IT8621019A1 - Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico - Google Patents

Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico

Info

Publication number
IT8621019A1
IT8621019A1 IT1986A21019A IT2101986A IT8621019A1 IT 8621019 A1 IT8621019 A1 IT 8621019A1 IT 1986A21019 A IT1986A21019 A IT 1986A21019A IT 2101986 A IT2101986 A IT 2101986A IT 8621019 A1 IT8621019 A1 IT 8621019A1
Authority
IT
Italy
Prior art keywords
polymer material
surface coverings
coverings based
photoablation process
photoablation
Prior art date
Application number
IT1986A21019A
Other languages
English (en)
Other versions
IT8621019A0 (it
IT1196447B (it
Original Assignee
Montedison Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Montedison Spa filed Critical Montedison Spa
Priority to IT21019/86A priority Critical patent/IT1196447B/it
Publication of IT8621019A0 publication Critical patent/IT8621019A0/it
Priority to CA000540774A priority patent/CA1272377A/en
Priority to US07/067,150 priority patent/US4826755A/en
Priority to JP62159921A priority patent/JPS63100726A/ja
Priority to ES198787109597T priority patent/ES2040227T3/es
Priority to EP87109597A priority patent/EP0253237B1/en
Priority to DE8787109597T priority patent/DE3785396D1/de
Publication of IT8621019A1 publication Critical patent/IT8621019A1/it
Application granted granted Critical
Publication of IT1196447B publication Critical patent/IT1196447B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
IT21019/86A 1986-07-03 1986-07-03 Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico IT1196447B (it)

Priority Applications (7)

Application Number Priority Date Filing Date Title
IT21019/86A IT1196447B (it) 1986-07-03 1986-07-03 Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico
CA000540774A CA1272377A (en) 1986-07-03 1987-06-29 Process on photoetching of superficial coatings based on polymeric materials
US07/067,150 US4826755A (en) 1986-07-03 1987-06-29 Process of photoetching of superficial coatings based on polymeric materials
JP62159921A JPS63100726A (ja) 1986-07-03 1987-06-29 重合体物質を基材とする表面被覆のホトエツチング法
ES198787109597T ES2040227T3 (es) 1986-07-03 1987-07-03 Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos.
EP87109597A EP0253237B1 (en) 1986-07-03 1987-07-03 Process of photoetching of superficial coatings based on polymeric materials
DE8787109597T DE3785396D1 (de) 1986-07-03 1987-07-03 Verfahren zum fotoaetzen von polymerartigen oberflaechenbeschichtungen.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT21019/86A IT1196447B (it) 1986-07-03 1986-07-03 Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico

Publications (3)

Publication Number Publication Date
IT8621019A0 IT8621019A0 (it) 1986-07-03
IT8621019A1 true IT8621019A1 (it) 1988-01-03
IT1196447B IT1196447B (it) 1988-11-16

Family

ID=11175469

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21019/86A IT1196447B (it) 1986-07-03 1986-07-03 Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico

Country Status (7)

Country Link
US (1) US4826755A (it)
EP (1) EP0253237B1 (it)
JP (1) JPS63100726A (it)
CA (1) CA1272377A (it)
DE (1) DE3785396D1 (it)
ES (1) ES2040227T3 (it)
IT (1) IT1196447B (it)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5322986A (en) * 1992-04-06 1994-06-21 Eastman Kodak Company Methods for preparing polymer stripe waveguides and polymer stripe waveguides prepared thereby
US6235541B1 (en) 1997-03-13 2001-05-22 The United States Of America As Represented By The Secretary Of The Navy Patterning antibodies on a surface
US5858801A (en) * 1997-03-13 1999-01-12 The United States Of America As Represented By The Secretary Of The Navy Patterning antibodies on a surface

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3375110A (en) * 1964-12-24 1968-03-26 Union Carbide Corp Photo-masking system using p-xylylene polymers
US3395016A (en) * 1964-12-24 1968-07-30 Union Carbide Corp Photosensitive insulation with p-xylene polymers
JPS5992532A (ja) * 1982-11-18 1984-05-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ポジテイブ型レジストの製造方法
US4414059A (en) * 1982-12-09 1983-11-08 International Business Machines Corporation Far UV patterning of resist materials
JPS6196737A (ja) * 1984-10-17 1986-05-15 Toshiba Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
EP0253237A3 (en) 1989-05-31
ES2040227T3 (es) 1993-10-16
IT8621019A0 (it) 1986-07-03
CA1272377A (en) 1990-08-07
JPS63100726A (ja) 1988-05-02
DE3785396D1 (de) 1993-05-19
EP0253237B1 (en) 1993-04-14
IT1196447B (it) 1988-11-16
US4826755A (en) 1989-05-02
EP0253237A2 (en) 1988-01-20

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19940726