IT8620958A0 - DEVICE FOR TREATMENT OF PARTS WITH AN EVACUABLE CHAMBER. - Google Patents
DEVICE FOR TREATMENT OF PARTS WITH AN EVACUABLE CHAMBER.Info
- Publication number
- IT8620958A0 IT8620958A0 IT8620958A IT2095886A IT8620958A0 IT 8620958 A0 IT8620958 A0 IT 8620958A0 IT 8620958 A IT8620958 A IT 8620958A IT 2095886 A IT2095886 A IT 2095886A IT 8620958 A0 IT8620958 A0 IT 8620958A0
- Authority
- IT
- Italy
- Prior art keywords
- treatment
- parts
- evacuable chamber
- evacuable
- chamber
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
- Furnace Details (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH280685 | 1985-07-01 |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8620958A0 true IT8620958A0 (en) | 1986-06-27 |
IT8620958A1 IT8620958A1 (en) | 1987-12-27 |
IT1190648B IT1190648B (en) | 1988-02-16 |
Family
ID=4242008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT20958/86A IT1190648B (en) | 1985-07-01 | 1986-06-27 | DEVICE FOR THE TREATMENT OF PIECES WITH EVACUABLE ROOM |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS624876A (en) |
DE (1) | DE3614398A1 (en) |
ES (1) | ES8703938A1 (en) |
FR (1) | FR2584099A1 (en) |
GB (1) | GB2178228A (en) |
IT (1) | IT1190648B (en) |
SE (1) | SE8602907L (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4029270C1 (en) * | 1990-09-14 | 1992-04-09 | Balzers Ag, Balzers, Li | |
DE4029268C2 (en) * | 1990-09-14 | 1995-07-06 | Balzers Hochvakuum | Process for DC voltage-assisted, reactive treatment of material and vacuum treatment system for implementation |
JPH04326725A (en) * | 1991-04-26 | 1992-11-16 | Tokyo Electron Ltd | Plasma apparatus |
CH687111A5 (en) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method. |
US5868878A (en) * | 1993-08-27 | 1999-02-09 | Hughes Electronics Corporation | Heat treatment by plasma electron heating and solid/gas jet cooling |
DE19750909C1 (en) * | 1997-11-17 | 1999-04-15 | Bosch Gmbh Robert | Rotating unit for plasma immersion aided treatment of substrates |
DE10149588B4 (en) | 2001-10-08 | 2017-09-07 | Oerlikon Trading Ag, Trübbach | Process for diamond coating of substrates |
ES2344981B1 (en) * | 2010-03-01 | 2011-05-06 | Asociacion De La Industria Navarra (Ain) | PROCEDURE FOR THE NITRURATION OF METAL ALLOYS AND DEVICE TO CARRY OUT THIS PROCEDURE. |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT364899A (en) * | 1937-08-27 | |||
CH310968A (en) * | 1953-02-17 | 1955-11-15 | Berghaus Elektrophysik Anst | Process for the thermal, metallurgical or chemical treatment of metallic objects by means of electrical glow discharges |
BE569243A (en) * | 1953-12-09 | |||
DE1204047B (en) * | 1957-04-10 | 1965-10-28 | Berghaus Elektrophysik Anst | Process for the diffusion treatment of bodies |
FR2403645A2 (en) * | 1977-09-14 | 1979-04-13 | Vide & Traitement Sa | Furnace for thermochemical metal treatment - ensures ion bombardment by anodes and cathodes without arc discharge |
DE2811942C2 (en) * | 1977-03-23 | 1986-09-18 | Vide et Traitement S.A., Neuilly-en-Thelle | Furnace for the ionic nitriding treatment of metallic workpieces |
FR2385290A1 (en) * | 1977-03-23 | 1978-10-20 | Vide & Traitement Sa | Furnace for thermochemical metal treatment - ensures ion bombardment by anodes and cathodes without arc discharge |
JPS5576057A (en) * | 1978-11-30 | 1980-06-07 | Nippon Denshi Kogyo Kk | Ion treating apparatus |
JPS5798669A (en) * | 1980-12-08 | 1982-06-18 | Nippon Denshi Kogyo Kk | Glow discharge heat treatment processor |
US4664890A (en) * | 1984-06-22 | 1987-05-12 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Glow-discharge decomposition apparatus |
-
1986
- 1986-04-28 DE DE19863614398 patent/DE3614398A1/en not_active Withdrawn
- 1986-05-13 ES ES554903A patent/ES8703938A1/en not_active Expired
- 1986-06-19 FR FR8608853A patent/FR2584099A1/en active Pending
- 1986-06-26 GB GB08615590A patent/GB2178228A/en not_active Withdrawn
- 1986-06-27 IT IT20958/86A patent/IT1190648B/en active
- 1986-06-30 JP JP61151843A patent/JPS624876A/en active Pending
- 1986-06-30 SE SE8602907A patent/SE8602907L/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
SE8602907D0 (en) | 1986-06-30 |
GB2178228A (en) | 1987-02-04 |
DE3614398A1 (en) | 1987-01-08 |
GB8615590D0 (en) | 1986-07-30 |
ES554903A0 (en) | 1987-03-01 |
IT8620958A1 (en) | 1987-12-27 |
JPS624876A (en) | 1987-01-10 |
ES8703938A1 (en) | 1987-03-01 |
FR2584099A1 (en) | 1987-01-02 |
IT1190648B (en) | 1988-02-16 |
SE8602907L (en) | 1987-01-02 |
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