IT1165102B - Composizioni antistatiche e articoli comprendenti rivestimenti antistatici preparati da esse - Google Patents

Composizioni antistatiche e articoli comprendenti rivestimenti antistatici preparati da esse

Info

Publication number
IT1165102B
IT1165102B IT23737/79A IT2373779A IT1165102B IT 1165102 B IT1165102 B IT 1165102B IT 23737/79 A IT23737/79 A IT 23737/79A IT 2373779 A IT2373779 A IT 2373779A IT 1165102 B IT1165102 B IT 1165102B
Authority
IT
Italy
Prior art keywords
antistatic
articles including
coatings prepared
compositions
antistatic coatings
Prior art date
Application number
IT23737/79A
Other languages
English (en)
Italian (it)
Other versions
IT7923737A0 (it
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of IT7923737A0 publication Critical patent/IT7923737A0/it
Application granted granted Critical
Publication of IT1165102B publication Critical patent/IT1165102B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/16—Anti-static materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/853—Inorganic compounds, e.g. metals
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7373—Non-magnetic single underlayer comprising chromium
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73923—Organic polymer substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73923—Organic polymer substrates
    • G11B5/73927—Polyester substrates, e.g. polyethylene terephthalate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
IT23737/79A 1978-06-23 1979-06-20 Composizioni antistatiche e articoli comprendenti rivestimenti antistatici preparati da esse IT1165102B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7818784A FR2429252A2 (fr) 1978-06-23 1978-06-23 Nouveau produit, notamment photographique, a couche antistatique et procede pour sa preparation

Publications (2)

Publication Number Publication Date
IT7923737A0 IT7923737A0 (it) 1979-06-20
IT1165102B true IT1165102B (it) 1987-04-22

Family

ID=9209886

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23737/79A IT1165102B (it) 1978-06-23 1979-06-20 Composizioni antistatiche e articoli comprendenti rivestimenti antistatici preparati da esse

Country Status (6)

Country Link
JP (1) JPS555982A (de)
DE (1) DE2925370C3 (de)
FR (1) FR2429252A2 (de)
GB (1) GB2032405B (de)
IT (1) IT1165102B (de)
NL (1) NL7904917A (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2949192B2 (ja) * 1988-07-07 1999-09-13 富士写真フイルム株式会社 ハロゲン化銀写真感光材料
FR2681852B1 (fr) * 1991-09-27 1993-12-17 Kodak Pathe Procede de preparation en continu de gels de pentoxyde de vanadium et appareil de mise en óoeuvre du procede.
US5427835A (en) * 1992-06-04 1995-06-27 Minnesota Mining And Manufacturing Company Sulfopolymer/vanadium oxide antistatic compositions
US5637368A (en) * 1992-06-04 1997-06-10 Minnesota Mining And Manufacturing Company Adhesive tape having antistatic properties
FR2691960A1 (fr) * 1992-06-04 1993-12-10 Minnesota Mining & Mfg Dispersion colloïdale d'oxyde de vanadium, procédé pour leur préparation et procédéé pour préparer un revêtement antistatique.
US5407603A (en) * 1992-06-04 1995-04-18 Minnesota Mining And Manufacturing Company Vanadium oxide colloidal dispersons and antistatic coatings
EP0655646A1 (de) * 1993-11-29 1995-05-31 Minnesota Mining And Manufacturing Company Radiographisches Material mit verbesserten antistatischen Eigenschaften
EP0791187B1 (de) * 1994-11-10 1998-09-16 Minnesota Mining And Manufacturing Company Photographisches element mit einer antistatischen schicht und verfahren zur herstellung eines elements mit antistatischen eigenschaften
US5609969A (en) * 1995-06-30 1997-03-11 Minnesota Mining And Manufacturing Company Static dissipative electronic packaging article

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4078935A (en) * 1974-04-30 1978-03-14 Fuji Photo Film Co., Ltd. Support member
FR2277136A1 (fr) * 1974-07-02 1976-01-30 Kodak Pathe Nouvelle composition antistatique et son application a la preparation de produits, notamment photographiques
FR2303310A1 (fr) * 1975-03-07 1976-10-01 Kodak Pathe Composition antistatique et son application a la preparation de produits, notamment photographiques
FR2318442A1 (fr) * 1975-07-15 1977-02-11 Kodak Pathe Nouveau produit, notamment, photographique, a couche antistatique et procede pour sa preparation

Also Published As

Publication number Publication date
DE2925370C3 (de) 1982-03-18
JPS6326375B2 (de) 1988-05-30
GB2032405B (en) 1982-09-08
IT7923737A0 (it) 1979-06-20
JPS555982A (en) 1980-01-17
DE2925370A1 (de) 1980-01-03
NL7904917A (nl) 1979-12-28
FR2429252B2 (de) 1984-10-05
FR2429252A2 (fr) 1980-01-18
GB2032405A (en) 1980-05-08
DE2925370B2 (de) 1981-03-19

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