ES2040227T3 - Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos. - Google Patents
Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos.Info
- Publication number
- ES2040227T3 ES2040227T3 ES198787109597T ES87109597T ES2040227T3 ES 2040227 T3 ES2040227 T3 ES 2040227T3 ES 198787109597 T ES198787109597 T ES 198787109597T ES 87109597 T ES87109597 T ES 87109597T ES 2040227 T3 ES2040227 T3 ES 2040227T3
- Authority
- ES
- Spain
- Prior art keywords
- surface coatings
- coatings based
- polymeric materials
- photo engraving
- engraving procedure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
EL PROCESO DE FOTOATAQUE AL ACIDO DE REVESTIMIENTOS SUPERFICIALES BASADO EN MATERIAL POLIMERICO, COMPRENDE LA IRRADIACCION DE LA SUPERFICIE REVESTIDA, CON PROTECTOR LOCALIZADA POR RAYOS LASER, CON LONGITUDES DE ONDA IGUALES O INFERIORES A 193 NM.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT21019/86A IT1196447B (it) | 1986-07-03 | 1986-07-03 | Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2040227T3 true ES2040227T3 (es) | 1993-10-16 |
Family
ID=11175469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES198787109597T Expired - Lifetime ES2040227T3 (es) | 1986-07-03 | 1987-07-03 | Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos. |
Country Status (7)
Country | Link |
---|---|
US (1) | US4826755A (es) |
EP (1) | EP0253237B1 (es) |
JP (1) | JPS63100726A (es) |
CA (1) | CA1272377A (es) |
DE (1) | DE3785396D1 (es) |
ES (1) | ES2040227T3 (es) |
IT (1) | IT1196447B (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5322986A (en) * | 1992-04-06 | 1994-06-21 | Eastman Kodak Company | Methods for preparing polymer stripe waveguides and polymer stripe waveguides prepared thereby |
US5858801A (en) * | 1997-03-13 | 1999-01-12 | The United States Of America As Represented By The Secretary Of The Navy | Patterning antibodies on a surface |
US6235541B1 (en) | 1997-03-13 | 2001-05-22 | The United States Of America As Represented By The Secretary Of The Navy | Patterning antibodies on a surface |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3375110A (en) * | 1964-12-24 | 1968-03-26 | Union Carbide Corp | Photo-masking system using p-xylylene polymers |
US3395016A (en) * | 1964-12-24 | 1968-07-30 | Union Carbide Corp | Photosensitive insulation with p-xylene polymers |
JPS5992532A (ja) * | 1982-11-18 | 1984-05-28 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | ポジテイブ型レジストの製造方法 |
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
JPS6196737A (ja) * | 1984-10-17 | 1986-05-15 | Toshiba Corp | 半導体装置の製造方法 |
-
1986
- 1986-07-03 IT IT21019/86A patent/IT1196447B/it active
-
1987
- 1987-06-29 CA CA000540774A patent/CA1272377A/en not_active Expired - Fee Related
- 1987-06-29 US US07/067,150 patent/US4826755A/en not_active Expired - Fee Related
- 1987-06-29 JP JP62159921A patent/JPS63100726A/ja active Pending
- 1987-07-03 EP EP87109597A patent/EP0253237B1/en not_active Expired - Lifetime
- 1987-07-03 DE DE8787109597T patent/DE3785396D1/de not_active Expired - Lifetime
- 1987-07-03 ES ES198787109597T patent/ES2040227T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
IT8621019A0 (it) | 1986-07-03 |
IT8621019A1 (it) | 1988-01-03 |
JPS63100726A (ja) | 1988-05-02 |
CA1272377A (en) | 1990-08-07 |
IT1196447B (it) | 1988-11-16 |
EP0253237A3 (en) | 1989-05-31 |
US4826755A (en) | 1989-05-02 |
DE3785396D1 (de) | 1993-05-19 |
EP0253237B1 (en) | 1993-04-14 |
EP0253237A2 (en) | 1988-01-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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