IT1150627B - Bagno per la deposizione galvanica di una lega palladio/nichel - Google Patents

Bagno per la deposizione galvanica di una lega palladio/nichel

Info

Publication number
IT1150627B
IT1150627B IT19992/82A IT1999282A IT1150627B IT 1150627 B IT1150627 B IT 1150627B IT 19992/82 A IT19992/82 A IT 19992/82A IT 1999282 A IT1999282 A IT 1999282A IT 1150627 B IT1150627 B IT 1150627B
Authority
IT
Italy
Prior art keywords
palladium
bath
nickel alloy
galvanic deposition
galvanic
Prior art date
Application number
IT19992/82A
Other languages
English (en)
Italian (it)
Other versions
IT8219992A0 (it
Inventor
Berge Klaus Schulze
Original Assignee
Langbein Pfanhauser Werke Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Langbein Pfanhauser Werke Ag filed Critical Langbein Pfanhauser Werke Ag
Publication of IT8219992A0 publication Critical patent/IT8219992A0/it
Application granted granted Critical
Publication of IT1150627B publication Critical patent/IT1150627B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
IT19992/82A 1981-03-06 1982-03-05 Bagno per la deposizione galvanica di una lega palladio/nichel IT1150627B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3108508A DE3108508C2 (de) 1981-03-06 1981-03-06 Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung

Publications (2)

Publication Number Publication Date
IT8219992A0 IT8219992A0 (it) 1982-03-05
IT1150627B true IT1150627B (it) 1986-12-17

Family

ID=6126504

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19992/82A IT1150627B (it) 1981-03-06 1982-03-05 Bagno per la deposizione galvanica di una lega palladio/nichel

Country Status (14)

Country Link
JP (1) JPS5816089A (cs)
AT (1) AT377013B (cs)
AU (1) AU535531B2 (cs)
BE (1) BE892344A (cs)
BR (1) BR8201157A (cs)
CA (1) CA1176204A (cs)
CH (1) CH649318A5 (cs)
DE (1) DE3108508C2 (cs)
FR (1) FR2501243B1 (cs)
GB (1) GB2094836B (cs)
IT (1) IT1150627B (cs)
NL (1) NL8200908A (cs)
SE (1) SE8201299L (cs)
ZA (1) ZA821367B (cs)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3443420A1 (de) * 1984-11-26 1986-05-28 Siemens AG, 1000 Berlin und 8000 München Galvanisches bad zur schnellabscheidung von palladium-legierungen
US4628165A (en) * 1985-09-11 1986-12-09 Learonal, Inc. Electrical contacts and methods of making contacts by electrodeposition
DE3809139A1 (de) * 1988-03-18 1989-09-28 Lpw Chemie Gmbh Verwendung einer palladium/nickel-legierungsschicht als zwischenschicht zwischen einem nichtkorrosionsbestaendigen oder wenig korrosionsbestaendigen metallischen grundmaterial und einer nach dem pvd-verfahren aufgebrachten beschichtung
GB2242200B (en) * 1990-02-20 1993-11-17 Omi International Plating compositions and processes
US5415685A (en) * 1993-08-16 1995-05-16 Enthone-Omi Inc. Electroplating bath and process for white palladium
EP0916747B1 (de) * 1997-11-15 2002-10-16 AMI Doduco GmbH Elektrolytisches Bad zum Abscheiden von Palladium und von Legierungen des Palladiums
CN113699565B (zh) * 2021-09-28 2023-07-04 万明电镀智能科技(东莞)有限公司 高耐蚀性钯镍合金镀层及其电镀方法和钯镍镀层电镀液

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2328243A (en) * 1941-04-28 1943-08-31 Posture Res Corp Chair
US2800442A (en) * 1955-10-04 1957-07-23 Udylite Res Corp Electrodeposition of nickel
JPS4733176B1 (cs) * 1967-01-11 1972-08-23
US3730854A (en) * 1971-10-29 1973-05-01 Basf Ag Stabilized aqueous solutions of unsaturated aliphatic sulfonic acids or salts thereof
CH572989A5 (cs) * 1973-04-27 1976-02-27 Oxy Metal Industries Corp
GB1553503A (en) * 1976-05-14 1979-09-26 Oxy Metal Industries Corp Electrodeposition of bright nickel-iron deposits
FR2364980A1 (fr) * 1976-09-17 1978-04-14 Parker Ste Continentale Bain et procede pour le depot electrolytique d'alliages a base de palladium
DE2825966A1 (de) * 1978-06-14 1980-01-03 Basf Ag Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt

Also Published As

Publication number Publication date
FR2501243B1 (fr) 1988-05-27
AT377013B (de) 1985-01-25
GB2094836B (en) 1984-12-05
BE892344A (fr) 1982-07-01
JPS5816089A (ja) 1983-01-29
NL8200908A (nl) 1982-10-01
IT8219992A0 (it) 1982-03-05
GB2094836A (en) 1982-09-22
DE3108508A1 (de) 1982-09-16
SE8201299L (sv) 1982-09-07
FR2501243A1 (fr) 1982-09-10
ATA82182A (de) 1984-06-15
CH649318A5 (de) 1985-05-15
ZA821367B (en) 1983-01-26
BR8201157A (pt) 1982-11-23
CA1176204A (en) 1984-10-16
DE3108508C2 (de) 1983-06-30
AU535531B2 (en) 1984-03-29
AU8104982A (en) 1982-09-09
JPS6112038B2 (cs) 1986-04-05

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