IN158687B - - Google Patents
Info
- Publication number
- IN158687B IN158687B IN845/CAL/83A IN845CA1983A IN158687B IN 158687 B IN158687 B IN 158687B IN 845CA1983 A IN845CA1983 A IN 845CA1983A IN 158687 B IN158687 B IN 158687B
- Authority
- IN
- India
Links
Classifications
-
- H10P72/3204—
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H10P72/3314—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Photovoltaic Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Devices For Checking Fares Or Tickets At Control Points (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/397,190 US4440107A (en) | 1982-07-12 | 1982-07-12 | Magnetic apparatus for reducing substrate warpage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN158687B true IN158687B (OSRAM) | 1987-01-03 |
Family
ID=23570183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN845/CAL/83A IN158687B (OSRAM) | 1982-07-12 | 1983-07-08 |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US4440107A (OSRAM) |
| EP (1) | EP0099708B1 (OSRAM) |
| JP (1) | JPS5923573A (OSRAM) |
| AT (1) | ATE19101T1 (OSRAM) |
| AU (1) | AU556673B2 (OSRAM) |
| CA (1) | CA1189174A (OSRAM) |
| DE (1) | DE3362914D1 (OSRAM) |
| IE (1) | IE54608B1 (OSRAM) |
| IL (1) | IL69153A (OSRAM) |
| IN (1) | IN158687B (OSRAM) |
| MX (1) | MX153562A (OSRAM) |
| PH (1) | PH19759A (OSRAM) |
| ZA (1) | ZA835032B (OSRAM) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4512284A (en) * | 1983-12-19 | 1985-04-23 | Rca Corporation | Glow discharge apparatus for use in coating a disc-shaped substrate |
| DE3427057A1 (de) * | 1984-07-23 | 1986-01-23 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Anlage zum herstellen von halbleiter-schichtstrukturen durch epitaktisches wachstum |
| US4664951A (en) * | 1985-07-31 | 1987-05-12 | Energy Conversion Devices, Inc. | Method provided for corrective lateral displacement of a longitudinally moving web held in a planar configuration |
| DE4324320B4 (de) * | 1992-07-24 | 2006-08-31 | Fuji Electric Co., Ltd., Kawasaki | Verfahren und Vorrichtung zur Herstellung einer als dünne Schicht ausgebildeten fotovoltaischen Umwandlungsvorrichtung |
| JPH06280026A (ja) * | 1993-03-24 | 1994-10-04 | Semiconductor Energy Lab Co Ltd | 成膜装置及び成膜方法 |
| FR2703073B1 (fr) * | 1993-03-26 | 1995-05-05 | Lorraine Laminage | Procédé et dispositif pour le revêtement en continu d'un matériau métallique en défilement par un dépôt de polymère à gradient de composition, et produit obtenu par ce procédé. |
| JP3332700B2 (ja) | 1995-12-22 | 2002-10-07 | キヤノン株式会社 | 堆積膜形成方法及び堆積膜形成装置 |
| TW303480B (en) | 1996-01-24 | 1997-04-21 | Applied Materials Inc | Magnetically confined plasma reactor for processing a semiconductor wafer |
| DE19830402C2 (de) * | 1998-07-08 | 2001-02-22 | Ardenne Anlagentech Gmbh | Verfahren und Vorrichtung zur Abscheidung von Funktionsschichten auf bewegten Substraten in einem PECVD-Prozeß |
| US6863835B1 (en) | 2000-04-25 | 2005-03-08 | James D. Carducci | Magnetic barrier for plasma in chamber exhaust |
| US20060278163A1 (en) * | 2002-08-27 | 2006-12-14 | Ovshinsky Stanford R | High throughput deposition apparatus with magnetic support |
| US20060096536A1 (en) * | 2004-11-10 | 2006-05-11 | Daystar Technologies, Inc. | Pressure control system in a photovoltaic substrate deposition apparatus |
| JP2008538450A (ja) * | 2004-11-10 | 2008-10-23 | デイスター テクノロジーズ，インコーポレイティド | 薄膜太陽電池を形成するためのパレットを基盤としたシステム |
| US20100028533A1 (en) * | 2008-03-04 | 2010-02-04 | Brent Bollman | Methods and Devices for Processing a Precursor Layer in a Group VIA Environment |
