IN2014CN03385A - - Google Patents

Info

Publication number
IN2014CN03385A
IN2014CN03385A IN3385CHN2014A IN2014CN03385A IN 2014CN03385 A IN2014CN03385 A IN 2014CN03385A IN 3385CHN2014 A IN3385CHN2014 A IN 3385CHN2014A IN 2014CN03385 A IN2014CN03385 A IN 2014CN03385A
Authority
IN
India
Prior art keywords
forming
methods
fabrication
enable
electrochemical capacitor
Prior art date
Application number
Other languages
English (en)
Inventor
Donald S Gardner
Cary L Pint
Charles W Holzwarth
Wei Jin
Zhaohui Chen
Yang Liu
Eric C Hannah
John L Gustafson
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of IN2014CN03385A publication Critical patent/IN2014CN03385A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/005—Electrodes
    • H01G4/008—Selection of materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22—Electrodes
    • H01G11/30—Electrodes characterised by their material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22—Electrodes
    • H01G11/26—Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13—Energy storage using capacitors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)
  • Semiconductor Integrated Circuits (AREA)
IN3385CHN2014 2011-12-27 2011-12-27 IN2014CN03385A (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2011/067434 WO2013100916A1 (en) 2011-12-27 2011-12-27 Fabrication of porous silicon electrochemical capacitors

Publications (1)

Publication Number Publication Date
IN2014CN03385A true IN2014CN03385A (cg-RX-API-DMAC10.html) 2015-07-03

Family

ID=48698160

Family Applications (1)

Application Number Title Priority Date Filing Date
IN3385CHN2014 IN2014CN03385A (cg-RX-API-DMAC10.html) 2011-12-27 2011-12-27

Country Status (5)

Country Link
US (1) US10170244B2 (cg-RX-API-DMAC10.html)
DE (1) DE112011106043T5 (cg-RX-API-DMAC10.html)
IN (1) IN2014CN03385A (cg-RX-API-DMAC10.html)
TW (1) TWI587330B (cg-RX-API-DMAC10.html)
WO (1) WO2013100916A1 (cg-RX-API-DMAC10.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9741881B2 (en) * 2003-04-14 2017-08-22 S'tile Photovoltaic module including integrated photovoltaic cells
CN104025225B (zh) 2011-11-03 2017-06-09 英特尔公司 储能结构、制造用于储能结构的支承结构的方法及包含储能结构的微电子组件和系统
WO2013100916A1 (en) 2011-12-27 2013-07-04 Intel Corporation Fabrication of porous silicon electrochemical capacitors
US9025313B2 (en) 2012-08-13 2015-05-05 Intel Corporation Energy storage devices with at least one porous polycrystalline substrate
WO2014145559A2 (en) 2013-03-15 2014-09-18 Cleanvolt Energy, Inc. Improved electrodes and currents through the use of organic and organometallic high dielectric constant materials in energy storage devices and associated methods
US10535466B1 (en) * 2014-11-05 2020-01-14 United States Of America As Represented By The Secretary Of The Navy Super dielectric capacitor having electrically and ionically conducting electrodes
US10128057B2 (en) 2015-10-28 2018-11-13 Stmicroelectronics S.R.L. Supercapacitor with movable separator and method of operating a supercapacitor
CN105655139B (zh) * 2016-01-21 2018-05-25 东南大学 一种氧化钼/碳包覆氮化钛纳米管阵列复合材料及其制备方法和应用
CN105655148B (zh) * 2016-01-21 2018-02-02 东南大学 一种纳米多孔结构的氮化钛酸锂纳米线/纳米膜一体化材料及其制备方法和应用
CN105719843B (zh) * 2016-01-21 2018-05-04 东南大学 一种氮化钼/氮化钛纳米管阵列复合材料及其制备方法和应用
DE102016202979A1 (de) * 2016-02-25 2017-08-31 Robert Bosch Gmbh Hybridsuperkondensator
US10636583B2 (en) 2017-02-14 2020-04-28 Rolls-Royce Corporation Material property capacitance sensor
NO343382B1 (en) 2017-03-07 2019-02-18 Univ College Of Southeast Norway On-chip supercapacitor With Silicon nanostructure
CN110574132B (zh) 2017-03-07 2022-12-09 挪威东南大学 用于片上超级电容器的蚀刻的硅上的沉积的碳膜

