IL84401A0 - Copper bath for electroless plating having excess counter-cation and process using same - Google Patents

Copper bath for electroless plating having excess counter-cation and process using same

Info

Publication number
IL84401A0
IL84401A0 IL84401A IL8440187A IL84401A0 IL 84401 A0 IL84401 A0 IL 84401A0 IL 84401 A IL84401 A IL 84401A IL 8440187 A IL8440187 A IL 8440187A IL 84401 A0 IL84401 A0 IL 84401A0
Authority
IL
Israel
Prior art keywords
cation
same
electroless plating
copper bath
excess counter
Prior art date
Application number
IL84401A
Other languages
English (en)
Original Assignee
Thiokol Morton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc
Publication of IL84401A0 publication Critical patent/IL84401A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1617—Purification and regeneration of coating baths
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00—Chemistry: electrical and wave energy
    • Y10S204/13—Purification and treatment of electroplating baths and plating wastes

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
IL84401A 1986-11-10 1987-11-08 Copper bath for electroless plating having excess counter-cation and process using same IL84401A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/929,242 US4762601A (en) 1986-11-10 1986-11-10 Copper bath for electroless plating having excess counter-cation and process using same

Publications (1)

Publication Number Publication Date
IL84401A0 true IL84401A0 (en) 1988-04-29

Family

ID=25457540

Family Applications (1)

Application Number Title Priority Date Filing Date
IL84401A IL84401A0 (en) 1986-11-10 1987-11-08 Copper bath for electroless plating having excess counter-cation and process using same

Country Status (7)

Country Link
US (1) US4762601A (cs)
EP (1) EP0267767A3 (cs)
JP (1) JPS63137177A (cs)
AU (1) AU8085187A (cs)
CA (1) CA1266401A (cs)
DK (1) DK584187A (cs)
IL (1) IL84401A0 (cs)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4933051A (en) * 1989-07-24 1990-06-12 Omi International Corporation Cyanide-free copper plating process
US5264097A (en) * 1991-03-29 1993-11-23 Vaughan Daniel J Electrodialytic conversion of complexes and salts of metal cations
US5266212A (en) * 1992-10-13 1993-11-30 Enthone-Omi, Inc. Purification of cyanide-free copper plating baths
DE4440299A1 (de) * 1994-11-11 1996-05-15 Metallgesellschaft Ag Verfahren zur stromlosen Abscheidung von Kupferüberzügen auf Eisen- und Eisenlegierungsoberflächen
US6224741B1 (en) * 1997-08-08 2001-05-01 Peremelec Electrode Ltd. Electrolyte process using a hydrogen storing metal member
US6303500B1 (en) * 1999-02-24 2001-10-16 Micron Technology, Inc. Method and apparatus for electroless plating a contact pad
JP2001107258A (ja) * 1999-10-06 2001-04-17 Hitachi Ltd 無電解銅めっき方法とめっき装置および多層配線基板
US6391177B1 (en) 2001-02-20 2002-05-21 David Crotty High temperature continuous electrodialysis of electroless plating solutions
US20050145498A1 (en) * 2003-12-31 2005-07-07 Clark James R. Apparatus and method for treating used electroless plating solutions
US6942810B2 (en) * 2003-12-31 2005-09-13 The Boc Group, Inc. Method for treating metal-containing solutions
DE102004002778C5 (de) * 2004-01-20 2017-04-20 Enthone Inc. Verfahren zur Regenerierung von Metallisierungsbädern
US7932094B2 (en) * 2008-08-07 2011-04-26 Eci Technology, Inc. Method and apparatus for determining the stability of an electroless plating bath

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754940A (en) * 1972-09-06 1973-08-28 Crown City Plating Co Electroless plating solutions containing sulfamic acid and salts thereof
US4289597A (en) * 1979-03-05 1981-09-15 Electrochem International, Inc. Process for electrodialytically regenerating an electroless plating bath by removing at least a portion of the reacted products
EP0015737B1 (en) * 1979-03-05 1983-05-11 Electrochem International, Inc. Process for the regeneration of electroless plating baths
US4324629A (en) * 1979-06-19 1982-04-13 Hitachi, Ltd. Process for regenerating chemical copper plating solution
US4549946A (en) * 1984-05-09 1985-10-29 Electrochem International, Inc. Process and an electrodialytic cell for electrodialytically regenerating a spent electroless copper plating bath
US4600493A (en) * 1985-01-14 1986-07-15 Morton Thiokol, Inc. Electrodialysis apparatus for the chemical maintenance of electroless copper plating baths
US4671861A (en) * 1986-03-31 1987-06-09 Morton Thiokol, Inc. Measurement and control of net caustic production during electrodialysis
JPS62268352A (ja) * 1986-05-14 1987-11-20 Hitachi Ltd ステツピングモ−タ

Also Published As

Publication number Publication date
DK584187A (da) 1988-05-11
JPH0251985B2 (cs) 1990-11-09
EP0267767A3 (en) 1989-08-09
CA1266401A (en) 1990-03-06
EP0267767A2 (en) 1988-05-18
US4762601A (en) 1988-08-09
AU8085187A (en) 1988-05-12
JPS63137177A (ja) 1988-06-09
DK584187D0 (da) 1987-11-06

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