IT1196447B - Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico - Google Patents
Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimericoInfo
- Publication number
- IT1196447B IT1196447B IT21019/86A IT2101986A IT1196447B IT 1196447 B IT1196447 B IT 1196447B IT 21019/86 A IT21019/86 A IT 21019/86A IT 2101986 A IT2101986 A IT 2101986A IT 1196447 B IT1196447 B IT 1196447B
- Authority
- IT
- Italy
- Prior art keywords
- polymeric material
- surface coatings
- coatings based
- photoablation process
- photoablation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT21019/86A IT1196447B (it) | 1986-07-03 | 1986-07-03 | Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico |
US07/067,150 US4826755A (en) | 1986-07-03 | 1987-06-29 | Process of photoetching of superficial coatings based on polymeric materials |
JP62159921A JPS63100726A (ja) | 1986-07-03 | 1987-06-29 | 重合体物質を基材とする表面被覆のホトエツチング法 |
CA000540774A CA1272377A (en) | 1986-07-03 | 1987-06-29 | Process on photoetching of superficial coatings based on polymeric materials |
ES198787109597T ES2040227T3 (es) | 1986-07-03 | 1987-07-03 | Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos. |
EP87109597A EP0253237B1 (en) | 1986-07-03 | 1987-07-03 | Process of photoetching of superficial coatings based on polymeric materials |
DE8787109597T DE3785396D1 (de) | 1986-07-03 | 1987-07-03 | Verfahren zum fotoaetzen von polymerartigen oberflaechenbeschichtungen. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT21019/86A IT1196447B (it) | 1986-07-03 | 1986-07-03 | Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8621019A0 IT8621019A0 (it) | 1986-07-03 |
IT8621019A1 IT8621019A1 (it) | 1988-01-03 |
IT1196447B true IT1196447B (it) | 1988-11-16 |
Family
ID=11175469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT21019/86A IT1196447B (it) | 1986-07-03 | 1986-07-03 | Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico |
Country Status (7)
Country | Link |
---|---|
US (1) | US4826755A (it) |
EP (1) | EP0253237B1 (it) |
JP (1) | JPS63100726A (it) |
CA (1) | CA1272377A (it) |
DE (1) | DE3785396D1 (it) |
ES (1) | ES2040227T3 (it) |
IT (1) | IT1196447B (it) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5322986A (en) * | 1992-04-06 | 1994-06-21 | Eastman Kodak Company | Methods for preparing polymer stripe waveguides and polymer stripe waveguides prepared thereby |
US5858801A (en) * | 1997-03-13 | 1999-01-12 | The United States Of America As Represented By The Secretary Of The Navy | Patterning antibodies on a surface |
US6235541B1 (en) | 1997-03-13 | 2001-05-22 | The United States Of America As Represented By The Secretary Of The Navy | Patterning antibodies on a surface |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3375110A (en) * | 1964-12-24 | 1968-03-26 | Union Carbide Corp | Photo-masking system using p-xylylene polymers |
JPS4321763B1 (it) * | 1964-12-24 | 1968-09-18 | ||
JPS5992532A (ja) * | 1982-11-18 | 1984-05-28 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | ポジテイブ型レジストの製造方法 |
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
JPS6196737A (ja) * | 1984-10-17 | 1986-05-15 | Toshiba Corp | 半導体装置の製造方法 |
-
1986
- 1986-07-03 IT IT21019/86A patent/IT1196447B/it active
-
1987
- 1987-06-29 US US07/067,150 patent/US4826755A/en not_active Expired - Fee Related
- 1987-06-29 JP JP62159921A patent/JPS63100726A/ja active Pending
- 1987-06-29 CA CA000540774A patent/CA1272377A/en not_active Expired - Fee Related
- 1987-07-03 EP EP87109597A patent/EP0253237B1/en not_active Expired - Lifetime
- 1987-07-03 DE DE8787109597T patent/DE3785396D1/de not_active Expired - Lifetime
- 1987-07-03 ES ES198787109597T patent/ES2040227T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0253237A3 (en) | 1989-05-31 |
IT8621019A1 (it) | 1988-01-03 |
EP0253237B1 (en) | 1993-04-14 |
DE3785396D1 (de) | 1993-05-19 |
US4826755A (en) | 1989-05-02 |
CA1272377A (en) | 1990-08-07 |
IT8621019A0 (it) | 1986-07-03 |
JPS63100726A (ja) | 1988-05-02 |
EP0253237A2 (en) | 1988-01-20 |
ES2040227T3 (es) | 1993-10-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19940726 |