IL48294A - High power flowing gas laser - Google Patents
High power flowing gas laserInfo
- Publication number
- IL48294A IL48294A IL48294A IL4829475A IL48294A IL 48294 A IL48294 A IL 48294A IL 48294 A IL48294 A IL 48294A IL 4829475 A IL4829475 A IL 4829475A IL 48294 A IL48294 A IL 48294A
- Authority
- IL
- Israel
- Prior art keywords
- laser
- gas
- excitation region
- gas flow
- pressure
- Prior art date
Links
- 239000007789 gas Substances 0.000 claims description 146
- 230000005284 excitation Effects 0.000 claims description 51
- 238000010894 electron beam technology Methods 0.000 claims description 20
- 230000003287 optical effect Effects 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 3
- 230000005684 electric field Effects 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000011888 foil Substances 0.000 description 10
- 238000009499 grossing Methods 0.000 description 5
- 241000282887 Suidae Species 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000013016 damping Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 238000000638 solvent extraction Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 101150111878 Vegfd gene Proteins 0.000 description 1
- ROXBGBWUWZTYLZ-UHFFFAOYSA-N [6-[[10-formyl-5,14-dihydroxy-13-methyl-17-(5-oxo-2h-furan-3-yl)-2,3,4,6,7,8,9,11,12,15,16,17-dodecahydro-1h-cyclopenta[a]phenanthren-3-yl]oxy]-4-methoxy-2-methyloxan-3-yl] 4-[2-(4-azido-3-iodophenyl)ethylamino]-4-oxobutanoate Chemical compound O1C(C)C(OC(=O)CCC(=O)NCCC=2C=C(I)C(N=[N+]=[N-])=CC=2)C(OC)CC1OC(CC1(O)CCC2C3(O)CC4)CCC1(C=O)C2CCC3(C)C4C1=CC(=O)OC1 ROXBGBWUWZTYLZ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001609 comparable effect Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09707—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using an electron or ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0979—Gas dynamic lasers, i.e. with expansion of the laser gas medium to supersonic flow speeds
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Fluid Mechanics (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/521,715 US3970962A (en) | 1974-11-07 | 1974-11-07 | High power electrically excited flowing gas laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL48294A0 IL48294A0 (en) | 1976-01-30 |
| IL48294A true IL48294A (en) | 1977-04-29 |
Family
ID=24077836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL48294A IL48294A (en) | 1974-11-07 | 1975-10-14 | High power flowing gas laser |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3970962A (enExample) |
| JP (1) | JPS5245199B2 (enExample) |
| CA (1) | CA1031853A (enExample) |
| DE (1) | DE2546511C3 (enExample) |
| FR (1) | FR2290771A1 (enExample) |
| GB (1) | GB1485538A (enExample) |
| IL (1) | IL48294A (enExample) |
| IT (1) | IT1052206B (enExample) |
| SE (1) | SE414251B (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4156207A (en) * | 1974-11-11 | 1979-05-22 | Avco Everett Research Laboratory, Inc. | Wall dominated laser discharge using turbulent ambipolar diffusion |
| US4288756A (en) * | 1977-06-17 | 1981-09-08 | United Kingdom Atomic Energy Authority | CO2 Laser |
| US4196399A (en) * | 1978-01-09 | 1980-04-01 | The United States Of America As Represented By The Secretary Of The Army | Repetitively pulsed, cold cathode e-beam, self-switch laser |
| US4251781A (en) * | 1979-01-22 | 1981-02-17 | Hughes Aircraft Company | Electric discharge-excited flowing gas laser with discharge confinement shield |
| JPS57160185A (en) * | 1981-03-28 | 1982-10-02 | Tomoo Fujioka | Excitation method for discharge excitation type co gas laser and laser device thereof |
| US4771436A (en) * | 1986-07-29 | 1988-09-13 | Amada Engineering & Service Co., Inc. | Gas laser oscillator having a gas flow smoothing device to smooth gas flow in the electrical discharge region |
| US4866728A (en) * | 1987-01-12 | 1989-09-12 | Jeco2 Lasers, Inc. | Electric discharge apparatus |
| US4894838A (en) * | 1988-10-19 | 1990-01-16 | Robert Kraft | Electron beam preionization of a high pressure self-sustaining gas laser |
| US5214658A (en) * | 1990-07-27 | 1993-05-25 | Ion Laser Technology | Mixed gas ion laser |
| US6008264A (en) | 1997-04-30 | 1999-12-28 | Laser Med, Inc. | Method for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation |
| US6282013B1 (en) | 1997-04-30 | 2001-08-28 | Lasermed, Inc. | System for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation |
| JP2001520913A (ja) | 1997-10-29 | 2001-11-06 | ビスコ インコーポレイテッド | 歯科用の複合材の光硬化システム |
