IT1191977B - Tecnica per allineare con fotolitografia convenzionale una struttura sul retro di un campione con alta precisione di registrazione - Google Patents

Tecnica per allineare con fotolitografia convenzionale una struttura sul retro di un campione con alta precisione di registrazione

Info

Publication number
IT1191977B
IT1191977B IT48205/86A IT4820586A IT1191977B IT 1191977 B IT1191977 B IT 1191977B IT 48205/86 A IT48205/86 A IT 48205/86A IT 4820586 A IT4820586 A IT 4820586A IT 1191977 B IT1191977 B IT 1191977B
Authority
IT
Italy
Prior art keywords
align
sample
technique
high recording
conventional photolithography
Prior art date
Application number
IT48205/86A
Other languages
English (en)
Other versions
IT8648205A0 (it
Inventor
Antonio Cetronio
Bona Maurizio Di
Sergio Moretti
Original Assignee
Selenia Ind Elettroniche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Selenia Ind Elettroniche filed Critical Selenia Ind Elettroniche
Priority to IT48205/86A priority Critical patent/IT1191977B/it
Publication of IT8648205A0 publication Critical patent/IT8648205A0/it
Priority to EP87830241A priority patent/EP0252029A3/en
Priority to US07/068,645 priority patent/US4818724A/en
Application granted granted Critical
Publication of IT1191977B publication Critical patent/IT1191977B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/1015—Shape
    • H01L2924/10155—Shape being other than a cuboid
    • H01L2924/10158—Shape being other than a cuboid at the passive surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/102—Material of the semiconductor or solid state bodies
    • H01L2924/1025—Semiconducting materials
    • H01L2924/1026—Compound semiconductors
    • H01L2924/1032—III-V
    • H01L2924/10329—Gallium arsenide [GaAs]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/102—Mask alignment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/928—Front and rear surface processing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/977—Thinning or removal of substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
IT48205/86A 1986-06-30 1986-06-30 Tecnica per allineare con fotolitografia convenzionale una struttura sul retro di un campione con alta precisione di registrazione IT1191977B (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT48205/86A IT1191977B (it) 1986-06-30 1986-06-30 Tecnica per allineare con fotolitografia convenzionale una struttura sul retro di un campione con alta precisione di registrazione
EP87830241A EP0252029A3 (en) 1986-06-30 1987-06-26 Technique for the alignment through conventional photolithography of a structure on the back of a sample with high recording accuracy
US07/068,645 US4818724A (en) 1986-06-30 1987-06-30 Photolithographic method of aligning a structure on the back of a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT48205/86A IT1191977B (it) 1986-06-30 1986-06-30 Tecnica per allineare con fotolitografia convenzionale una struttura sul retro di un campione con alta precisione di registrazione

Publications (2)

Publication Number Publication Date
IT8648205A0 IT8648205A0 (it) 1986-06-30
IT1191977B true IT1191977B (it) 1988-03-31

Family

ID=11265212

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48205/86A IT1191977B (it) 1986-06-30 1986-06-30 Tecnica per allineare con fotolitografia convenzionale una struttura sul retro di un campione con alta precisione di registrazione

Country Status (3)

