IN2014CH00562A - - Google Patents
Info
- Publication number
- IN2014CH00562A IN2014CH00562A IN562CH2014A IN2014CH00562A IN 2014CH00562 A IN2014CH00562 A IN 2014CH00562A IN 562CH2014 A IN562CH2014 A IN 562CH2014A IN 2014CH00562 A IN2014CH00562 A IN 2014CH00562A
- Authority
- IN
- India
- Prior art keywords
- fabricating
- micromechanical component
- liga
- distinct functional
- functional levels
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0075—Manufacture of substrate-free structures
- B81C99/008—Manufacture of substrate-free structures separating the processed structure from a mother substrate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B15/00—Escapements
- G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/03—Microengines and actuators
- B81B2201/035—Microgears
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20130155068 EP2767869A1 (fr) | 2013-02-13 | 2013-02-13 | Procédé de fabrication d'une pièce de micromécanique monobloc comportant au moins deux niveaux distincts |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014CH00562A true IN2014CH00562A (da) | 2015-04-10 |
Family
ID=47877759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN562CH2014 IN2014CH00562A (da) | 2013-02-13 | 2014-02-07 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9197183B2 (da) |
EP (2) | EP2767869A1 (da) |
JP (1) | JP5899252B2 (da) |
CN (1) | CN103979483B (da) |
HK (1) | HK1200799A1 (da) |
IN (1) | IN2014CH00562A (da) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3232277B1 (en) * | 2014-12-12 | 2021-04-21 | Citizen Watch Co., Ltd. | Timepiece component and method for manufacturing timepiece component |
EP3035125B1 (fr) * | 2014-12-19 | 2018-01-10 | Rolex Sa | Procédé de fabrication d'un composant horloger multi-niveaux |
EP3168057A1 (fr) * | 2015-11-11 | 2017-05-17 | Nivarox-FAR S.A. | Procede de fabrication d'une piece metallique avec au moins un motif a illusion d'optique |
EP3171230B1 (fr) * | 2015-11-19 | 2019-02-27 | Nivarox-FAR S.A. | Composant d'horlogerie a tribologie amelioree |
EP3171229A1 (fr) * | 2015-11-19 | 2017-05-24 | Nivarox-FAR S.A. | Composant d' horlogerie |
WO2018172895A1 (fr) * | 2017-03-24 | 2018-09-27 | Montblanc Montre Sa | Procédé de fabrication d'un composant horloger en métal-céramique |
EP3453787B1 (fr) | 2017-09-11 | 2020-02-19 | Patek Philippe SA Genève | Procede de fabrication d'un lot de pieces de micromecanique multi-niveau en metal |
EP3614205A1 (fr) * | 2018-08-22 | 2020-02-26 | Nivarox-FAR S.A. | Procede de fabrication d'un composant horloger et composant obtenu selon ce procede |
US11860801B2 (en) | 2019-01-15 | 2024-01-02 | Christoph HELDEIS | Method for implicit addressing of electronic units and corresponding units |
CN117795435A (zh) * | 2021-08-02 | 2024-03-29 | 劳力士有限公司 | 钟表部件的制造方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6458263B1 (en) * | 2000-09-29 | 2002-10-01 | Sandia National Laboratories | Cantilevered multilevel LIGA devices and methods |
EP1740256A4 (en) * | 2003-11-10 | 2011-06-29 | Agency Science Tech & Res | MICRO NEEDLES AND MANUFACTURE OF MICRO NEEDLES |
