IL97288A0 - Photosensitive formulations containing carbodiimide derivatives and processes for the preparation thereof - Google Patents

Photosensitive formulations containing carbodiimide derivatives and processes for the preparation thereof

Info

Publication number
IL97288A0
IL97288A0 IL97288A IL9728891A IL97288A0 IL 97288 A0 IL97288 A0 IL 97288A0 IL 97288 A IL97288 A IL 97288A IL 9728891 A IL9728891 A IL 9728891A IL 97288 A0 IL97288 A0 IL 97288A0
Authority
IL
Israel
Prior art keywords
processes
preparation
formulations containing
containing carbodiimide
carbodiimide derivatives
Prior art date
Application number
IL97288A
Other languages
English (en)
Original Assignee
Union Carbide Chem Plastic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Chem Plastic filed Critical Union Carbide Chem Plastic
Publication of IL97288A0 publication Critical patent/IL97288A0/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
IL97288A 1990-03-02 1991-02-20 Photosensitive formulations containing carbodiimide derivatives and processes for the preparation thereof IL97288A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/487,657 US5087547A (en) 1990-03-02 1990-03-02 Dual-tone photoresist utilizing diazonaphthoquinone resin and carbodiimide stabilizer

Publications (1)

Publication Number Publication Date
IL97288A0 true IL97288A0 (en) 1992-05-25

Family

ID=23936628

Family Applications (1)

Application Number Title Priority Date Filing Date
IL97288A IL97288A0 (en) 1990-03-02 1991-02-20 Photosensitive formulations containing carbodiimide derivatives and processes for the preparation thereof

Country Status (5)

Country Link
US (1) US5087547A (de)
EP (1) EP0446728A3 (de)
JP (1) JPH04217250A (de)
CA (1) CA2037385A1 (de)
IL (1) IL97288A0 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4106357A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial
EP0537524A1 (de) * 1991-10-17 1993-04-21 Shipley Company Inc. Strahlungsempfindliche Zusammensetzungen und Verfahren
JP3157692B2 (ja) * 1995-02-14 2001-04-16 日東電工株式会社 耐熱性フォトレジスト組成物およびネガ型パターン形成方法
US6941274B1 (en) * 1997-11-28 2005-09-06 Diebold, Incorporated Automated transaction machine
US6815308B2 (en) * 2002-08-15 2004-11-09 Micron Technology, Inc. Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
US20110262860A1 (en) * 2010-04-22 2011-10-27 Board Of Regents, The University Of Texas Novel dual-tone resist formulations and methods
US11592740B2 (en) * 2017-05-16 2023-02-28 Applied Materials, Inc. Wire grid polarizer manufacturing methods using frequency doubling interference lithography
WO2021053773A1 (ja) * 2019-09-18 2021-03-25 太陽ホールディングス株式会社 感光性硬化性組成物、ドライフィルム、硬化物、および電子部品
US12360453B2 (en) * 2019-11-19 2025-07-15 Merck Patent Gmbh PAG-free positive chemically amplified resist composition and methods of using the same
CN114153123B (zh) * 2021-12-10 2023-09-19 中国科学院光电技术研究所 光刻胶组合物及其应用
CN114995056A (zh) * 2022-04-27 2022-09-02 江苏长进微电子材料有限公司 一种基于酚醛树脂的图形反转光刻胶组合物及使用方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
US4377633A (en) * 1981-08-24 1983-03-22 International Business Machines Corporation Methods of simultaneous contact and metal lithography patterning
DE3337315A1 (de) * 1982-10-13 1984-04-19 Tokyo Ohka Kogyo Co., Ltd., Kawasaki, Kanagawa Zweifach-lichtempfindliche zusammensetzungen und verfahren zur erzeugung bildmustergemaesser photoresistschichten
CA1244589A (en) * 1983-02-24 1988-11-08 Union Carbide Corporation Low-temperature crosslinking of water-borne resins
US4546066A (en) * 1983-09-27 1985-10-08 International Business Machines Corporation Method for forming narrow images on semiconductor substrates
JPS6235350A (ja) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 像反転に有用な保存寿命の長いフオトレジスト
JPS62145240A (ja) * 1985-12-19 1987-06-29 Mitsubishi Electric Corp ポジ型感光性耐熱材料
DE3711264A1 (de) * 1987-04-03 1988-10-13 Hoechst Ag Lichtempfindliches gemisch und hieraus hergestelltes lichtempfindliches kopiermaterial

Also Published As

Publication number Publication date
JPH04217250A (ja) 1992-08-07
EP0446728A3 (en) 1992-04-29
CA2037385A1 (en) 1991-09-03
US5087547A (en) 1992-02-11
EP0446728A2 (de) 1991-09-18

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