IT1256798B - Optical exposure system for processing a substrate by means of excimer laser - Google Patents

Optical exposure system for processing a substrate by means of excimer laser

Info

Publication number
IT1256798B
IT1256798B ITTO920077A ITTO920077A IT1256798B IT 1256798 B IT1256798 B IT 1256798B IT TO920077 A ITTO920077 A IT TO920077A IT TO920077 A ITTO920077 A IT TO920077A IT 1256798 B IT1256798 B IT 1256798B
Authority
IT
Italy
Prior art keywords
substrate
optical
processing
excimer laser
exposure system
Prior art date
Application number
ITTO920077A
Other languages
Italian (it)
Inventor
Bello Umberto Del
Original Assignee
Istituto Per Le Ricerche Di Te
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Istituto Per Le Ricerche Di Te filed Critical Istituto Per Le Ricerche Di Te
Priority to ITTO920077A priority Critical patent/IT1256798B/en
Publication of ITTO920077A0 publication Critical patent/ITTO920077A0/en
Publication of ITTO920077A1 publication Critical patent/ITTO920077A1/en
Application granted granted Critical
Publication of IT1256798B publication Critical patent/IT1256798B/en

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Optical exposure system 1 for processing of a substrate 2 by means of excimer laser, comprising a mask 4 able to be arranged on an optical axis A of propagation of a laser beam and provided with at least one window 5 having a predetermined shape, and an optical group 6 for projecting said shape onto the substrate 2; the optical group 6 comprises at least one converging lens 11 and one diverging lens 12, having respectively lesser and greater focal length; the lenses 11, 12 are placed at a respective distance s1, s2' from the mask 4 and from the substrate 2 and at a relative distance d such as to produce a predetermined magnification, appropriately less than 1, and to introduce distortions by spherical aberration essentially equal yet opposite, and therefore the optical group 6 has an essentially zero spherical aberration. <IMAGE>
ITTO920077A 1992-01-31 1992-01-31 Optical exposure system for processing a substrate by means of excimer laser IT1256798B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ITTO920077A IT1256798B (en) 1992-01-31 1992-01-31 Optical exposure system for processing a substrate by means of excimer laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITTO920077A IT1256798B (en) 1992-01-31 1992-01-31 Optical exposure system for processing a substrate by means of excimer laser

Publications (3)

Publication Number Publication Date
ITTO920077A0 ITTO920077A0 (en) 1992-01-31
ITTO920077A1 ITTO920077A1 (en) 1993-07-31
IT1256798B true IT1256798B (en) 1995-12-15

Family

ID=11409984

Family Applications (1)

Application Number Title Priority Date Filing Date
ITTO920077A IT1256798B (en) 1992-01-31 1992-01-31 Optical exposure system for processing a substrate by means of excimer laser

Country Status (1)

Country Link
IT (1) IT1256798B (en)

Also Published As

Publication number Publication date
ITTO920077A1 (en) 1993-07-31
ITTO920077A0 (en) 1992-01-31

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19980129