EP1612627B1 (fr) * | 2004-07-02 | 2009-05-06 | Nivarox-FAR S.A. | Spiral autocompensateur bi-matière |
JP4840756B2 (ja) * | 2005-01-14 | 2011-12-21 | セイコーインスツル株式会社 | 電鋳型とその製造方法及び電鋳部品の製造方法 |
JP4834426B2 (ja) * | 2006-03-06 | 2011-12-14 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
JP2007240416A (ja) * | 2006-03-10 | 2007-09-20 | Citizen Holdings Co Ltd | 足付指標及びその製造方法とその足付指標を用いた表示板 |
DE06405114T1 (de) | 2006-03-15 | 2008-04-24 | Doniar S.A. | LIGA Verfahren zur Herstellung einer einzel- oder mehrlagigen metallischen Struktur und damit hergestellte Struktur |
CN100441388C (zh) * | 2006-04-06 | 2008-12-10 | 上海交通大学 | 基于多层加工技术的微针制备方法 |
CH699416A2 (fr) * | 2008-08-20 | 2010-02-26 | Nivarox Sa | Procédé de fabrication de pièces métalliques multi-niveaux par la technique LIGA-UV |
EP2157476A1 (fr) * | 2008-08-20 | 2010-02-24 | Nivarox-FAR S.A. | Procédé de fabrication de pièces métalliques multi-niveaux par la technique LIGA-UV |
EP2182096A1 (fr) * | 2008-10-28 | 2010-05-05 | Nivarox-FAR S.A. | Procédé LIGA hétérogène |
EP2230207A1 (fr) * | 2009-03-13 | 2010-09-22 | Nivarox-FAR S.A. | Moule pour galvanoplastie et son procédé de fabrication |
EP2230206B1 (fr) * | 2009-03-13 | 2013-07-17 | Nivarox-FAR S.A. | Moule pour galvanoplastie et son procédé de fabrication |
EP2263971A1 (fr) * | 2009-06-09 | 2010-12-22 | Nivarox-FAR S.A. | Pièce de micromécanique composite et son procédé de fabrication |
EP2263972A1 (fr) * | 2009-06-12 | 2010-12-22 | Nivarox-FAR S.A. | Procédé de fabrication d'une microstructure métallique et microstructure obtenue selon ce procédé |
JP5366318B2 (ja) * | 2009-09-14 | 2013-12-11 | セイコーインスツル株式会社 | デテント脱進機およびデテント脱進機の作動レバーの製造方法 |
JP5620083B2 (ja) * | 2009-10-22 | 2014-11-05 | セイコーインスツル株式会社 | 電鋳体、その製造方法、及び時計部品 |
EP2400351B1 (fr) | 2010-06-22 | 2013-09-25 | Omega SA | Mobile monobloc pour une pièce d'horlogerie |
US8562206B2 (en) * | 2010-07-12 | 2013-10-22 | Rolex S.A. | Hairspring for timepiece hairspring-balance oscillator, and method of manufacture thereof |
JP2012198041A (ja) * | 2011-03-18 | 2012-10-18 | Seiko Instruments Inc | 時計用車のスリップ構造及びこれを用いた時計 |
-
2013
- 2013-02-13 EP EP20130155068 patent/EP2767869A1/fr not_active Withdrawn
-
2014
- 2014-01-16 EP EP14151480.2A patent/EP2767870B1/fr active Active
- 2014-02-07 IN IN562CH2014 patent/IN2014CH00562A/en unknown
- 2014-02-10 US US14/176,322 patent/US9197183B2/en active Active
- 2014-02-13 JP JP2014025135A patent/JP5899252B2/ja active Active
- 2014-02-13 CN CN201410049720.7A patent/CN103979483B/zh active Active
-
2015
- 2015-02-04 HK HK15101179.4A patent/HK1200799A1/xx unknown
Also Published As
Publication number | Publication date |
---|---|
EP2767870B1 (fr) | 2019-06-05 |
HK1200799A1 (en) | 2015-08-14 |
EP2767870A2 (fr) | 2014-08-20 |
EP2767869A1 (fr) | 2014-08-20 |
CN103979483A (zh) | 2014-08-13 |
CN103979483B (zh) | 2017-01-18 |
JP2014152400A (ja) | 2014-08-25 |
US9197183B2 (en) | 2015-11-24 |
JP5899252B2 (ja) | 2016-04-06 |
US20140226449A1 (en) | 2014-08-14 |
EP2767870A3 (fr) | 2015-07-08 |
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