Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
  • H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
  • H01L21/42—Bombardment with radiation
  • H01L21/423—Bombardment with radiation with high-energy radiation
  • H01L21/428—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
  • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
  • G03H1/0005—Adaptation of holography to specific applications
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
  • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
  • G03H1/04—Processes or apparatus for producing holograms
  • G03H1/0402—Recording geometries or arrangements
  • G03H1/0408—Total internal reflection [TIR] holograms, e.g. edge lit or substrate mode holograms
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
  • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
  • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
  • H01L21/0274—Photolithographic processes
  • H01L21/0275—Photolithographic processes using lasers
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
  • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
  • G03H1/0005—Adaptation of holography to specific applications
  • G03H2001/0094—Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Computer Hardware Design (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Manufacturing & Machinery (AREA)
• Optics & Photonics (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
• Electromagnetism (AREA)
• Health & Medical Sciences (AREA)
• Toxicology (AREA)
• Holo Graphy (AREA)
• Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=10600315

Family Applications (1)

Country Status (8)

Families Citing this family (46)

Family Cites Families (21)

• 1986
  • 1986-06-30 GB GB868615908A patent/GB8615908D0/en active Pending
• 1987
  • 1987-06-23 CA CA000540426A patent/CA1273129A/en not_active Expired - Fee Related
  • 1987-06-23 MY MYPI87000867A patent/MY101569A/en unknown
  • 1987-06-24 GB GB8714761A patent/GB2193344B/en not_active Expired - Fee Related
  • 1987-06-24 IN IN462/MAS/87A patent/IN169623B/en unknown
  • 1987-06-24 EP EP87305626A patent/EP0251681A3/de not_active Withdrawn
  • 1987-06-26 US US07/067,207 patent/US4857425A/en not_active Expired - Lifetime
  • 1987-06-29 JP JP62165125A patent/JPS6327017A/ja active Granted
  • 1987-06-30 KR KR1019870006667A patent/KR880001041A/ko not_active Application Discontinuation

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