TWI800648B - 控制電子束之方法及系統，以及非暫時性電腦可讀儲存媒體 - Google Patents

控制電子束之方法及系統，以及非暫時性電腦可讀儲存媒體 Download PDF

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Publication number
TWI800648B
TWI800648B TW108117023A TW108117023A TWI800648B TW I800648 B TWI800648 B TW I800648B TW 108117023 A TW108117023 A TW 108117023A TW 108117023 A TW108117023 A TW 108117023A TW I800648 B TWI800648 B TW I800648B
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TW
Taiwan
Prior art keywords
storage medium
readable storage
transitory computer
electron beams
controlling electron
Prior art date
Application number
TW108117023A
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English (en)
Other versions
TW202004175A (zh
Inventor
克里斯多福 希爾斯
魯卡 葛瑞拉
Original Assignee
美商克萊譚克公司
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Publication of TW202004175A publication Critical patent/TW202004175A/zh
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Publication of TWI800648B publication Critical patent/TWI800648B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/224—Luminescent screens or photographic plates for imaging ; Apparatus specially adapted therefor, e.g. cameras, TV-cameras, photographic equipment, exposure control; Optical subsystems specially adapted therefor, e.g. microscopes for observing image on luminescent screen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2826—Calibration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW108117023A 2018-05-29 2019-05-17 控制電子束之方法及系統，以及非暫時性電腦可讀儲存媒體 TWI800648B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201862677551P 2018-05-29 2018-05-29
US62/677,551 2018-05-29
US16/112,832 US11087950B2 (en) 2018-05-29 2018-08-27 Charge control device for a system with multiple electron beams
US16/112,832 2018-08-27

Publications (2)

Publication Number Publication Date
TW202004175A TW202004175A (zh) 2020-01-16
TWI800648B true TWI800648B (zh) 2023-05-01

Family

ID=68694204

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108117023A TWI800648B (zh) 2018-05-29 2019-05-17 控制電子束之方法及系統，以及非暫時性電腦可讀儲存媒體

Country Status (5)

Country Link
US (1) US11087950B2 (zh)
CN (1) CN112074925B (zh)
IL (1) IL278808A (zh)
TW (1) TWI800648B (zh)
WO (1) WO2019231866A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA3168745A1 (en) * 2020-02-20 2021-08-26 Arjen Benjamin Storm Tool for testing an electron-optical assembly
CN111584332A (zh) * 2020-06-17 2020-08-25 西安中科英威特光电技术有限公司 一种电子轰击成像型光电器件及高速相机
US11640896B2 (en) * 2021-05-13 2023-05-02 Nuflare Technology, Inc. Method and apparatus for Schottky TFE inspection

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040159787A1 (en) * 2002-08-30 2004-08-19 Mamoru Nakasuji Electron beam system
US20150083911A1 (en) * 2013-09-26 2015-03-26 Carl Zeiss Microscopy Gmbh Method of Detecting Electrons, an Electron-Detector and an Inspection System
TW201614706A (en) * 2014-09-04 2016-04-16 Univ Delft Tech Multi electron beam inspection apparatus
US20180040452A1 (en) * 2015-02-05 2018-02-08 Ebara Corporation Inspection device

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09139184A (ja) * 1995-11-15 1997-05-27 Nikon Corp 静電偏向器の製造方法
EP1150327B1 (en) * 2000-04-27 2018-02-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi beam charged particle device
US6552340B1 (en) * 2000-10-12 2003-04-22 Nion Co. Autoadjusting charged-particle probe-forming apparatus
JP4390096B2 (ja) * 2001-07-06 2009-12-24 富士フイルム株式会社 内視鏡装置
JP2004363085A (ja) 2003-05-09 2004-12-24 Ebara Corp 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法
US7146084B2 (en) * 2003-06-16 2006-12-05 Cmc Electronics, Inc. Fiber optic light source for display devices
EP2575143B8 (en) * 2003-09-05 2019-05-22 Carl Zeiss Microscopy GmbH Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
TWI458967B (zh) * 2005-02-17 2014-11-01 Ebara Corp 電子射線裝置
US7504622B2 (en) * 2006-04-03 2009-03-17 Applied Materials, Israel, Ltd. High throughput multi beam detection system and method
JP2007335125A (ja) 2006-06-13 2007-12-27 Ebara Corp 電子線装置
US8536538B2 (en) * 2011-02-16 2013-09-17 Kla-Tencor Corporation Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments
US9691588B2 (en) * 2015-03-10 2017-06-27 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
CN107533943B (zh) * 2015-05-08 2019-12-10 科磊股份有限公司 用于电子束系统中像差校正的方法及系统
WO2017053812A1 (en) * 2015-09-23 2017-03-30 Kla-Tencor Corporation Method and system for focus adjustment a multi-beam scanning electron microscopy system
US9620329B1 (en) * 2015-11-20 2017-04-11 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electrostatic multipole device, electrostatic multipole arrangement, charged particle beam device, and method of manufacturing an electrostatic multipole device
US9754759B2 (en) * 2015-11-20 2017-09-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electrostatic multipole device, electrostatic multipole arrangement, and method of manufacturing an electrostatic multipole device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040159787A1 (en) * 2002-08-30 2004-08-19 Mamoru Nakasuji Electron beam system
US20150083911A1 (en) * 2013-09-26 2015-03-26 Carl Zeiss Microscopy Gmbh Method of Detecting Electrons, an Electron-Detector and an Inspection System
TW201614706A (en) * 2014-09-04 2016-04-16 Univ Delft Tech Multi electron beam inspection apparatus
US20180040452A1 (en) * 2015-02-05 2018-02-08 Ebara Corporation Inspection device

Also Published As

Publication number Publication date
US11087950B2 (en) 2021-08-10
IL278808A (en) 2021-01-31
CN112074925A (zh) 2020-12-11
US20190371566A1 (en) 2019-12-05
TW202004175A (zh) 2020-01-16
CN112074925B (zh) 2022-06-07
KR20210002360A (ko) 2021-01-07
WO2019231866A1 (en) 2019-12-05

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