IT948817B - Procedimento per la diffusione di un impurezza in un corpo semicon duttore - Google Patents

Procedimento per la diffusione di un impurezza in un corpo semicon duttore

Info

Publication number
IT948817B
IT948817B IT67054/72A IT6705472A IT948817B IT 948817 B IT948817 B IT 948817B IT 67054/72 A IT67054/72 A IT 67054/72A IT 6705472 A IT6705472 A IT 6705472A IT 948817 B IT948817 B IT 948817B
Authority
IT
Italy
Prior art keywords
impurity
diffusion
procedure
semicon ductor
ductor body
Prior art date
Application number
IT67054/72A
Other languages
English (en)
Italian (it)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of IT948817B publication Critical patent/IT948817B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10—Reaction chambers; Selection of materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H10P95/00—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S252/00—Compositions
    • Y10S252/95—Doping agent source material
    • Y10S252/951—Doping agent source material for vapor transport

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
IT67054/72A 1971-01-11 1972-01-08 Procedimento per la diffusione di un impurezza in un corpo semicon duttore IT948817B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB119371 1971-01-11

Publications (1)

Publication Number Publication Date
IT948817B true IT948817B (it) 1973-06-11

Family

ID=9717791

Family Applications (1)

Application Number Title Priority Date Filing Date
IT67054/72A IT948817B (it) 1971-01-11 1972-01-08 Procedimento per la diffusione di un impurezza in un corpo semicon duttore

Country Status (5)

Country Link
US (1) US3755017A (show.php)
DE (1) DE2200623A1 (show.php)
FR (1) FR2121734B1 (show.php)
GB (1) GB1332994A (show.php)
IT (1) IT948817B (show.php)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49108969A (show.php) * 1973-02-07 1974-10-16
US4129090A (en) * 1973-02-28 1978-12-12 Hitachi, Ltd. Apparatus for diffusion into semiconductor wafers
JPS49114355A (show.php) * 1973-02-28 1974-10-31
JPS5325634B2 (show.php) * 1973-04-04 1978-07-27
CA1244969A (en) * 1986-10-29 1988-11-15 Mitel Corporation Method for diffusing p-type material using boron disks
JPH0793277B2 (ja) * 1989-02-28 1995-10-09 インダストリアル・テクノロジー・リサーチ・インステイテユート ＩｎＰ基板中へのＣｄ拡散方法
US5033035A (en) * 1989-09-27 1991-07-16 Mondaine Watch Ltd. Watertight watch

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL274819A (show.php) * 1961-02-20 1900-01-01
US3215571A (en) * 1962-10-01 1965-11-02 Bell Telephone Labor Inc Fabrication of semiconductor bodies
US3649388A (en) * 1968-11-04 1972-03-14 Ibm Method for making a semiconductor device having a shallow flat front diffusion layer
US3615944A (en) * 1968-12-13 1971-10-26 Corning Glass Works Method for the continuous doping of semiconductor materials
JPS4915903B1 (show.php) * 1969-08-18 1974-04-18

Also Published As

Publication number Publication date
US3755017A (en) 1973-08-28
FR2121734B1 (show.php) 1976-07-23
DE2200623A1 (de) 1972-07-27
FR2121734A1 (show.php) 1972-08-25
GB1332994A (en) 1973-10-10

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