Country Link
US (1) US4818724A (it)
EP (1) EP0252029A3 (it)
IT (1) IT1191977B (it)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4970578A (en) * 1987-05-01 1990-11-13 Raytheon Company Selective backside plating of GaAs monolithic microwave integrated circuits
JPH023938A (ja) * 1988-06-20 1990-01-09 Mitsubishi Electric Corp 電界効果トランジスタ
JPH0267731A (ja) * 1988-09-02 1990-03-07 Toshiba Corp はんだバンプ形半導体装置とその製造方法
US5139968A (en) * 1989-03-03 1992-08-18 Mitsubishi Denki Kabushiki Kaisha Method of producing a t-shaped gate electrode
FR2684801B1 (fr) * 1991-12-06 1997-01-24 Picogiga Sa Procede de realisation de composants semiconducteurs, notamment sur gaas ou inp, avec recuperation du substrat par voie chimique.
US5819394A (en) * 1995-02-22 1998-10-13 Transition Automation, Inc. Method of making board matched nested support fixture
DE19509231C2 (de) * 1995-03-17 2000-02-17 Ibm Verfahren zum Aufbringen einer Metallisierung auf einem Isolator und zum Öffnen von Durchgangslöchern in diesem
JP4465745B2 (ja) * 1999-07-23 2010-05-19 ソニー株式会社 半導体積層基板，半導体結晶基板および半導体素子ならびにそれらの製造方法
EP1469355B1 (en) * 2002-12-20 2008-08-20 ASML Netherlands B.V. Device manufacturing method
SG121844A1 (en) * 2002-12-20 2006-05-26 Asml Netherlands Bv Device manufacturing method
US7381953B1 (en) * 2003-07-25 2008-06-03 Public Service Solutions, Inc. Infrared imaging device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1933731C3 (de) * 1968-07-05 1982-03-25 Honeywell Information Systems Italia S.p.A., Caluso, Torino Verfahren zum Herstellen einer integrierten Halbleiterschaltung
US3588347A (en) * 1969-03-13 1971-06-28 Western Electric Co Method and apparatus for aligning a mask and a substrate using infrared radiation
US3986196A (en) * 1975-06-30 1976-10-12 Varian Associates Through-substrate source contact for microwave FET
US3984680A (en) * 1975-10-14 1976-10-05 Massachusetts Institute Of Technology Soft X-ray mask alignment system
US4104099A (en) * 1977-01-27 1978-08-01 International Telephone And Telegraph Corporation Method and apparatus for lapping or polishing materials
JPS54379A (en) * 1977-05-31 1979-01-05 Tsubakimoto Chain Co Storage conveyor
US4309813A (en) * 1979-12-26 1982-01-12 Harris Corporation Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits
WO1981002948A1 (en) * 1980-04-10 1981-10-15 Massachusetts Inst Technology Methods of producing sheets of crystalline material and devices made therefrom
US4374915A (en) * 1981-07-30 1983-02-22 Intel Corporation High contrast alignment marker for integrated circuit fabrication
US4348253A (en) * 1981-11-12 1982-09-07 Rca Corporation Method for fabricating via holes in a semiconductor wafer
JPS60565A (ja) * 1983-06-15 1985-01-05 Mitsubishi Electric Corp 分散形デ−タ処理システム
US4669175A (en) * 1985-12-02 1987-06-02 Honeywell Inc. Front-to-back alignment procedure for Burrus LED's

Also Published As

Publication number Publication date
IT8648205A0 (it) 1986-06-30
US4818724A (en) 1989-04-04
EP0252029A2 (en) 1988-01-07
EP0252029A3 (en) 1988-12-14

Similar Documents

Publication Publication Date Title
DE3671983D1 (de) Optische anordnung.
IT1204933B (it) Trasduttore ottico
IT1191977B (it) Tecnica per allineare con fotolitografia convenzionale una struttura sul retro di un campione con alta precisione di registrazione
DE3686080D1 (de) Optische koepfe.
DE3679416D1 (de) Anordnung zur positionierung einer in einer kassette untergebrachten aufnahmeplatte.
DE3686081T2 (de) Optische aufnahmeplatte.
DE3677649D1 (de) Optische messanordnung.
IT1199683B (it) Trasduttore ottico
FR2579773B1 (fr) Duplexeur optique miniaturise a point optique deconnectable
IT8747501A0 (it) Strumento di scrittura composito
FI863201A (fi) Optisk resonansanordning.
DE3650546D1 (de) Optischer Datenträger
FR2593615B1 (fr) Structure de pompage optique a plaque(s)
IT1223267B (it) Procedimento per la lavorazione di precisione di superfici esterne di pezzi a simmetria rotazionale
FI864521A0 (fi) Saekerhetsanordning vid hydrauliskt drivna maskiner och/eller redskap.
FR2614115B1 (fr) Montre a micro ordinateur integre
IT8635597V0 (it) Orologio a lancette con senso di rotazione invertito rispetto al senso convenzionalmente adottato
IT208708Z2 (it) Misuratore a cursori luminosi
IT1187404B (it) Penetrometro statico dotato di punta meccanica,con martinetto supplementare per l'esecuzione agevolata della prova penetrometrica statica
IT8411652V0 (it) Un dispositivo per agevolare la esecuzione di trascrizioni con eventuale cambiamento di tonalita'
IT207884Z2 (it) Perfezionamento della cartuccia di un nastro stampante
IT8509484A0 (it) Strumento densitometrico ottico a componenti statici.
IT8602703A0 (it) Amnioscopio principe
KR880005096U (ko) 가방의 기능을 가진 찬송 컴퓨터
KR880003084U (ko) 디스크 드라이브의 데이타 사용량 표시장치