| US6116900A (en) * | 1997-11-17 | 2000-09-12 | Lumachem, Inc. | Binary energizer and peroxide delivery system for dental bleaching |
| US6200134B1 (en) | 1998-01-20 | 2001-03-13 | Kerr Corporation | Apparatus and method for curing materials with radiation |
| US6157661A (en) * | 1999-05-12 | 2000-12-05 | Laserphysics, Inc. | System for producing a pulsed, varied and modulated laser output |
| RU2255398C2 (ru) * | 2003-06-02 | 2005-06-27 | Чурбаков Сергей Васильевич | Способ возбуждения молекул и атомов газа и устройство для его осуществления |
| US9066777B2 (en) | 2009-04-02 | 2015-06-30 | Kerr Corporation | Curing light device |
| US9072572B2 (en) | 2009-04-02 | 2015-07-07 | Kerr Corporation | Dental light device |
| NL2008184A (en) | 2011-02-28 | 2012-08-29 | Asml Netherlands Bv | Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
| CN116111428A (zh) * | 2021-11-11 | 2023-05-12 | 北京科益虹源光电技术有限公司 | 流道宽度可调节的放电腔及其激光器 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3600704A (en) * | 1968-02-23 | 1971-08-17 | United Aircraft Corp | Gas laser |
| US3886477A (en) * | 1968-10-29 | 1975-05-27 | United Aircraft Corp | Closed cycle device |
| US3842363A (en) * | 1972-10-24 | 1974-10-15 | Us Air Force | Chemical laser nozzle system |
-
1974
- 1974-11-07 US US05/521,715 patent/US3970962A/en not_active Expired - Lifetime
-
1975
- 1975-10-14 IL IL48294A patent/IL48294A/en unknown
- 1975-10-16 GB GB42461/75A patent/GB1485538A/en not_active Expired
- 1975-10-17 DE DE2546511A patent/DE2546511C3/de not_active Expired
- 1975-11-04 FR FR7533690A patent/FR2290771A1/fr active Granted
- 1975-11-04 SE SE7512333A patent/SE414251B/xx not_active IP Right Cessation
- 1975-11-05 IT IT52066/75A patent/IT1052206B/it active
- 1975-11-06 CA CA239,125A patent/CA1031853A/en not_active Expired
- 1975-11-07 JP JP50133136A patent/JPS5245199B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2546511A1 (de) | 1976-05-13 |
| FR2290771B1 (enExample) | 1978-05-12 |
| JPS5245199B2 (enExample) | 1977-11-14 |
| SE414251B (sv) | 1980-07-14 |
| DE2546511B2 (de) | 1980-05-29 |
| IL48294A0 (en) | 1976-01-30 |
| DE2546511C3 (de) | 1981-02-05 |
| CA1031853A (en) | 1978-05-23 |
| JPS5169997A (enExample) | 1976-06-17 |
| SE7512333L (sv) | 1976-05-10 |
| US3970962A (en) | 1976-07-20 |
| FR2290771A1 (fr) | 1976-06-04 |
| IT1052206B (it) | 1981-06-20 |
| GB1485538A (en) | 1977-09-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3970962A (en) | High power electrically excited flowing gas laser | |
| US3962656A (en) | High power flowing gas laser with profiled electron beam excitation | |
| US6198762B1 (en) | Supersonic and subsonic laser with RF discharge excitation | |
| US4088966A (en) | Non-equilibrium plasma glow jet | |
| US4064465A (en) | Laser cavities with gas flow through the electrodes | |
| US5853815A (en) | Method of forming uniform thin coatings on large substrates | |
| US6636545B2 (en) | Supersonic and subsonic laser with radio frequency excitation | |
| US3720885A (en) | Transverse flow carbon dioxide laser system | |
| DE69633292T2 (de) | Überschall- und unterschalllaser mit rf-entladungsanregung | |
| JPS5812755B2 (ja) | 電気励起式レ−ザ装置 | |
| US4449220A (en) | Apparatus and method for deposition of electrical power in an electric discharge laser | |
| US3860887A (en) | Electrically excited high power flowing gas devices such as lasers and the like | |
| CA1232052A (en) | Forced transport molecular gas laser and method | |
| US4635269A (en) | Flowing gas laser having screening for smoothing low turbulence flow | |
| US4077018A (en) | High power gas transport laser | |
| US3633125A (en) | Gas laser with means for specifically creating and maintaining turbulence in the gaseous laser medium | |
| US3952266A (en) | Gaseous flux laser generator with pre-ionization gas injection nozzle | |
| US8689537B1 (en) | Micro-cavity discharge thruster (MCDT) | |
| IL48295A (en) | High power flowing gas laser | |
| US4260958A (en) | Apparatus and method for deposition of electrical power in an electric discharge laser | |
| US4412333A (en) | Three-electrode low pressure discharge apparatus and method for uniform ionization of gaseous media | |
| US3614656A (en) | Gas laser | |
| US3795838A (en) | Aerodynamic large volume gaseous electric discharge system | |
| US3735284A (en) | Aerodynamic large volume gaseous electric discharge system | |
| US4558450A (en) | Cathode bleed arrangement for electrically excited flowing gas lasers |