IL84101A0 - Method and apparatus for constant angle of incidence scanning in ion beam systems - Google Patents
Method and apparatus for constant angle of incidence scanning in ion beam systemsInfo
- Publication number
- IL84101A0 IL84101A0 IL84101A IL8410187A IL84101A0 IL 84101 A0 IL84101 A0 IL 84101A0 IL 84101 A IL84101 A IL 84101A IL 8410187 A IL8410187 A IL 8410187A IL 84101 A0 IL84101 A0 IL 84101A0
- Authority
- IL
- Israel
- Prior art keywords
- ion beam
- constant angle
- beam systems
- incidence scanning
- incidence
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1477—Scanning means electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US91653486A | 1986-10-08 | 1986-10-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
IL84101A0 true IL84101A0 (en) | 1988-03-31 |
Family
ID=25437424
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL84101A IL84101A0 (en) | 1986-10-08 | 1987-10-05 | Method and apparatus for constant angle of incidence scanning in ion beam systems |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0287630A4 (xx) |
JP (1) | JPH01500942A (xx) |
IL (1) | IL84101A0 (xx) |
WO (1) | WO1988002920A1 (xx) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1987006391A1 (en) * | 1986-04-09 | 1987-10-22 | Eclipse Ion Technology, Inc. | Ion beam scanning method and apparatus |
US4922106A (en) * | 1986-04-09 | 1990-05-01 | Varian Associates, Inc. | Ion beam scanning method and apparatus |
SE463055B (sv) * | 1989-02-10 | 1990-10-01 | Scanditronix Ab | Anordning foer att bestraala artiklar med elektroner samt magnetisk lins foer avboejning av straalar av laddade partiklar, saerskilt elektroner |
US5132544A (en) * | 1990-08-29 | 1992-07-21 | Nissin Electric Company Ltd. | System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning |
US6222196B1 (en) * | 1998-11-19 | 2001-04-24 | Axcelis Technologies, Inc. | Rotatable workpiece support including cyclindrical workpiece support surfaces for an ion beam implanter |
US6677599B2 (en) | 2000-03-27 | 2004-01-13 | Applied Materials, Inc. | System and method for uniformly implanting a wafer with an ion beam |
US6661016B2 (en) | 2000-06-22 | 2003-12-09 | Proteros, Llc | Ion implantation uniformity correction using beam current control |
JP5535003B2 (ja) | 2010-08-18 | 2014-07-02 | 三菱電機株式会社 | 半導体ウエハ冷却装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3845312A (en) * | 1972-07-13 | 1974-10-29 | Texas Instruments Inc | Particle accelerator producing a uniformly expanded particle beam of uniform cross-sectioned density |
JPS53119670A (en) * | 1977-03-28 | 1978-10-19 | Toshiba Corp | Ion implanting method and apparatus for the same |
US4101813A (en) * | 1977-04-14 | 1978-07-18 | The United States Of America As Represented By The United States Department Of Energy | Double deflection system for an electron beam device |
US4117339A (en) * | 1977-07-01 | 1978-09-26 | Burroughs Corporation | Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices |
US4367411A (en) * | 1979-06-04 | 1983-01-04 | Varian Associates, Inc. | Unitary electromagnet for double deflection scanning of charged particle beam |
US4590379A (en) * | 1980-09-16 | 1986-05-20 | Martin Frederick W | Achromatic deflector and quadrupole lens |
US4282294A (en) * | 1980-10-06 | 1981-08-04 | Honeywell Inc. | Polyvinyl blocking layer for preventing charge injection in a thermoplastic photoconductive device for holography |
US4457359A (en) * | 1982-05-25 | 1984-07-03 | Varian Associates, Inc. | Apparatus for gas-assisted, solid-to-solid thermal transfer with a semiconductor wafer |
JPH0732108B2 (ja) * | 1982-07-28 | 1995-04-10 | 株式会社日立製作所 | 電子線露光装置 |
JPS5941828A (ja) * | 1982-09-01 | 1984-03-08 | Hitachi Ltd | イオン打込装置 |
JPS60240125A (ja) * | 1984-05-15 | 1985-11-29 | Fujitsu Ltd | 露光方法 |
US4661712A (en) * | 1985-05-28 | 1987-04-28 | Varian Associates, Inc. | Apparatus for scanning a high current ion beam with a constant angle of incidence |
US4700077A (en) * | 1986-03-05 | 1987-10-13 | Eaton Corporation | Ion beam implanter control system |
-
1987
- 1987-09-29 EP EP19870907058 patent/EP0287630A4/en not_active Withdrawn
- 1987-09-29 JP JP62506412A patent/JPH01500942A/ja active Pending
- 1987-09-29 WO PCT/US1987/002506 patent/WO1988002920A1/en not_active Application Discontinuation
- 1987-10-05 IL IL84101A patent/IL84101A0/xx unknown
Also Published As
Publication number | Publication date |
---|---|
EP0287630A4 (en) | 1989-07-25 |
EP0287630A1 (en) | 1988-10-26 |
JPH01500942A (ja) | 1989-03-30 |
WO1988002920A1 (en) | 1988-04-21 |
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