IN170025B - - Google Patents
Info
- Publication number
- IN170025B IN170025B IN407/MAS/87A IN407MA1987A IN170025B IN 170025 B IN170025 B IN 170025B IN 407MA1987 A IN407MA1987 A IN 407MA1987A IN 170025 B IN170025 B IN 170025B
- Authority
- IN
- India
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87716186A | 1986-06-23 | 1986-06-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN170025B true IN170025B (it) | 1992-01-25 |
Family
ID=25369390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN407/MAS/87A IN170025B (it) | 1986-06-23 | 1987-06-03 |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0258966B1 (it) |
| JP (1) | JPS634059A (it) |
| KR (1) | KR960001033B1 (it) |
| CN (1) | CN1020045C (it) |
| DE (1) | DE3781748T2 (it) |
| IL (1) | IL82673A0 (it) |
| IN (1) | IN170025B (it) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5961269A (en) * | 1996-11-18 | 1999-10-05 | Applied Materials, Inc. | Three chamber load lock apparatus |
| WO2008121478A2 (en) * | 2007-03-28 | 2008-10-09 | Dow Corning Corporation | Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon |
| CN101962751B (zh) * | 2010-10-27 | 2012-02-22 | 普尼太阳能(杭州)有限公司 | 一种多步物理气相沉积设备 |
| TWI781346B (zh) | 2018-09-29 | 2022-10-21 | 美商應用材料股份有限公司 | 具有精確溫度和流量控制的多站腔室蓋 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4410558A (en) * | 1980-05-19 | 1983-10-18 | Energy Conversion Devices, Inc. | Continuous amorphous solar cell production system |
| US4400409A (en) * | 1980-05-19 | 1983-08-23 | Energy Conversion Devices, Inc. | Method of making p-doped silicon films |
| US4438723A (en) * | 1981-09-28 | 1984-03-27 | Energy Conversion Devices, Inc. | Multiple chamber deposition and isolation system and method |
| JPS58111127A (ja) * | 1981-12-24 | 1983-07-02 | Ulvac Corp | 耐摩耗性磁気記録体の製造法 |
| JPS58189371A (ja) * | 1982-04-28 | 1983-11-05 | Teijin Ltd | スパツタ装置 |
| JPS6017074A (ja) * | 1983-07-09 | 1985-01-28 | Konishiroku Photo Ind Co Ltd | 薄膜形成装置、及びこれを構成する処理室ユニツト |
-
1987
- 1987-05-27 IL IL82673A patent/IL82673A0/xx not_active IP Right Cessation
- 1987-06-03 IN IN407/MAS/87A patent/IN170025B/en unknown
- 1987-06-22 KR KR1019870006308A patent/KR960001033B1/ko active IP Right Grant
- 1987-06-22 JP JP62155242A patent/JPS634059A/ja active Pending
- 1987-06-22 DE DE8787305519T patent/DE3781748T2/de not_active Expired - Fee Related
- 1987-06-22 EP EP87305519A patent/EP0258966B1/en not_active Expired - Lifetime
- 1987-06-22 CN CN87104355A patent/CN1020045C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE3781748T2 (de) | 1993-04-01 |
| IL82673A0 (en) | 1987-11-30 |
| CN1020045C (zh) | 1993-03-10 |
| CN87104355A (zh) | 1988-02-17 |
| KR880001037A (ko) | 1988-03-31 |
| KR960001033B1 (ko) | 1996-01-17 |
| EP0258966A2 (en) | 1988-03-09 |
| DE3781748D1 (de) | 1992-10-22 |
| EP0258966B1 (en) | 1992-09-16 |
| EP0258966A3 (en) | 1989-01-25 |
| JPS634059A (ja) | 1988-01-09 |