IT7869937A0 - Dispositivo semiconduttore utilizzante celle di memoria con zone di immagazzinamento della carica nella parete laterale - Google Patents

Dispositivo semiconduttore utilizzante celle di memoria con zone di immagazzinamento della carica nella parete laterale

Info

Publication number
IT7869937A0
IT7869937A0 IT7869937A IT6993778A IT7869937A0 IT 7869937 A0 IT7869937 A0 IT 7869937A0 IT 7869937 A IT7869937 A IT 7869937A IT 6993778 A IT6993778 A IT 6993778A IT 7869937 A0 IT7869937 A0 IT 7869937A0
Authority
IT
Italy
Prior art keywords
side wall
semiconductor device
memory cells
charge storage
storage areas
Prior art date
Application number
IT7869937A
Other languages
English (en)
Original Assignee
American Micro Syst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Micro Syst filed Critical American Micro Syst
Publication of IT7869937A0 publication Critical patent/IT7869937A0/it

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/35Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices with charge storage in a depletion layer, e.g. charge coupled devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/34DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the transistor being at least partially in a trench in the substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
IT7869937A 1977-12-27 1978-12-22 Dispositivo semiconduttore utilizzante celle di memoria con zone di immagazzinamento della carica nella parete laterale IT7869937A0 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US86453677A 1977-12-27 1977-12-27

Publications (1)

Publication Number Publication Date
IT7869937A0 true IT7869937A0 (it) 1978-12-22

Family

ID=25343489

Family Applications (1)

Application Number Title Priority Date Filing Date
IT7869937A IT7869937A0 (it) 1977-12-27 1978-12-22 Dispositivo semiconduttore utilizzante celle di memoria con zone di immagazzinamento della carica nella parete laterale

Country Status (7)

Country Link
JP (1) JPS5492077A (it)
CA (1) CA1118892A (it)
DE (1) DE2842334A1 (it)
FR (1) FR2413789A1 (it)
GB (1) GB2011175B (it)
IT (1) IT7869937A0 (it)
NL (1) NL7808079A (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2909820A1 (de) * 1979-03-13 1980-09-18 Siemens Ag Halbleiterspeicher mit eintransistorzellen in v-mos-technologie
US4252579A (en) * 1979-05-07 1981-02-24 International Business Machines Corporation Method for making single electrode U-MOSFET random access memory utilizing reactive ion etching and polycrystalline deposition
US4335450A (en) * 1980-01-30 1982-06-15 International Business Machines Corporation Non-destructive read out field effect transistor memory cell system
US4423490A (en) * 1980-10-27 1983-12-27 Burroughs Corporation JFET Dynamic memory
JPS6135554A (ja) * 1984-07-28 1986-02-20 Nippon Telegr & Teleph Corp <Ntt> 読出し専用メモリ−およびその製造方法
US4987090A (en) * 1987-07-02 1991-01-22 Integrated Device Technology, Inc. Static ram cell with trench pull-down transistors and buried-layer ground plate
US4997783A (en) * 1987-07-02 1991-03-05 Integrated Device Technology, Inc. Static ram cell with trench pull-down transistors and buried-layer ground plate
US6963108B1 (en) * 2003-10-10 2005-11-08 Advanced Micro Devices, Inc. Recessed channel

Also Published As

Publication number Publication date
DE2842334A1 (de) 1979-07-05
GB2011175B (en) 1982-02-10
JPS5492077A (en) 1979-07-20
FR2413789A1 (fr) 1979-07-27
CA1118892A (en) 1982-02-23
NL7808079A (nl) 1979-06-29
GB2011175A (en) 1979-07-04

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