IT980767B - Procedimento per l attacco chimico del rame e leghe di rame - Google Patents

Procedimento per l attacco chimico del rame e leghe di rame

Info

Publication number
IT980767B
IT980767B IT6797573A IT6797573A IT980767B IT 980767 B IT980767 B IT 980767B IT 6797573 A IT6797573 A IT 6797573A IT 6797573 A IT6797573 A IT 6797573A IT 980767 B IT980767 B IT 980767B
Authority
IT
Italy
Prior art keywords
copper
procedure
chemical attack
alloys
copper alloys
Prior art date
Application number
IT6797573A
Other languages
English (en)
Italian (it)
Original Assignee
Hoellmueller Maschbau H
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoellmueller Maschbau H filed Critical Hoellmueller Maschbau H
Application granted granted Critical
Publication of IT980767B publication Critical patent/IT980767B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/34—Alkaline compositions for etching copper or alloys thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
IT6797573A 1972-04-05 1973-04-05 Procedimento per l attacco chimico del rame e leghe di rame IT980767B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19722216269 DE2216269A1 (de) 1972-04-05 1972-04-05 Verfahren zum aetzen von kupfer und kupferlegierungen

Publications (1)

Publication Number Publication Date
IT980767B true IT980767B (it) 1974-10-10

Family

ID=5841002

Family Applications (1)

Application Number Title Priority Date Filing Date
IT6797573A IT980767B (it) 1972-04-05 1973-04-05 Procedimento per l attacco chimico del rame e leghe di rame

Country Status (4)

Country Link
DE (1) DE2216269A1 (Direct)
FR (1) FR2179267A1 (Direct)
IT (1) IT980767B (Direct)
NL (1) NL7303601A (Direct)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2133806B (en) * 1983-01-20 1986-06-04 Electricity Council Regenerating solutions for etching copper
DE3348401C2 (en) * 1983-02-16 1993-08-26 Siemens Ag, 8000 Muenchen, De Electrolyte regeneration of ammoniacal etching soln.
DE3305319A1 (de) * 1983-02-16 1984-08-16 Siemens AG, 1000 Berlin und 8000 München Elektrolytisches vollregenerierverfahren einer ammoniakalischen aetzloesung
DE3376853D1 (en) * 1983-04-13 1988-07-07 Kernforschungsanlage Juelich Apparatus for regenerating an ammoniacal etching solution
DE3324450A1 (de) * 1983-07-07 1985-01-17 ELO-CHEM Ätztechnik GmbH, 7758 Meersburg Ammoniumsulfathaltige aetzloesung sowie verfahren zur regeneration der aetzloesung
DE3340342A1 (de) * 1983-11-08 1985-05-15 ELO-CHEM Ätztechnik GmbH, 7758 Meersburg Verfahren und anlage zum regenerieren einer ammoniakalischen aetzloesung
US4490224A (en) * 1984-04-16 1984-12-25 Lancy International, Inc. Process for reconditioning a used ammoniacal copper etching solution containing copper solute
US4784785A (en) * 1987-12-29 1988-11-15 Macdermid, Incorporated Copper etchant compositions
US5431776A (en) * 1993-09-08 1995-07-11 Phibro-Tech, Inc. Copper etchant solution additives
DE4339320A1 (de) * 1993-11-18 1995-05-24 Elochem Aetztechnik Gmbh Verfahren zum beschleunigten Ätzen und Abscheiden von Metallen in ammoniakalischen Ätzanlagen
FR2854905B1 (fr) * 2003-05-16 2006-07-14 Airbus France Procede de recuperation du cuivre d'une solution de gravure ammoniacale usee et de regeneration d'un sel d'ammonium
RU2622072C1 (ru) * 2016-01-11 2017-06-09 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Пензенский государственный университет" (ФГБОУ ВПО "Пензенский государственный университет") Способ утилизации отработанного медно-аммиачного раствора
CN118186394B (zh) * 2024-05-16 2024-08-16 苏州高芯众科半导体有限公司 Tf液晶面板刻蚀腔铝板清洁再生的方法

Also Published As

Publication number Publication date
FR2179267A1 (en) 1973-11-16
NL7303601A (Direct) 1973-10-09
DE2216269A1 (de) 1973-10-18
FR2179267B3 (Direct) 1976-03-26

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