IT7826105A0 - Laser guida d'onda. - Google Patents
Laser guida d'onda.Info
- Publication number
- IT7826105A0 IT7826105A0 IT7826105A IT2610578A IT7826105A0 IT 7826105 A0 IT7826105 A0 IT 7826105A0 IT 7826105 A IT7826105 A IT 7826105A IT 2610578 A IT2610578 A IT 2610578A IT 7826105 A0 IT7826105 A0 IT 7826105A0
- Authority
- IT
- Italy
- Prior art keywords
- wave guide
- laser wave
- laser
- guide
- wave
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/50—Machine tool, machine tool null till machine tool work handling
- G05B2219/50018—Zero point floating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
- H01S5/2235—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface with a protrusion
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/824,690 US4166253A (en) | 1977-08-15 | 1977-08-15 | Heterostructure diode injection laser having a constricted active region |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IT7826105A0 true IT7826105A0 (it) | 1978-07-26 |
| IT1112289B IT1112289B (it) | 1986-01-13 |
Family
ID=25242087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT26105/78A IT1112289B (it) | 1977-08-15 | 1978-07-26 | Laser guida d'onda |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4166253A (it) |
| JP (1) | JPS5432284A (it) |
| CA (1) | CA1096962A (it) |
| DE (1) | DE2834922C2 (it) |
| FR (1) | FR2400784A1 (it) |
| GB (1) | GB1587008A (it) |
| IT (1) | IT1112289B (it) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4215319A (en) * | 1979-01-17 | 1980-07-29 | Rca Corporation | Single filament semiconductor laser |
| US4249142A (en) * | 1978-11-30 | 1981-02-03 | Xerox Corporation | Enhancement of lowest order mode operation in nonplanar DH injection lasers |
| JPS55158691A (en) * | 1979-05-30 | 1980-12-10 | Sumitomo Electric Ind Ltd | Semiconductor light emitting device manufacture thereof |
| US4317085A (en) * | 1979-09-12 | 1982-02-23 | Xerox Corporation | Channeled mesa laser |
| US4347486A (en) * | 1979-10-12 | 1982-08-31 | Rca Corporation | Single filament semiconductor laser with large emitting area |
| GB2062949B (en) * | 1979-10-12 | 1983-08-10 | Rca Corp | Single filament semiconductor laser with large emitting area |
| JPS5674983A (en) * | 1979-11-26 | 1981-06-20 | Nec Corp | Semiconductor laser |
| US4329189A (en) * | 1980-02-04 | 1982-05-11 | Northern Telecom Limited | Channelled substrate double heterostructure lasers |
| US4323859A (en) * | 1980-02-04 | 1982-04-06 | Northern Telecom Limited | Chanelled substrate double heterostructure lasers |
| US4429397A (en) | 1980-06-26 | 1984-01-31 | Nippon Electric Co., Ltd. | Buried heterostructure laser diode |
| GB2129211B (en) * | 1982-10-21 | 1987-01-14 | Rca Corp | Semiconductor laser and a method of making same |
| JPH0732278B2 (ja) * | 1982-10-27 | 1995-04-10 | アールシーエー コーポレーシヨン | 半導体レーザ |
| US4623427A (en) * | 1983-08-12 | 1986-11-18 | Hewlett-Packard Company | Means and method for a self-aligned multilayer laser epitaxy structure device |
| DE3484266D1 (de) * | 1983-11-30 | 1991-04-18 | Sharp Kk | Halbleiterlaser-vorrichtung und verfahren zu deren herstellung. |
| JPS61135184A (ja) * | 1984-12-05 | 1986-06-23 | Sharp Corp | 半導体レ−ザ装置 |
| US5087587A (en) * | 1986-02-13 | 1992-02-11 | Sharp Kabushiki Kaisha | Epitaxial growth process for the production of a window semiconductor laser |
| DE102011075502A1 (de) * | 2011-05-09 | 2012-11-15 | Forschungsverbund Berlin E.V. | Breitstreifen-Diodenlaser mit hoher Effizienz und geringer Fernfelddivergenz |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3859178A (en) * | 1974-01-17 | 1975-01-07 | Bell Telephone Labor Inc | Multiple anodization scheme for producing gaas layers of nonuniform thickness |
| US3883821A (en) * | 1974-01-17 | 1975-05-13 | Bell Telephone Labor Inc | Single transverse mode operation in double heterostructure junction lasers having an active layer of nonuniform thickness |
| GB1531238A (en) * | 1975-01-09 | 1978-11-08 | Standard Telephones Cables Ltd | Injection lasers |
| US3978428A (en) * | 1975-06-23 | 1976-08-31 | Xerox Corporation | Buried-heterostructure diode injection laser |
| GB1530323A (en) * | 1975-12-22 | 1978-10-25 | Standard Telephones Cables Ltd | Semiconductor waveguide structures |
| JPS52127085A (en) * | 1976-04-16 | 1977-10-25 | Hitachi Ltd | Semiconductor laser |
-
1977
- 1977-08-15 US US05/824,690 patent/US4166253A/en not_active Expired - Lifetime
-
1978
- 1978-05-10 GB GB18837/78A patent/GB1587008A/en not_active Expired
- 1978-06-14 CA CA305,456A patent/CA1096962A/en not_active Expired
- 1978-07-05 FR FR7820730A patent/FR2400784A1/fr active Granted
- 1978-07-25 JP JP9006478A patent/JPS5432284A/ja active Granted
- 1978-07-26 IT IT26105/78A patent/IT1112289B/it active
- 1978-08-09 DE DE2834922A patent/DE2834922C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5711516B2 (it) | 1982-03-04 |
| FR2400784A1 (fr) | 1979-03-16 |
| US4166253A (en) | 1979-08-28 |
| DE2834922A1 (de) | 1979-03-01 |
| CA1096962A (en) | 1981-03-03 |
| FR2400784B1 (it) | 1980-03-14 |
| IT1112289B (it) | 1986-01-13 |
| GB1587008A (en) | 1981-03-25 |
| DE2834922C2 (de) | 1984-07-19 |
| JPS5432284A (en) | 1979-03-09 |
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