IL36656A - Process for depositing precious metals on a metallic support,metallic supports produced thereby and electrochemical cells containing said supports - Google Patents

Process for depositing precious metals on a metallic support,metallic supports produced thereby and electrochemical cells containing said supports

Info

Publication number
IL36656A
IL36656A IL36656A IL3665671A IL36656A IL 36656 A IL36656 A IL 36656A IL 36656 A IL36656 A IL 36656A IL 3665671 A IL3665671 A IL 3665671A IL 36656 A IL36656 A IL 36656A
Authority
IL
Israel
Prior art keywords
supports
metallic
cells containing
electrochemical cells
precious metals
Prior art date
Application number
IL36656A
Other languages
English (en)
Other versions
IL36656A0 (en
Original Assignee
Progil
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Progil filed Critical Progil
Publication of IL36656A0 publication Critical patent/IL36656A0/xx
Publication of IL36656A publication Critical patent/IL36656A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/488—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with retarding grids
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inert Electrodes (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
IL36656A 1970-04-21 1971-04-20 Process for depositing precious metals on a metallic support,metallic supports produced thereby and electrochemical cells containing said supports IL36656A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7014327A FR2088659A5 (enrdf_load_stackoverflow) 1970-04-21 1970-04-21

Publications (2)

Publication Number Publication Date
IL36656A0 IL36656A0 (en) 1971-06-23
IL36656A true IL36656A (en) 1974-01-14

Family

ID=9054289

Family Applications (1)

Application Number Title Priority Date Filing Date
IL36656A IL36656A (en) 1970-04-21 1971-04-20 Process for depositing precious metals on a metallic support,metallic supports produced thereby and electrochemical cells containing said supports

Country Status (17)

Country Link
US (1) US3773639A (enrdf_load_stackoverflow)
JP (1) JPS5324914B1 (enrdf_load_stackoverflow)
AT (1) AT304990B (enrdf_load_stackoverflow)
BE (1) BE766023A (enrdf_load_stackoverflow)
BR (1) BR7102391D0 (enrdf_load_stackoverflow)
CA (1) CA933881A (enrdf_load_stackoverflow)
CH (1) CH524690A (enrdf_load_stackoverflow)
DE (1) DE2119066A1 (enrdf_load_stackoverflow)
ES (1) ES390345A1 (enrdf_load_stackoverflow)
FR (1) FR2088659A5 (enrdf_load_stackoverflow)
GB (1) GB1307956A (enrdf_load_stackoverflow)
IL (1) IL36656A (enrdf_load_stackoverflow)
LU (1) LU63024A1 (enrdf_load_stackoverflow)
NL (1) NL7105157A (enrdf_load_stackoverflow)
PL (1) PL83268B1 (enrdf_load_stackoverflow)
RO (1) RO61059A (enrdf_load_stackoverflow)
SE (1) SE366345B (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2320565A1 (fr) * 1973-04-12 1977-03-04 Radiotechnique Compelec Plaque a transparence selective et son procede de fabrication
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
DE2630883C2 (de) * 1976-07-09 1985-02-07 Basf Ag, 6700 Ludwigshafen Verwendung einer nach dem Plasma- oder Flammspritzverfahren auf einem metallischen Träger aufgebrachten porösen anorganische Oxide enthaltenden Schicht als Diaphragma in einer Elektrolysezelle
AU5889880A (en) * 1979-07-02 1981-01-15 Olin Corporation Manufacture of low overvoltage electrodes by cathodic sputtering
US4400255A (en) * 1981-06-29 1983-08-23 General Motors Corporation Control of electron bombardment of the exhaust oxygen sensor during electrode sputtering
US4420385A (en) * 1983-04-15 1983-12-13 Gryphon Products Apparatus and process for sputter deposition of reacted thin films
US5391275A (en) * 1990-03-02 1995-02-21 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
EP0446657B1 (en) * 1990-03-02 1995-07-26 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5202008A (en) * 1990-03-02 1993-04-13 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5429843A (en) * 1991-11-21 1995-07-04 Nisshin Steel Co., Ltd. Vapor deposition for formation of plating layer
EP0593372B1 (en) * 1992-10-14 2001-09-19 Daiki Engineering Co., Ltd. Highly durable electrodes for eletrolysis and a method for preparation thereof
CA2154428C (fr) * 1995-07-21 2005-03-22 Robert Schulz Alliages a base de ti, ru, fe et o et usage de ceux-ci pour la fabrication de cathodes pour la synthese electrochimique du chlorate de sodium
FR2861219B1 (fr) * 2003-10-15 2006-04-07 Commissariat Energie Atomique Pile a combustible alcaline comportant une anode comprenant de l'aluminium et du zinc et procede de fabrication de l'anode
US20050205415A1 (en) * 2004-03-19 2005-09-22 Belousov Igor V Multi-component deposition
ITMI20091621A1 (it) 2009-09-23 2011-03-24 Industrie De Nora Spa Elettrodo per processi elettrolitici con struttura cristallina controllata
JP4734664B1 (ja) * 2010-09-17 2011-07-27 田中貴金属工業株式会社 電解用電極、オゾン電解生成用陽極、過硫酸電解生成用陽極及びクロム電解酸化用陽極
RU2562462C1 (ru) * 2014-05-30 2015-09-10 Общество с ограниченной ответственностью "Эй Ти Энерджи", ООО "Эй Ти Энерджи" Способ изготовления катализатора на основе платины и катализатор на основе платины
WO2015183128A1 (ru) * 2014-05-30 2015-12-03 Общество С Ограниченной Ответственностью "Эй Ти Энерджи" Способ изготовления катализатора на основе платины и катализатор на основе платины

Also Published As

Publication number Publication date
BR7102391D0 (pt) 1973-05-03
ES390345A1 (es) 1973-06-01
CA933881A (en) 1973-09-18
CH524690A (fr) 1972-06-30
SE366345B (enrdf_load_stackoverflow) 1974-04-22
RO61059A (enrdf_load_stackoverflow) 1976-10-15
DE2119066A1 (de) 1971-11-04
JPS5324914B1 (enrdf_load_stackoverflow) 1978-07-24
NL7105157A (enrdf_load_stackoverflow) 1971-10-25
PL83268B1 (enrdf_load_stackoverflow) 1975-12-31
FR2088659A5 (enrdf_load_stackoverflow) 1972-01-07
IL36656A0 (en) 1971-06-23
US3773639A (en) 1973-11-20
AT304990B (de) 1973-02-12
LU63024A1 (enrdf_load_stackoverflow) 1972-12-11
GB1307956A (en) 1973-02-21
BE766023A (fr) 1971-10-20

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