FR2251031B1 - - Google Patents

Info

Publication number
FR2251031B1
FR2251031B1 FR7436756A FR7436756A FR2251031B1 FR 2251031 B1 FR2251031 B1 FR 2251031B1 FR 7436756 A FR7436756 A FR 7436756A FR 7436756 A FR7436756 A FR 7436756A FR 2251031 B1 FR2251031 B1 FR 2251031B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7436756A
Other languages
French (fr)
Other versions
FR2251031A1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2251031A1 publication Critical patent/FR2251031A1/fr
Application granted granted Critical
Publication of FR2251031B1 publication Critical patent/FR2251031B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR7436756A 1973-11-08 1974-11-06 Expired FR2251031B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5194173A GB1463816A (en) 1973-11-08 1973-11-08 Photosensitive lithographic materials and polymers useful therein

Publications (2)

Publication Number Publication Date
FR2251031A1 FR2251031A1 (de) 1975-06-06
FR2251031B1 true FR2251031B1 (de) 1976-10-22

Family

ID=10462052

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7436756A Expired FR2251031B1 (de) 1973-11-08 1974-11-06

Country Status (8)

Country Link
JP (1) JPS5078402A (de)
BE (1) BE821970A (de)
CA (1) CA1041698A (de)
DE (1) DE2452761A1 (de)
FR (1) FR2251031B1 (de)
GB (1) GB1463816A (de)
IT (1) IT1025479B (de)
NL (1) NL7414518A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4097281A (en) * 1977-10-17 1978-06-27 Eastman Kodak Company Heat developable photographic material and process comprising transition metal carbonyl compounds
GB1603908A (en) * 1978-05-31 1981-12-02 Kodak Ltd Radiationsensitive materials
US4503140A (en) * 1982-05-18 1985-03-05 Minnesota Mining And Manufacturing Company Radiation-sensitive compositions of polymers containing a π-metal carbonyl complex of conjugated polyolefin
JPH0767868B2 (ja) * 1984-10-23 1995-07-26 三菱化学株式会社 感光性平版印刷版
JPS62290705A (ja) * 1986-06-10 1987-12-17 Mitsubishi Chem Ind Ltd 光重合性組成物
EP0641460A1 (de) 1992-05-21 1995-03-08 Minnesota Mining And Manufacturing Company Metallorganische monomere und polymere mit verbesserter haftung
CA2134334A1 (en) * 1992-05-21 1993-11-25 Wesley J. Bruxvoort Organometallic monomers and polymers with improved adhesion
GB2287707B (en) * 1994-03-25 1998-02-25 Erba Carlo Spa Intermediates for biologically active products

Also Published As

Publication number Publication date
IT1025479B (it) 1978-08-10
JPS5078402A (de) 1975-06-26
FR2251031A1 (de) 1975-06-06
AU7517574A (en) 1976-05-13
NL7414518A (nl) 1975-05-12
DE2452761A1 (de) 1975-05-15
GB1463816A (en) 1977-02-09
CA1041698A (en) 1978-10-31
BE821970A (fr) 1975-05-07

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Legal Events

Date Code Title Description
ST Notification of lapse