Other languages
English (en)
Inventor
Marco Ardito
Giancarlo Meneghini
Original Assignee
Cselt Ct Studi E Lab T
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cselt Ct Studi E Lab T filed Critical Cselt Ct Studi E Lab T
Priority to IT1998TO000747A priority Critical patent/IT1303561B1/it
Publication of ITTO980747A0 publication Critical patent/ITTO980747A0/it
Priority to CA002281291A priority patent/CA2281291A1/en
Priority to JP24865399A priority patent/JP2000155406A/ja
Priority to EP99117300A priority patent/EP0984328A3/en
Publication of ITTO980747A1 publication Critical patent/ITTO980747A1/it
Application granted granted Critical
Publication of IT1303561B1 publication Critical patent/IT1303561B1/it

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Drying Of Semiconductors (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Surface Treatment Of Glass (AREA)
  • Weting (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
IT1998TO000747A 1998-09-04 1998-09-04 Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase. IT1303561B1 (it)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IT1998TO000747A IT1303561B1 (it) 1998-09-04 1998-09-04 Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase.
CA002281291A CA2281291A1 (en) 1998-09-04 1999-09-02 A method of surface etching silica glass, for instance for fabricating phase masks
JP24865399A JP2000155406A (ja) 1998-09-04 1999-09-02 位相マスク等を作るための石英ガラスの表面エッチング法
EP99117300A EP0984328A3 (en) 1998-09-04 1999-09-02 A method of surface etching silica glass, for instance for fabricating phase masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT1998TO000747A IT1303561B1 (it) 1998-09-04 1998-09-04 Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase.

Publications (3)

Publication Number Publication Date
ITTO980747A0 ITTO980747A0 (it) 1998-09-04
ITTO980747A1 ITTO980747A1 (it) 2000-03-04
IT1303561B1 true IT1303561B1 (it) 2000-11-14

Family

ID=11417016

Family Applications (1)

Application Number Title Priority Date Filing Date
IT1998TO000747A IT1303561B1 (it) 1998-09-04 1998-09-04 Procedimento per l'incisione superficiale di vetro di silice, adesempio per la realizzazione di maschere di fase.

Country Status (4)

Country Link
EP (1) EP0984328A3 (it)
JP (1) JP2000155406A (it)
CA (1) CA2281291A1 (it)
IT (1) IT1303561B1 (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4568445B2 (ja) * 2001-03-27 2010-10-27 株式会社アルバック ドライエッチング法
DE102006051550B4 (de) * 2006-10-30 2012-02-02 Fhr Anlagenbau Gmbh Verfahren und Vorrichtung zum Strukturieren von Bauteilen unter Verwendung eines Werkstoffs auf der Basis von Siliziumoxid
CN107015300A (zh) * 2016-01-28 2017-08-04 青岛海信宽带多媒体技术有限公司 光栅制造方法及光栅
CN107290812A (zh) * 2016-03-31 2017-10-24 株式会社岛津制作所 衍射光栅的制造方法、衍射效率计算方法及衍射光栅
RU2649695C1 (ru) * 2017-06-21 2018-04-04 Акционерное общество "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха" Способ очистки подложек из ситалла в струе высокочастотной плазмы пониженного давления
US10732351B2 (en) * 2018-04-23 2020-08-04 Facebook Technologies, Llc Gratings with variable depths formed using planarization for waveguide displays
CN113184800B (zh) * 2021-04-14 2023-11-14 北京北方华创微电子装备有限公司 微机电系统器件的制造方法及微机电系统器件
WO2024004712A1 (ja) * 2022-06-27 2024-01-04 日本電気硝子株式会社 光学素子の製造方法及び光学素子

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02211450A (ja) * 1989-02-10 1990-08-22 Fujitsu Ltd 位相シフトマスクおよびその製造方法
JPH04365044A (ja) * 1991-06-11 1992-12-17 Toppan Printing Co Ltd 位相シフト用マスクブランクおよび位相シフトマスクの製造方法
JPH05114118A (ja) * 1991-10-23 1993-05-07 Sharp Corp 薄膜磁気ヘツドの製造方法

Also Published As

Publication number Publication date
ITTO980747A0 (it) 1998-09-04
ITTO980747A1 (it) 2000-03-04
CA2281291A1 (en) 2000-03-04
EP0984328A3 (en) 2004-12-29
JP2000155406A (ja) 2000-06-06
EP0984328A2 (en) 2000-03-08

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Legal Events

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0001 Granted