| US9252318B2 (en) * | 2008-03-05 | 2016-02-02 | Hanergy Hi-Tech Power (Hk) Limited | Solution containment during buffer layer deposition |
| US20110081487A1 (en) * | 2009-03-04 | 2011-04-07 | Brent Bollman | Methods and devices for processing a precursor layer in a group via environment |
| US8062384B2 (en) * | 2009-06-12 | 2011-11-22 | Miasole | Systems, methods and apparatuses for magnetic processing of solar modules |
| US9105778B2 (en) * | 2009-06-12 | 2015-08-11 | Apollo Precision (Kunming) Yuanhong Limited | Systems methods and apparatuses for magnetic processing of solar modules |
| JP6261967B2 (ja) * | 2013-12-03 | 2018-01-17 | 株式会社ディスコ | 加工装置 |
| CN104862650B (zh) * | 2015-05-15 | 2017-04-19 | 京东方科技集团股份有限公司 | 一种柔性基板蒸镀装置及蒸镀方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2731212A (en) * | 1953-02-13 | 1956-01-17 | Richard S Baker | Polyphase electromagnet strip guiding and tension device |
| US2925062A (en) * | 1953-05-15 | 1960-02-16 | Heraeus Gmbh W C | Coating apparatus |
| GB1157120A (en) * | 1966-08-15 | 1969-07-02 | Templeborough Rolling Mills Lt | Methods of and apparatus for Treating Steel Rod or Wire |
| FR2043492A7 (en) * | 1970-03-26 | 1971-02-19 | Nivelet Et Barbier | Metallic strip unwinding and shearing - apparatus |
| US3661116A (en) * | 1970-11-23 | 1972-05-09 | Bethlehem Steel Corp | Magnetic stabilizing means for strip |
| LU69013A1 (OSRAM) * | 1973-03-07 | 1974-02-22 | ||
| JPS5642054B2 (OSRAM) * | 1973-07-25 | 1981-10-02 | ||
| US4410558A (en) * | 1980-05-19 | 1983-10-18 | Energy Conversion Devices, Inc. | Continuous amorphous solar cell production system |
| JPS5736437A (en) * | 1980-08-14 | 1982-02-27 | Fuji Photo Film Co Ltd | Producing device of magnetic recording medium |
| US4369730A (en) * | 1981-03-16 | 1983-01-25 | Energy Conversion Devices, Inc. | Cathode for generating a plasma |
| US4389970A (en) * | 1981-03-16 | 1983-06-28 | Energy Conversion Devices, Inc. | Apparatus for regulating substrate temperature in a continuous plasma deposition process |
-
1982
- 1982-07-12 US US06/397,190 patent/US4440107A/en not_active Expired - Lifetime
-
1983
- 1983-07-04 IL IL69153A patent/IL69153A/xx unknown
- 1983-07-07 AU AU16658/83A patent/AU556673B2/en not_active Ceased
- 1983-07-07 PH PH29189A patent/PH19759A/en unknown
- 1983-07-08 MX MX197984A patent/MX153562A/es unknown
- 1983-07-08 JP JP58124567A patent/JPS5923573A/ja active Granted
- 1983-07-08 IN IN845/CAL/83A patent/IN158687B/en unknown
- 1983-07-08 IE IE1602/83A patent/IE54608B1/en not_active IP Right Cessation
- 1983-07-08 AT AT83303993T patent/ATE19101T1/de not_active IP Right Cessation
- 1983-07-08 EP EP83303993A patent/EP0099708B1/en not_active Expired
- 1983-07-08 DE DE8383303993T patent/DE3362914D1/de not_active Expired
- 1983-07-11 ZA ZA835032A patent/ZA835032B/xx unknown
- 1983-07-12 CA CA000432237A patent/CA1189174A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| AU1665883A (en) | 1984-01-19 |
| PH19759A (en) | 1986-06-26 |
| ZA835032B (en) | 1984-04-25 |
| IE54608B1 (en) | 1989-12-06 |
| EP0099708A1 (en) | 1984-02-01 |
| DE3362914D1 (en) | 1986-05-15 |
| US4440107A (en) | 1984-04-03 |
| EP0099708B1 (en) | 1986-04-09 |
| CA1189174A (en) | 1985-06-18 |
| AU556673B2 (en) | 1986-11-13 |
| IL69153A0 (en) | 1983-11-30 |
| JPH0376595B2 (OSRAM) | 1991-12-05 |
| IE831602L (en) | 1984-01-12 |
| ATE19101T1 (de) | 1986-04-15 |
| IL69153A (en) | 1986-10-31 |
| MX153562A (es) | 1986-11-14 |
| JPS5923573A (ja) | 1984-02-07 |