IT1042746B - Method di placcatura metallica per riduzione - Google Patents
Method di placcatura metallica per riduzioneInfo
- Publication number
- IT1042746B IT1042746B IT27554/75A IT2755475A IT1042746B IT 1042746 B IT1042746 B IT 1042746B IT 27554/75 A IT27554/75 A IT 27554/75A IT 2755475 A IT2755475 A IT 2755475A IT 1042746 B IT1042746 B IT 1042746B
- Authority
- IT
- Italy
- Prior art keywords
- reduction
- plating method
- metallic plating
- metallic
- plating
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/285—Sensitising or activating with tin based compound or composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/58—Processes for obtaining metallic images by vapour deposition or physical development
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US508601A US3928670A (en) | 1974-09-23 | 1974-09-23 | Selective plating on non-metallic surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1042746B true IT1042746B (it) | 1980-01-30 |
Family
ID=24023375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT27554/75A IT1042746B (it) | 1974-09-23 | 1975-09-23 | Method di placcatura metallica per riduzione |
Country Status (9)
Country | Link |
---|---|
US (1) | US3928670A (it) |
JP (1) | JPS5157643A (it) |
CA (1) | CA1059363A (it) |
DE (1) | DE2541868A1 (it) |
ES (1) | ES441164A1 (it) |
FR (1) | FR2285470A1 (it) |
GB (1) | GB1509946A (it) |
IT (1) | IT1042746B (it) |
NL (1) | NL7511181A (it) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2742899C3 (de) * | 1977-09-23 | 1980-06-12 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Anordnung zur optischen Übertragung von Nachrichten |
DE2847298A1 (de) * | 1978-10-27 | 1980-05-08 | Schering Ag | Verfahren zur herstellung von metallmustern auf einem isolierenden traegerstoff |
US4229218A (en) * | 1979-02-05 | 1980-10-21 | Shipley Company Inc. | Self-monitoring electroless plating solution |
DE3048665A1 (de) * | 1980-12-23 | 1982-07-22 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | "verfahren zur selektiven metallabscheidung sowie damit herstellbare metallhaltige struktur" |
DE3149919A1 (de) * | 1981-12-11 | 1983-06-23 | Schering Ag, 1000 Berlin Und 4619 Bergkamen | Verfahren zum haftfesten metallisieren von polyimid |
US5182135A (en) * | 1986-08-12 | 1993-01-26 | Bayer Aktiengesellschaft | Process for improving the adherency of metallic coatings deposited without current on plastic surfaces |
US4738869A (en) * | 1986-11-24 | 1988-04-19 | Pacific Bell | Photoselective electroless plating method employing UV-absorbing substrates |
JP2559717B2 (ja) * | 1986-11-28 | 1996-12-04 | 呉羽化学工業株式会社 | 選択的化学メツキ法 |
US4770897A (en) * | 1987-05-05 | 1988-09-13 | Digital Equipment Corporation | Multilayer interconnection system for multichip high performance semiconductor packaging |
GB2206128B (en) * | 1987-06-23 | 1991-11-20 | Glaverbel | Copper mirrors and method of manufacturing same |
US4818286A (en) * | 1988-03-08 | 1989-04-04 | International Business Machines Corporation | Electroless copper plating bath |
JPH0379100A (ja) * | 1989-08-22 | 1991-04-04 | Matsushita Electric Ind Co Ltd | 光透過ペーストおよびそれを用いた金属銅析出方法 |
US6692895B2 (en) * | 2001-05-25 | 2004-02-17 | 3M Innovative Properties Company | Imageable article and method of imaging |
US20050276911A1 (en) * | 2004-06-15 | 2005-12-15 | Qiong Chen | Printing of organometallic compounds to form conductive traces |
US8475924B2 (en) | 2007-07-09 | 2013-07-02 | E.I. Du Pont De Nemours And Company | Compositions and methods for creating electronic circuitry |
US20090017309A1 (en) * | 2007-07-09 | 2009-01-15 | E. I. Du Pont De Nemours And Company | Compositions and methods for creating electronic circuitry |
JP5292398B2 (ja) * | 2007-07-09 | 2013-09-18 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 電子回路構造を製造するための組成物および方法 |
KR100904251B1 (ko) * | 2008-01-28 | 2009-06-25 | 한국생산기술연구원 | 폴리머 표면에 귀금속촉매의 선택적 흡착방법 |
US20100181284A1 (en) * | 2009-01-19 | 2010-07-22 | E. I. Du Pont De Nemours And Company | Method of obtaining electronic circuitry features |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3562005A (en) * | 1968-04-09 | 1971-02-09 | Western Electric Co | Method of generating precious metal-reducing patterns |
US3779758A (en) * | 1969-03-25 | 1973-12-18 | Photocircuits Corp | Photosensitive process for producing printed circuits employing electroless deposition |
-
1974
- 1974-09-23 US US508601A patent/US3928670A/en not_active Expired - Lifetime
-
1975
- 1975-09-11 GB GB37339/75A patent/GB1509946A/en not_active Expired
- 1975-09-19 DE DE19752541868 patent/DE2541868A1/de not_active Withdrawn
- 1975-09-22 ES ES441164A patent/ES441164A1/es not_active Expired
- 1975-09-22 CA CA236,017A patent/CA1059363A/en not_active Expired
- 1975-09-22 FR FR7528969A patent/FR2285470A1/fr active Granted
- 1975-09-23 IT IT27554/75A patent/IT1042746B/it active
- 1975-09-23 JP JP50114361A patent/JPS5157643A/ja active Pending
- 1975-09-23 NL NL7511181A patent/NL7511181A/xx not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US3928670A (en) | 1975-12-23 |
NL7511181A (nl) | 1976-03-25 |
FR2285470A1 (fr) | 1976-04-16 |
FR2285470B1 (it) | 1978-10-13 |
JPS5157643A (it) | 1976-05-20 |
ES441164A1 (es) | 1977-03-16 |
CA1059363A (en) | 1979-07-31 |
DE2541868A1 (de) | 1976-04-01 |
GB1509946A (en) | 1978-05-10 |
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