IT1149534B - Procedimento per formare una regione di semiconduttore cristallina del gruppo iv su una pellicola isolante - Google Patents

Procedimento per formare una regione di semiconduttore cristallina del gruppo iv su una pellicola isolante

Info

Publication number
IT1149534B
IT1149534B IT19393/82A IT1939382A IT1149534B IT 1149534 B IT1149534 B IT 1149534B IT 19393/82 A IT19393/82 A IT 19393/82A IT 1939382 A IT1939382 A IT 1939382A IT 1149534 B IT1149534 B IT 1149534B
Authority
IT
Italy
Prior art keywords
procedure
group
forming
insulating film
crystalline semiconductor
Prior art date
Application number
IT19393/82A
Other languages
English (en)
Italian (it)
Other versions
IT8219393A0 (it
Inventor
Harry John Leamy
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of IT8219393A0 publication Critical patent/IT8219393A0/it
Application granted granted Critical
Publication of IT1149534B publication Critical patent/IT1149534B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/34—Single-crystal growth by zone-melting; Refining by zone-melting characterised by the seed, e.g. by its crystallographic orientation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B1/00—Single-crystal growth directly from the solid state
    • C30B1/02—Single-crystal growth directly from the solid state by thermal treatment, e.g. strain annealing
    • C30B1/026—Solid phase epitaxial growth through a disordered intermediate layer
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Recrystallisation Techniques (AREA)
  • Electrodes Of Semiconductors (AREA)
IT19393/82A 1981-02-04 1982-02-02 Procedimento per formare una regione di semiconduttore cristallina del gruppo iv su una pellicola isolante IT1149534B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23123881A 1981-02-04 1981-02-04

Publications (2)

Publication Number Publication Date
IT8219393A0 IT8219393A0 (it) 1982-02-02
IT1149534B true IT1149534B (it) 1986-12-03

Family

ID=22868346

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19393/82A IT1149534B (it) 1981-02-04 1982-02-02 Procedimento per formare una regione di semiconduttore cristallina del gruppo iv su una pellicola isolante

Country Status (9)

Country Link
US (1) US4670086A (en, 2012)
EP (1) EP0070878B1 (en, 2012)
JP (1) JPS58500048A (en, 2012)
CA (1) CA1204044A (en, 2012)
DE (1) DE3231671T1 (en, 2012)
GB (1) GB2106419B (en, 2012)
IT (1) IT1149534B (en, 2012)
NL (1) NL8220051A (en, 2012)
WO (1) WO1982002726A1 (en, 2012)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3177084D1 (en) * 1980-04-10 1989-09-21 Massachusetts Inst Technology Method of producing sheets of crystalline material
JPH084067B2 (ja) * 1985-10-07 1996-01-17 工業技術院長 半導体装置の製造方法
JP2566914B2 (ja) * 1985-12-28 1996-12-25 キヤノン株式会社 薄膜半導体素子及びその形成法
JPH0782996B2 (ja) * 1986-03-28 1995-09-06 キヤノン株式会社 結晶の形成方法
JP2670442B2 (ja) * 1986-03-31 1997-10-29 キヤノン株式会社 結晶の形成方法
AU623861B2 (en) * 1987-08-08 1992-05-28 Canon Kabushiki Kaisha Crystal article, method for producing the same and semiconductor device utilizing the same
US4944835A (en) * 1989-03-30 1990-07-31 Kopin Corporation Seeding process in zone recrystallization
US4988641A (en) * 1989-10-10 1991-01-29 Grumman Aerospace Corporation Graphotaxially forming a photosensitive detector array
JP2785918B2 (ja) * 1991-07-25 1998-08-13 ローム株式会社 絶縁層の上に成長層を有する半導体装置の製造方法
JPH076960A (ja) * 1993-06-16 1995-01-10 Fuji Electric Co Ltd 多結晶半導体薄膜の生成方法
US5893948A (en) * 1996-04-05 1999-04-13 Xerox Corporation Method for forming single silicon crystals using nucleation sites
US6478773B1 (en) * 1998-12-21 2002-11-12 Micrus Corporation Apparatus for deployment of micro-coil using a catheter
DE19845792A1 (de) * 1998-09-21 2000-03-23 Inst Halbleiterphysik Gmbh Verfahren zur Erzeugung einer amorphen oder polykristallinen Schicht auf einem Isolatorgebiet
US7585792B2 (en) * 2005-02-09 2009-09-08 S.O.I.Tec Silicon On Insulator Technologies Relaxation of a strained layer using a molten layer
US7402517B2 (en) * 2005-03-31 2008-07-22 Battelle Memorial Institute Method and apparatus for selective deposition of materials to surfaces and substrates
CN102776566A (zh) * 2011-05-11 2012-11-14 深圳光启高等理工研究院 基于多晶硅的超材料制备方法和基于多晶硅的超材料

