IT982883B - PHOTOSENSITIVE ELEMENT AND PROCEDURE TO MANUFACTURE NEGATIVE WITH THE WINDOW OPEN - Google Patents

PHOTOSENSITIVE ELEMENT AND PROCEDURE TO MANUFACTURE NEGATIVE WITH THE WINDOW OPEN

Info

Publication number
IT982883B
IT982883B IT4872673A IT4872673A IT982883B IT 982883 B IT982883 B IT 982883B IT 4872673 A IT4872673 A IT 4872673A IT 4872673 A IT4872673 A IT 4872673A IT 982883 B IT982883 B IT 982883B
Authority
IT
Italy
Prior art keywords
procedure
photosensitive element
window open
salt
benzidine
Prior art date
Application number
IT4872673A
Other languages
Italian (it)
Original Assignee
Somar Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2546072A external-priority patent/JPS5027402B2/ja
Priority claimed from JP6655072A external-priority patent/JPS4926003A/ja
Application filed by Somar Mfg filed Critical Somar Mfg
Application granted granted Critical
Publication of IT982883B publication Critical patent/IT982883B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

1424817 Benzidine tetrazonium salt SOMAR MFG CO Ltd 13 March 1973 [13 March 1972 3 July 1972] 12077/73 Heading C2C [Also in Division G2] Benzidine tetrazonium zinc chloride salt is prepared by adding sodium nitrite at - 10‹ C. to a mixture of benzidine and concentrated hydrochloric acid, then adding zinc chloride followed by sodium chloride to precipitate the salt.
IT4872673A 1972-03-13 1973-03-12 PHOTOSENSITIVE ELEMENT AND PROCEDURE TO MANUFACTURE NEGATIVE WITH THE WINDOW OPEN IT982883B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2546072A JPS5027402B2 (en) 1972-03-13 1972-03-13
JP6655072A JPS4926003A (en) 1972-07-03 1972-07-03

Publications (1)

Publication Number Publication Date
IT982883B true IT982883B (en) 1974-10-21

Family

ID=26363077

Family Applications (1)

Application Number Title Priority Date Filing Date
IT4872673A IT982883B (en) 1972-03-13 1973-03-12 PHOTOSENSITIVE ELEMENT AND PROCEDURE TO MANUFACTURE NEGATIVE WITH THE WINDOW OPEN

Country Status (4)

Country Link
CH (1) CH563026A5 (en)
FR (1) FR2175955B1 (en)
GB (1) GB1424817A (en)
IT (1) IT982883B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2721687C2 (en) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Process for covering master copies with masks
FR2406230A1 (en) * 1977-10-11 1979-05-11 Eastman Kodak Co PHOTOSENSITIVE AND PRODUCED COMPOSITION
DE3135804A1 (en) * 1981-09-10 1983-03-24 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE POLYCONDENSATION PRODUCT CONTAINING DIAZONIUM GROUPS AND LIGHT SENSITIVE RECORDING MATERIAL PRODUCED THEREFOR
EP0169492B1 (en) * 1984-07-25 1991-02-06 Hoechst Japan Kabushiki Kaisha Process and material for producing multicolour reproductions
EP0631189B1 (en) * 1993-06-24 1999-02-17 Agfa-Gevaert N.V. Improvement of the storage stability of a diazo-based imaging element for making a printing plate

Also Published As

Publication number Publication date
FR2175955B1 (en) 1976-11-05
CH563026A5 (en) 1975-06-13
GB1424817A (en) 1976-02-11
FR2175955A1 (en) 1973-10-26

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