IT940667B - Procedimento atto ad ottenere per diffusione complementare porte di silicio nei circouiti integrati monolitici allo stato solido - Google Patents

Procedimento atto ad ottenere per diffusione complementare porte di silicio nei circouiti integrati monolitici allo stato solido

Info

Publication number
IT940667B
IT940667B IT31256/71A IT3125671A IT940667B IT 940667 B IT940667 B IT 940667B IT 31256/71 A IT31256/71 A IT 31256/71A IT 3125671 A IT3125671 A IT 3125671A IT 940667 B IT940667 B IT 940667B
Authority
IT
Italy
Prior art keywords
circouits
ports
silicon
procedure
obtaining
Prior art date
Application number
IT31256/71A
Other languages
English (en)
Original Assignee
Itt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Itt filed Critical Itt
Application granted granted Critical
Publication of IT940667B publication Critical patent/IT940667B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8232Field-effect technology
    • H01L21/8234MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
    • H01L21/8238Complementary field-effect transistors, e.g. CMOS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
IT31256/71A 1970-11-28 1971-11-18 Procedimento atto ad ottenere per diffusione complementare porte di silicio nei circouiti integrati monolitici allo stato solido IT940667B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2058660 1970-11-28

Publications (1)

Publication Number Publication Date
IT940667B true IT940667B (it) 1973-02-20

Family

ID=5789394

Family Applications (1)

Application Number Title Priority Date Filing Date
IT31256/71A IT940667B (it) 1970-11-28 1971-11-18 Procedimento atto ad ottenere per diffusione complementare porte di silicio nei circouiti integrati monolitici allo stato solido

Country Status (5)

Country Link
CH (1) CH537643A (it)
DE (1) DE2058660B1 (it)
FR (1) FR2115404B1 (it)
GB (1) GB1308288A (it)
IT (1) IT940667B (it)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3821781A (en) * 1972-11-01 1974-06-28 Ibm Complementary field effect transistors having p doped silicon gates

Also Published As

Publication number Publication date
FR2115404B1 (it) 1975-08-29
CH537643A (de) 1973-05-31
DE2058660B1 (de) 1972-06-08
GB1308288A (en) 1973-02-21
FR2115404A1 (it) 1972-07-07

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