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3389022A (en) * 1965-09-17 1968-06-18 United Aircraft Corp Method for producing silicon carbide layers on silicon substrates
US3413157A (en) * 1965-10-21 1968-11-26 Ibm Solid state epitaxial growth of silicon by migration from a silicon-aluminum alloy deposit
US3549432A (en) * 1968-07-15 1970-12-22 Texas Instruments Inc Multilayer microelectronic circuitry techniques
US4046618A (en) * 1972-12-29 1977-09-06 International Business Machines Corporation Method for preparing large single crystal thin films
US3984173A (en) * 1974-04-08 1976-10-05 Texas Instruments Incorporated Waveguides for integrated optics
US3928092A (en) * 1974-08-28 1975-12-23 Bell Telephone Labor Inc Simultaneous molecular beam deposition of monocrystalline and polycrystalline III(a)-V(a) compounds to produce semiconductor devices
US4323417A (en) * 1980-05-06 1982-04-06 Texas Instruments Incorporated Method of producing monocrystal on insulator
US4308078A (en) * 1980-06-06 1981-12-29 Cook Melvin S Method of producing single-crystal semiconductor films by laser treatment
US4330363A (en) * 1980-08-28 1982-05-18 Xerox Corporation Thermal gradient control for enhanced laser induced crystallization of predefined semiconductor areas

Also Published As

Publication number Publication date
DE3231671T1 (de) 1983-02-24
GB2106419B (en) 1984-08-15
EP0070878A1 (en) 1983-02-09
DE3231671C2 (en, 2012) 1992-10-01
GB2106419A (en) 1983-04-13
JPS58500048A (ja) 1983-01-06
NL8220051A (nl) 1983-01-03
CA1204044A (en) 1986-05-06
IT8219393A0 (it) 1982-02-02
JPH0562451B2 (en, 2012) 1993-09-08
EP0070878A4 (en) 1983-06-15
EP0070878B1 (en) 1987-05-13
WO1982002726A1 (en) 1982-08-19
US4670086A (en) 1987-06-02

Similar Documents

Publication Publication Date Title
IT1149534B (it) Procedimento per formare una regione di semiconduttore cristallina del gruppo iv su una pellicola isolante
DE3071589D1 (en) Method for forming an insulating film on a semiconductor substrate surface
GB2056169B (en) Manufacturing system for semiconductor devices
EP0080851A3 (en) A method for forming monocrystalline semiconductor film on insulating film
DE3382676D1 (de) Wafertransferapparat.
AU2107583A (en) Apparatus for manufacturing photovoltaic devices
AU472212B2 (en) A method employing precision stamping for fabricating the wafers ofa multiwafer electrical circuit structure
IT1122304B (it) Circuito di precarica per una matrice di memoria
ES273520Y (es) Una pared aislante.
AU4473679A (en) Crystalline semiconductors
IT7924773A0 (it) Procedimento di fabbricazione di dispositivi mediante incisione al plasma.
AU537887B2 (en) Photoelectric semiconductor device
DE3278527D1 (en) Semiconductor device having a polycrystalline thin film
IT8323279A0 (it) Circuito per la produzione di una tensione di riferimento.
AU1084076A (en) Method for fabricating a semiconductor device
ES524740A0 (es) Un metodo para producir un dispositivo semiconductor fotovoltaico de pelicula delgada con prioridades opticas mejoradas
IT8219001A0 (it) Segnali presentante una dispositivo di trasferimento di caratteristica di trasferimento regolabile a gradini.
JPS57198643A (en) Semiconductor substrate
IT8220100A0 (it) Dispositivi che contengono tale procedimento per la produzione di semiconduttore. un semiconduttore amorfo e
IT8222153A1 (it) Circuito di sorveglianza per proteggere dispositivi appoggiati su una pluralità di basi, specialmente piloni per elettrodotti
IT8124331A0 (it) Metodo per creare una struttura a metallizzazione dielettrico.
ES518107A0 (es) Procedimiento de fabricacion de un dispositivo semi-conductor, en particular de una celula solar fotovoltaica.
FR2500854B1 (fr) Procede de fabrication de plaques semi-conductrices
GB2115923B (en) Semiconductor wafer alignment
IT8125360A0 (it) Costante dielettrica. dispositivo per indicare una

Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970225