IT1025479B - Materiali fotosensibili - Google Patents

Materiali fotosensibili

Info

Publication number
IT1025479B
IT1025479B IT2917474A IT2917474A IT1025479B IT 1025479 B IT1025479 B IT 1025479B IT 2917474 A IT2917474 A IT 2917474A IT 2917474 A IT2917474 A IT 2917474A IT 1025479 B IT1025479 B IT 1025479B
Authority
IT
Italy
Prior art keywords
photosensitive materials
photosensitive
materials
Prior art date
Application number
IT2917474A
Other languages
English (en)
Italian (it)
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of IT1025479B publication Critical patent/IT1025479B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
IT2917474A 1973-11-08 1974-11-06 Materiali fotosensibili IT1025479B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5194173A GB1463816A (en) 1973-11-08 1973-11-08 Photosensitive lithographic materials and polymers useful therein

Publications (1)

Publication Number Publication Date
IT1025479B true IT1025479B (it) 1978-08-10

Family

ID=10462052

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2917474A IT1025479B (it) 1973-11-08 1974-11-06 Materiali fotosensibili

Country Status (8)

Country Link
JP (1) JPS5078402A (de)
BE (1) BE821970A (de)
CA (1) CA1041698A (de)
DE (1) DE2452761A1 (de)
FR (1) FR2251031B1 (de)
GB (1) GB1463816A (de)
IT (1) IT1025479B (de)
NL (1) NL7414518A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4097281A (en) * 1977-10-17 1978-06-27 Eastman Kodak Company Heat developable photographic material and process comprising transition metal carbonyl compounds
GB1603908A (en) 1978-05-31 1981-12-02 Kodak Ltd Radiationsensitive materials
US4503140A (en) * 1982-05-18 1985-03-05 Minnesota Mining And Manufacturing Company Radiation-sensitive compositions of polymers containing a π-metal carbonyl complex of conjugated polyolefin
JPH0767868B2 (ja) * 1984-10-23 1995-07-26 三菱化学株式会社 感光性平版印刷版
JPS62290705A (ja) * 1986-06-10 1987-12-17 Mitsubishi Chem Ind Ltd 光重合性組成物
CA2134334A1 (en) * 1992-05-21 1993-11-25 Wesley J. Bruxvoort Organometallic monomers and polymers with improved adhesion
US6217984B1 (en) 1992-05-21 2001-04-17 3M Innovative Properties Company Organometallic monomers and polymers with improved adhesion
GB2287707B (en) * 1994-03-25 1998-02-25 Erba Carlo Spa Intermediates for biologically active products

Also Published As

Publication number Publication date
NL7414518A (nl) 1975-05-12
BE821970A (fr) 1975-05-07
CA1041698A (en) 1978-10-31
JPS5078402A (de) 1975-06-26
GB1463816A (en) 1977-02-09
FR2251031A1 (de) 1975-06-06
FR2251031B1 (de) 1976-10-22
DE2452761A1 (de) 1975-05-15
AU7517574A (en) 1976-05-13

Similar Documents

Publication Publication Date Title
IT1007742B (it) Composizione fotosensibile
SE395971B (sv) Fotopolymeriserbar kopieringsmassa
SE403195B (sv) Fotopolymeriserbar kopieringsmassa
AT320685B (de) Lichtempfindliches Material
IT1025144B (it) Film di fotoresist
IT1018741B (it) Macchina fotografica
BE811059A (nl) Directpositief fotografisch materiaal
BE811060A (nl) Kopieertoestel
IT1006992B (it) Materiali polimerici
BE816660A (nl) Direct positief fotografisch materiaal
IT1001806B (it) Materiali fotografici
BE810182A (fr) Camera
FR2327569A1 (fr) Composition resineuse photosensible
BR7408508D0 (pt) Material fotografico fotossensivel
BE812610A (nl) Lichtgevoelig fotografisch materiaal
BR7408415D0 (pt) Material fotografico fotossensivel
AT330580B (de) Elektrophotographisches material
IT1025479B (it) Materiali fotosensibili
NL7409553A (nl) Menthol ontwikkelende stoffen.
BE810550A (nl) Fotografisch registreermateriaal
SE389204B (sv) Elektrofotografisk kopieringsanordning
IT1048168B (it) Composti organostannici
TR17500A (tr) Funfisid maddeler
BR7406942D0 (pt) Material fotografico
BE818179A (nl) Lichtgevoelig fotografisch materiaal