IT974681B - Apparato e metodo per la correzio ne di una fotomaschera difettosaici - Google Patents

Apparato e metodo per la correzio ne di una fotomaschera difettosaici

Info

Publication number
IT974681B
IT974681B IT32032/72A IT3203272A IT974681B IT 974681 B IT974681 B IT 974681B IT 32032/72 A IT32032/72 A IT 32032/72A IT 3203272 A IT3203272 A IT 3203272A IT 974681 B IT974681 B IT 974681B
Authority
IT
Italy
Prior art keywords
correction
photo mask
defective photo
defective
mask
Prior art date
Application number
IT32032/72A
Other languages
English (en)
Italian (it)
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Application granted granted Critical
Publication of IT974681B publication Critical patent/IT974681B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT32032/72A 1972-01-03 1972-11-23 Apparato e metodo per la correzio ne di una fotomaschera difettosaici IT974681B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21492172A 1972-01-03 1972-01-03

Publications (1)

Publication Number Publication Date
IT974681B true IT974681B (it) 1974-07-10

Family

ID=22800919

Family Applications (1)

Application Number Title Priority Date Filing Date
IT32032/72A IT974681B (it) 1972-01-03 1972-11-23 Apparato e metodo per la correzio ne di una fotomaschera difettosaici

Country Status (8)

Country Link
US (1) US3748975A (US06168655-20010102-C00055.png)
JP (1) JPS5220231B2 (US06168655-20010102-C00055.png)
BE (1) BE793605A (US06168655-20010102-C00055.png)
CA (1) CA963982A (US06168655-20010102-C00055.png)
DE (1) DE2263856C3 (US06168655-20010102-C00055.png)
GB (1) GB1412995A (US06168655-20010102-C00055.png)
IT (1) IT974681B (US06168655-20010102-C00055.png)
SE (1) SE384745B (US06168655-20010102-C00055.png)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5096184A (US06168655-20010102-C00055.png) * 1973-12-24 1975-07-31
JPS5346597B2 (US06168655-20010102-C00055.png) * 1973-12-27 1978-12-14
JPS5333396B2 (US06168655-20010102-C00055.png) * 1974-02-06 1978-09-13
JPS51948A (en) * 1974-06-21 1976-01-07 Dainippon Printing Co Ltd Hotomasukuno seizohoho
JPS5267986A (en) * 1975-12-04 1977-06-06 Fujitsu Ltd Pattern correction equipment
JPS5423473A (en) * 1977-07-25 1979-02-22 Cho Lsi Gijutsu Kenkyu Kumiai Photomask and method of inspecting mask pattern using same
JPS54123706U (US06168655-20010102-C00055.png) * 1978-02-15 1979-08-29
JPS5527686A (en) * 1978-08-21 1980-02-27 Sony Corp Projection eliminating device
US4200668A (en) * 1978-09-05 1980-04-29 Western Electric Company, Inc. Method of repairing a defective photomask
JPS56128946A (en) * 1980-03-14 1981-10-08 Fujitsu Ltd Photomask correcting method
JPS586127A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd フオトマスク欠陥修正方法とその装置
JPS5757443U (US06168655-20010102-C00055.png) * 1981-07-16 1982-04-05
JPS58173835A (ja) * 1982-04-06 1983-10-12 Fuji Xerox Co Ltd レジストパタ−ンの欠陥修正方法
US4515878A (en) * 1982-08-30 1985-05-07 International Business Machines Corporation Printed circuit board modification process
US4548883A (en) * 1983-05-31 1985-10-22 At&T Bell Laboratories Correction of lithographic masks
US4592975A (en) * 1984-06-20 1986-06-03 Gould Inc. Method for repairing a photomask by laser-induced polymer degradation
JPS61191697U (US06168655-20010102-C00055.png) * 1985-05-20 1986-11-28
EP0203215B1 (de) * 1985-05-29 1990-02-21 Ibm Deutschland Gmbh Verfahren zur Reparatur von Transmissionsmasken
US4835576A (en) * 1986-10-17 1989-05-30 Toyo Ink Mfg. Co., Ltd. Opaquing method and apparatus thereof
JPS6381596U (US06168655-20010102-C00055.png) * 1986-11-17 1988-05-28
JPH05281752A (ja) * 1992-03-31 1993-10-29 Seiko Instr Inc 集束イオンビームによる加工方法
US5443931A (en) * 1992-03-31 1995-08-22 Matsushita Electronics Corporation Photo mask and repair method of the same
US6200737B1 (en) 1995-08-24 2001-03-13 Trustees Of Tufts College Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure
US6165649A (en) * 1997-01-21 2000-12-26 International Business Machines Corporation Methods for repair of photomasks
US5981110A (en) * 1998-02-17 1999-11-09 International Business Machines Corporation Method for repairing photomasks
US7060431B2 (en) * 1998-06-24 2006-06-13 Illumina, Inc. Method of making and decoding of array sensors with microspheres
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
US7035449B2 (en) * 2001-11-16 2006-04-25 Taiwan Semiconductor Manufacturing Co., Ltd Method for applying a defect finder mark to a backend photomask making process
WO2004065000A1 (en) * 2003-01-21 2004-08-05 Illumina Inc. Chemical reaction monitor
US7005219B2 (en) * 2003-05-08 2006-02-28 Taiwan Semiconductor Manufacturing Co., Ltd. Defect repair method employing non-defective pattern overlay and photoexposure
US7097948B2 (en) * 2003-08-29 2006-08-29 Taiwan Semiconductor Manufacturing Co., Ltd. Method for repair of photomasks
FR2863772B1 (fr) * 2003-12-16 2006-05-26 Commissariat Energie Atomique Procede de reparation d'erreurs de motifs realises dans des couches minces
TWI261726B (en) * 2004-04-09 2006-09-11 Allied Integrated Patterning C Acceptable defect positioning and manufacturing method for large-scaled photomask blanks
US7474393B2 (en) * 2004-09-13 2009-01-06 Joel C. Wojciechowski Method and apparatus for determining a vertical intensity profile along an illuminating beam
US7239379B2 (en) * 2004-09-13 2007-07-03 Technology Innovations, Llc Method and apparatus for determining a vertical intensity profile through a plane of focus in a confocal microscope
TWI461838B (zh) * 2010-04-16 2014-11-21 Cowindst Co Ltd 用於修復半色調遮罩之方法及系統
CN113671790B (zh) * 2021-08-13 2022-06-14 深圳市龙图光电有限公司 掩模版缺陷无痕去除方法、装置、设备及其存储介质

Also Published As

Publication number Publication date
US3748975A (en) 1973-07-31
JPS4879978A (US06168655-20010102-C00055.png) 1973-10-26
CA963982A (en) 1975-03-04
DE2263856B2 (de) 1974-09-19
GB1412995A (en) 1975-11-05
DE2263856C3 (de) 1975-05-07
SE384745B (sv) 1976-05-17
DE2263856A1 (de) 1973-07-12
BE793605A (fr) 1973-05-02
JPS5220231B2 (US06168655-20010102-C00055.png) 1977-06-02

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