IN171675B - - Google Patents

Info

Publication number
IN171675B
IN171675B IN562/MAS/88A IN562MA1988A IN171675B IN 171675 B IN171675 B IN 171675B IN 562MA1988 A IN562MA1988 A IN 562MA1988A IN 171675 B IN171675 B IN 171675B
Authority
IN
India
Application number
IN562/MAS/88A
Other languages
English (en)
Inventor
Arai Tohru
Takeda Hiromasa
Kawaura Hiroyuki
Original Assignee
Toyoda Chuo Kenkyusho Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Chuo Kenkyusho Kk filed Critical Toyoda Chuo Kenkyusho Kk
Publication of IN171675B publication Critical patent/IN171675B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)
IN562/MAS/88A 1987-08-12 1988-08-05 IN171675B (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62201330A JPS6447844A (en) 1987-08-12 1987-08-12 Method and apparatus for treating surface

Publications (1)

Publication Number Publication Date
IN171675B true IN171675B (ja) 1992-12-05

Family

ID=16439225

Family Applications (1)

Application Number Title Priority Date Filing Date
IN562/MAS/88A IN171675B (ja) 1987-08-12 1988-08-05

Country Status (10)

Country Link
US (1) US4892759A (ja)
EP (1) EP0303191B1 (ja)
JP (1) JPS6447844A (ja)
KR (1) KR920004849B1 (ja)
CN (1) CN1013208B (ja)
AU (1) AU610922B2 (ja)
CA (1) CA1336150C (ja)
DE (1) DE3852355T2 (ja)
ES (1) ES2069538T3 (ja)
IN (1) IN171675B (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5227195A (en) * 1989-04-04 1993-07-13 Sri International Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates
DK0471276T3 (da) * 1990-08-10 1996-03-18 Toyoda Chuo Kenkyusho Kk Fremgangsmåde til fremstilling af et nitrid- eller carbonnitridlag
US5171734A (en) * 1991-04-22 1992-12-15 Sri International Coating a substrate in a fluidized bed maintained at a temperature below the vaporization temperature of the resulting coating composition
JP3189507B2 (ja) * 1992-06-30 2001-07-16 株式会社豊田中央研究所 表面処理装置
US6093303A (en) 1998-08-12 2000-07-25 Swagelok Company Low temperature case hardening processes
US6165597A (en) * 1998-08-12 2000-12-26 Swagelok Company Selective case hardening processes at low temperature
EP1165852A4 (en) * 1999-02-08 2003-05-02 Quality Heat Technologies Pty SURFACE TREATMENT METHOD AND APPARATUS
US6547888B1 (en) 2000-01-28 2003-04-15 Swagelok Company Modified low temperature case hardening processes
CN1250770C (zh) 2000-06-29 2006-04-12 博格华纳公司 在钢质制品上形成坚硬涂层的方法和制造钢质制品或耐磨链销的方法
AU2010236044B2 (en) * 2005-07-21 2012-09-27 Hard Technologies Pty Ltd Duplex Surface Treatment of Metal Objects
JP4977700B2 (ja) 2005-07-21 2012-07-18 ハード テクノロジーズ プロプライエタリー リミテッド 金属物の複合表面処理
US8864917B2 (en) 2008-10-16 2014-10-21 Borgwarner Inc. Group 5 metal source carbide coated steel article and method for making same
ES2342708B2 (es) * 2010-02-09 2011-01-27 Asociacion De La Industria Navarra Ain Procedimiento para la fabricacion de recubrimientos ceramicos para baldosas y baldosa asi obtenida.
US20140312030A1 (en) * 2013-04-23 2014-10-23 Paul D. Steneck Microwave heat treatment apparatus and method
US20150125333A1 (en) * 2013-11-05 2015-05-07 Gerald J. Bruck Below surface laser processing of a fluidized bed
KR101611669B1 (ko) * 2013-12-19 2016-04-12 주식회사 포스코 가열장치 및 이를 포함하는 코팅기구
CN109072324A (zh) * 2016-03-08 2018-12-21 奥秘合金公司 用于金属涂层的方法
CN111283215B (zh) * 2020-02-24 2021-06-11 北京科技大学 一种气-固流化制备无氧钝化钛及钛合金粉末制品的方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4461656A (en) * 1983-03-15 1984-07-24 Ross John A Low temperature hardening of the surface of a ferrous metal workpiece in a fluidized bed furnace
AU570799B2 (en) * 1984-05-17 1988-03-24 Toyota Chuo Kenkyusho K.K. Vapour phase coating of carbide in fluidised bed
JPS60251274A (ja) * 1984-05-28 1985-12-11 Toyota Central Res & Dev Lab Inc 窒化物被覆方法
JPS6156272A (ja) * 1984-08-27 1986-03-20 Toyota Motor Corp 流動層ガス浸炭方法とその装置
JPS61157672A (ja) * 1984-12-28 1986-07-17 Nissan Motor Co Ltd 熱処理方法
US4623400A (en) * 1985-02-22 1986-11-18 Procedyne Corp. Hard surface coatings for metals in fluidized beds
JPS6280258A (ja) * 1985-10-03 1987-04-13 Toyota Central Res & Dev Lab Inc 表面処理方法及びその装置
JPH0819514B2 (ja) * 1986-07-07 1996-02-28 株式会社豊田中央研究所 表面処理方法およびその装置
JP2584217B2 (ja) * 1986-11-18 1997-02-26 株式会社豊田中央研究所 表面処理方法

Also Published As

Publication number Publication date
DE3852355T2 (de) 1995-04-27
AU610922B2 (en) 1991-05-30
CN1031570A (zh) 1989-03-08
KR920004849B1 (ko) 1992-06-19
JPH0514787B2 (ja) 1993-02-25
DE3852355D1 (de) 1995-01-19
EP0303191A3 (en) 1990-10-31
US4892759A (en) 1990-01-09
EP0303191B1 (en) 1994-12-07
KR890003984A (ko) 1989-04-19
AU2098788A (en) 1989-02-16
EP0303191A2 (en) 1989-02-15
JPS6447844A (en) 1989-02-22
CN1013208B (zh) 1991-07-17
ES2069538T3 (es) 1995-05-16
CA1336150C (en) 1995-07-04

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