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5455430A (en) * 1991-08-01 1995-10-03 Sanyo Electric Co., Ltd. Photovoltaic device having a semiconductor grade silicon layer formed on a metallurgical grade substrate
US5508542A (en) * 1994-10-28 1996-04-16 International Business Machines Corporation Porous silicon trench and capacitor structures
DE10242877A1 (de) * 2002-09-16 2004-03-25 Infineon Technologies Ag Halbleitersubstrat sowie darin ausgebildete Halbleiterschaltung und zugehörige Herstellungsverfahren
IL153289A (en) * 2002-12-05 2010-06-16 Acktar Ltd Electrodes for electrolytic capacitors and method for producing them
US7033703B2 (en) 2002-12-20 2006-04-25 Firefly Energy, Inc. Composite material and current collector for battery
WO2005036574A1 (ja) 2003-10-10 2005-04-21 Japan Gore-Tex Inc. 電気二重層キャパシタ用電極とその製造方法、および電気二重層キャパシタ、並びに導電性接着剤
CA2616726C (en) 2005-07-27 2015-06-02 Cellergy Ltd. Multilayered electrochemical energy storage device and method of manufacture thereof
JP4411331B2 (ja) * 2007-03-19 2010-02-10 信越化学工業株式会社 磁気記録媒体用シリコン基板およびその製造方法
US8526167B2 (en) * 2009-09-03 2013-09-03 Applied Materials, Inc. Porous amorphous silicon-carbon nanotube composite based electrodes for battery applications
JP5743353B2 (ja) 2010-04-02 2015-07-01 インテル・コーポレーション 電荷蓄積デバイス、電荷蓄積デバイスを製造する方法、移動型電子デバイスおよびマイクロ電子デバイス
FR2963476B1 (fr) * 2010-07-30 2012-08-24 Centre Nat Rech Scient Procede de realisation d'un condensateur comprenant un reseau de nano-capacites
CN104025225B (zh) * 2011-11-03 2017-06-09 英特尔公司 储能结构、制造用于储能结构的支承结构的方法及包含储能结构的微电子组件和系统
WO2013100916A1 (en) 2011-12-27 2013-07-04 Intel Corporation Fabrication of porous silicon electrochemical capacitors

Also Published As

Publication number Publication date
TWI587330B (zh) 2017-06-11
US20140233152A1 (en) 2014-08-21
DE112011106043T5 (de) 2014-09-18
US10170244B2 (en) 2019-01-01
WO2013100916A1 (en) 2013-07-04
TW201342406A (zh) 2013-10-16

Similar Documents

Publication Publication Date Title
EP3000144A4 (en) Surface treated silicon containing active materials for electrochemical cells
EP3062337A4 (en) Polishing liquid composition for silicon wafers
IL237254A0 (en) Single multi-plane table structure for slices and frames
EP3084811A4 (en) Non-planar semiconductor device having hybrid geometry-based active region
EP3084818A4 (en) Substrate support apparatus having reduced substrate particle generation
EP3089355A4 (en) Dual-glass photovoltaic cell module
EP3061124A4 (en) Vertical non-planar semiconductor device for system-on-chip (soc) applications
SG11201504937VA (en) Doping media for the local doping of silicon wafers
SG10201406877WA (en) Method for chemical mechanical polishing silicon wafers
EP3073523A4 (en) Through electrode substrate and semiconductor device using through electrode substrate
EP3084786A4 (en) Hybrid electrochemical capacitor
SMT201500057B (it) Uso della biotina per il trattamento della sclerosi multipla
EP3070843A4 (en) Piezoelectric wafer, piezoelectric vibration piece, and piezoelectric vibrator
EP3095135A4 (en) Porous siox materials for improvement in siox switching device performances
SG10201705326XA (en) Liquid doping media for the local doping of silicon wafers
EP3091396A4 (en) Focusing leveling device
LT2938963T (lt) Labai tikslus saulės kompasas
EP3087584A4 (en) Direct plasma densification process and semiconductor devices
SG11201508619VA (en) Silicon wafer for solar cells and method for producing same
EP3091584A4 (en) Device for manufacturing integrated thin film solar cell
SG11201401972WA (en) Solar wafer electrostatic chuck
WO2014002061A3 (en) Substituted terrylene and quaterrylene derivates and use as semiconductors thereof
SMT201500237B (it) Compsizione per l'uso in un trattamento contro l'infertilità
EP3038120A4 (en) Electrochemical capacitor
SG10201509068WA (en) Monolithic integrated semiconductor structure