IL291508A - Electron gun, electron beam applicator, emission axis verification method for an electron beam emitted from a photocathode, and emission axis alignment method for an electron beam emitted from a photocathode - Google Patents
Electron gun, electron beam applicator, emission axis verification method for an electron beam emitted from a photocathode, and emission axis alignment method for an electron beam emitted from a photocathodeInfo
- Publication number
- IL291508A IL291508A IL291508A IL29150822A IL291508A IL 291508 A IL291508 A IL 291508A IL 291508 A IL291508 A IL 291508A IL 29150822 A IL29150822 A IL 29150822A IL 291508 A IL291508 A IL 291508A
- Authority
- IL
- Israel
- Prior art keywords
- electron beam
- photocathode
- emission axis
- beam emitted
- electron
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 title 3
- 238000000034 method Methods 0.000 title 2
- 238000012795 verification Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/34—Photo-emissive cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/52—Screens for shielding; Guides for influencing the discharge; Masks interposed in the electron stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/10—Arrangements for centring ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/26—Arrangements for deflecting ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
- H01J2237/06333—Photo emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06375—Arrangement of electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
- H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019173319 | 2019-09-24 | ||
| PCT/JP2020/033515 WO2021059918A1 (fr) | 2019-09-24 | 2020-09-04 | Canon à électrons, dispositif d'application de faisceau d'électrons, procédé de vérification de l'axe d'émission d'un faisceau d'électrons émis par une photocathode, et procédé d'alignement de l'axe d'émission d'un faisceau d'électrons émis par une photocathode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL291508A true IL291508A (en) | 2022-05-01 |
Family
ID=75166598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL291508A IL291508A (en) | 2019-09-24 | 2022-03-20 | Electron gun, electron beam applicator, emission axis verification method for an electron beam emitted from a photocathode, and emission axis alignment method for an electron beam emitted from a photocathode |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US12080507B2 (fr) |
| EP (1) | EP4036953B1 (fr) |
| JP (1) | JP7531920B2 (fr) |
| KR (1) | KR20220069009A (fr) |
| CN (1) | CN114303223A (fr) |
| IL (1) | IL291508A (fr) |
| TW (1) | TW202119450A (fr) |
| WO (1) | WO2021059918A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6828937B1 (ja) * | 2020-09-09 | 2021-02-10 | 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ | 電子銃、電子銃用部品、電子線適用装置、および位置合わせ方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3487320A (en) | 1967-10-24 | 1969-12-30 | Ibm | Biased bridge coupled bipolar amplifier |
| US4820927A (en) * | 1985-06-28 | 1989-04-11 | Control Data Corporation | Electron beam source employing a photo-emitter cathode |
| JPS62234849A (ja) * | 1986-04-03 | 1987-10-15 | Mitsubishi Electric Corp | 電子銃 |
| JPH01183044A (ja) * | 1988-01-08 | 1989-07-20 | Jeol Ltd | プローブ電流安定化装置 |
| JP2001143648A (ja) * | 1999-11-17 | 2001-05-25 | Hitachi Ltd | 光励起電子線源および電子線応用装置 |
| US6555830B1 (en) * | 2000-08-15 | 2003-04-29 | Applied Materials, Inc. | Suppression of emission noise for microcolumn applications in electron beam inspection |
| JP3537779B2 (ja) | 2001-04-13 | 2004-06-14 | 住友重機械工業株式会社 | フォトカソードの製作方法 |
| JP2004134300A (ja) * | 2002-10-11 | 2004-04-30 | Shimadzu Corp | ビーム電流安定化装置及び荷電粒子ビーム装置 |
| JP4728173B2 (ja) * | 2006-06-08 | 2011-07-20 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡の電子ビーム軸調整方法および走査電子顕微鏡 |
| JP4604096B2 (ja) * | 2008-02-29 | 2010-12-22 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| JP2010125467A (ja) | 2008-11-26 | 2010-06-10 | Nec Control Systems Ltd | 電子ビーム加工装置及び電子ビーム加工方法、並びに、電子ビーム照射装置及び電子ビーム照射方法 |
| JP5394763B2 (ja) | 2009-02-04 | 2014-01-22 | 日本電子株式会社 | 冷陰極電子銃の自動入射軸合わせ方法 |
| WO2014057570A1 (fr) * | 2012-10-12 | 2014-04-17 | 株式会社 日立ハイテクノロジーズ | Procédé de fabrication de source d'électrons |
| JP5808021B2 (ja) | 2013-07-16 | 2015-11-10 | 国立大学法人名古屋大学 | 電子親和力の低下処理装置に用いられる活性化容器及びキット、該キットを含む電子親和力の低下処理装置、フォトカソード電子ビーム源、並びに、フォトカソード電子ビーム源を含む電子銃、自由電子レーザー加速器、透過型電子顕微鏡、走査型電子顕微鏡、電子線ホログラフィー顕微鏡、電子線描画装置、電子線回折装置及び電子線検査装置 |
| US9728931B2 (en) | 2013-12-05 | 2017-08-08 | Asml Netherlands B.V. | Electron injector and free electron laser |
| US11302507B2 (en) | 2017-04-05 | 2022-04-12 | Photo Electron Soul Inc. | Electron beam generator and electron beam applicator |
| JP6779246B2 (ja) | 2018-03-02 | 2020-11-04 | 株式会社栗本鐵工所 | 分級機能付き粉砕装置及び被処理物の粉砕方法 |
| JP6466020B1 (ja) | 2018-10-16 | 2019-02-06 | 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ | 電子銃、電子線適用装置、電子銃による電子射出方法、および、電子ビームの焦点位置調整方法 |
-
2020
- 2020-09-04 WO PCT/JP2020/033515 patent/WO2021059918A1/fr unknown
- 2020-09-04 CN CN202080059386.7A patent/CN114303223A/zh active Pending
- 2020-09-04 US US17/763,186 patent/US12080507B2/en active Active
- 2020-09-04 TW TW109130458A patent/TW202119450A/zh unknown
- 2020-09-04 EP EP20869775.5A patent/EP4036953B1/fr active Active
- 2020-09-04 KR KR1020227009869A patent/KR20220069009A/ko unknown
- 2020-09-04 JP JP2021548743A patent/JP7531920B2/ja active Active
-
2022
- 2022-03-20 IL IL291508A patent/IL291508A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP4036953A4 (fr) | 2022-11-23 |
| TW202119450A (zh) | 2021-05-16 |
| US20220359146A1 (en) | 2022-11-10 |
| CN114303223A (zh) | 2022-04-08 |
| JPWO2021059918A1 (fr) | 2021-04-01 |
| KR20220069009A (ko) | 2022-05-26 |
| JP7531920B2 (ja) | 2024-08-13 |
| WO2021059918A1 (fr) | 2021-04-01 |
| US12080507B2 (en) | 2024-09-03 |
| EP4036953B1 (fr) | 2024-04-03 |
| EP4036953A1 (fr) | 2022-08-03 |
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