IT8719769A0 - Procedimento per realizzare un componente di forno. - Google Patents
Procedimento per realizzare un componente di forno.Info
- Publication number
- IT8719769A0 IT8719769A0 IT8719769A IT1976987A IT8719769A0 IT 8719769 A0 IT8719769 A0 IT 8719769A0 IT 8719769 A IT8719769 A IT 8719769A IT 1976987 A IT1976987 A IT 1976987A IT 8719769 A0 IT8719769 A0 IT 8719769A0
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- making
- oven component
- oven
- component
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61178800A JPS6335452A (ja) | 1986-07-31 | 1986-07-31 | 半導体拡散炉用構成部材の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8719769A0 true IT8719769A0 (it) | 1987-03-19 |
IT1203839B IT1203839B (it) | 1989-02-23 |
Family
ID=16054866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT19769/87A IT1203839B (it) | 1986-07-31 | 1987-03-19 | Procedimento per realizzare un componente di forno |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS6335452A (it) |
IT (1) | IT1203839B (it) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01282152A (ja) * | 1988-05-06 | 1989-11-14 | Shin Etsu Chem Co Ltd | 炭化珪素質反応管 |
JPH01282153A (ja) * | 1988-05-06 | 1989-11-14 | Shin Etsu Chem Co Ltd | 炭化珪素質反応管 |
JPH0382117A (ja) * | 1989-08-25 | 1991-04-08 | Toshiba Ceramics Co Ltd | 半導体ウエハ処理用治具の製造方法 |
JP3642446B2 (ja) * | 1996-08-01 | 2005-04-27 | 東芝セラミックス株式会社 | 半導体ウエハ処理具 |
US6673198B1 (en) | 1999-12-22 | 2004-01-06 | Lam Research Corporation | Semiconductor processing equipment having improved process drift control |
EP1184355B1 (en) | 2000-02-15 | 2006-12-13 | Toshiba Ceramics Co., Ltd. | METHOD FOR MANUFACTURING Si-SiC MEMBER FOR SEMICONDUCTOR HEAT TREATMENT |
US6890861B1 (en) | 2000-06-30 | 2005-05-10 | Lam Research Corporation | Semiconductor processing equipment having improved particle performance |
US6506254B1 (en) | 2000-06-30 | 2003-01-14 | Lam Research Corporation | Semiconductor processing equipment having improved particle performance |
-
1986
- 1986-07-31 JP JP61178800A patent/JPS6335452A/ja active Granted
-
1987
- 1987-03-19 IT IT19769/87A patent/IT1203839B/it active
Also Published As
Publication number | Publication date |
---|---|
IT1203839B (it) | 1989-02-23 |
JPH0310592B2 (it) | 1991-02-14 |
JPS6335452A (ja) | 1988-02-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970329 |