IL272196B2 - מערכות ושיטות לפיצוי פיזור של מפצל אלומה במתקן רב-אלומתי - Google Patents
מערכות ושיטות לפיצוי פיזור של מפצל אלומה במתקן רב-אלומתיInfo
- Publication number
- IL272196B2 IL272196B2 IL272196A IL27219620A IL272196B2 IL 272196 B2 IL272196 B2 IL 272196B2 IL 272196 A IL272196 A IL 272196A IL 27219620 A IL27219620 A IL 27219620A IL 272196 B2 IL272196 B2 IL 272196B2
- Authority
- IL
- Israel
- Prior art keywords
- primary
- charged particle
- dispersion
- dispersion device
- separator
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/14—Lenses magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/151—Electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/152—Magnetic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1532—Astigmatism
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2806—Secondary charged particle
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Beam Exposure (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762538609P | 2017-07-28 | 2017-07-28 | |
| PCT/EP2018/068980 WO2019020396A1 (en) | 2017-07-28 | 2018-07-12 | SYSTEMS AND METHODS FOR DISPERSION COMPENSATION OF A BEAM SEPARATOR IN A MULTI-BEAM APPARATUS |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| IL272196A IL272196A (he) | 2020-03-31 |
| IL272196B1 IL272196B1 (he) | 2024-11-01 |
| IL272196B2 true IL272196B2 (he) | 2025-03-01 |
Family
ID=62916674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL272196A IL272196B2 (he) | 2017-07-28 | 2018-07-12 | מערכות ושיטות לפיצוי פיזור של מפצל אלומה במתקן רב-אלומתי |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US11328894B2 (he) |
| EP (1) | EP3659172A1 (he) |
| JP (2) | JP7135009B2 (he) |
| KR (3) | KR20200020921A (he) |
| CN (2) | CN110945621B (he) |
| IL (1) | IL272196B2 (he) |
| TW (4) | TW202501531A (he) |
| WO (1) | WO2019020396A1 (he) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113192815B (zh) * | 2016-01-27 | 2024-10-29 | Asml荷兰有限公司 | 多个带电粒子束的装置 |
| WO2020030483A1 (en) | 2018-08-09 | 2020-02-13 | Asml Netherlands B.V. | An apparatus for multiple charged-particle beams |
| DE102020107738B3 (de) * | 2020-03-20 | 2021-01-14 | Carl Zeiss Multisem Gmbh | Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren |
| US20210305007A1 (en) * | 2020-03-30 | 2021-09-30 | Fei Company | Dual beam bifocal charged particle microscope |
| JP7381432B2 (ja) * | 2020-10-28 | 2023-11-15 | 株式会社日立ハイテク | 荷電粒子線装置 |
| EP4086934A1 (en) * | 2021-05-04 | 2022-11-09 | ASML Netherlands B.V. | Electron optical column and method for directing a beam of primary electrons onto a sample |
| KR20230123969A (ko) * | 2020-12-22 | 2023-08-24 | 에이에스엠엘 네델란즈 비.브이. | 1차 전자 빔을 샘플로 지향시키기 위한 전자 광학 컬럼 및 방법 |
| US11705301B2 (en) * | 2021-01-19 | 2023-07-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam manipulation device and method for manipulating charged particle beamlets |
| US11495433B1 (en) * | 2021-04-15 | 2022-11-08 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen |
| KR20230148212A (ko) * | 2021-05-11 | 2023-10-24 | 가부시키가이샤 뉴플레어 테크놀로지 | 멀티 전자 빔 화상 취득 장치 및 멀티 전자 빔 화상 취득 방법 |
| JP2023046921A (ja) * | 2021-09-24 | 2023-04-05 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090218506A1 (en) * | 2005-07-26 | 2009-09-03 | Ebara Corporation | Electron beam apparatus |
| EP2405460A1 (en) * | 2010-07-09 | 2012-01-11 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron beam device with tilting and dispersion compensation, and method of operating same |
| US20150155134A1 (en) * | 2013-12-02 | 2015-06-04 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH | Multi-beam system for high throughput ebi |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69903439T2 (de) | 1999-11-12 | 2003-07-03 | Advantest Corp., Tokio/Tokyo | Ablenkeinheit zur Separation zweier Teilchenstrahlen |
| EP1668662B1 (en) | 2003-09-05 | 2012-10-31 | Carl Zeiss SMT GmbH | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| JP2006244875A (ja) | 2005-03-03 | 2006-09-14 | Ebara Corp | 写像投影型の電子線装置及び該装置を用いた欠陥検査システム |
| JP2007035386A (ja) * | 2005-07-26 | 2007-02-08 | Ebara Corp | 電子線装置及び該装置を用いたデバイス製造方法 |
| JP2008135336A (ja) * | 2006-11-29 | 2008-06-12 | Jeol Ltd | ウィーンフィルタ |
| EP2132763B1 (en) * | 2007-02-22 | 2014-05-07 | Applied Materials Israel Ltd. | High throughput sem tool |
| EP2128885A1 (en) * | 2008-05-26 | 2009-12-02 | FEI Company | Charged particle source with integrated energy filter |
| EP2385542B1 (en) * | 2010-05-07 | 2013-01-02 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron beam device with dispersion compensation, and method of operating same |
| US8183526B1 (en) | 2011-02-11 | 2012-05-22 | Electron Optica | Mirror monochromator for charged particle beam apparatus |
| US8274046B1 (en) * | 2011-05-19 | 2012-09-25 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
| JP6002470B2 (ja) * | 2012-06-28 | 2016-10-05 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US8729466B1 (en) * | 2013-03-14 | 2014-05-20 | Electron Optica, Inc. | Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination |
| US10121635B2 (en) * | 2013-09-30 | 2018-11-06 | Carl Zeiss Microscopy Gmbh | Charged particle beam system and method of operating the same |
| JP6210931B2 (ja) * | 2014-05-13 | 2017-10-11 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US9595417B2 (en) * | 2014-12-22 | 2017-03-14 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | High resolution charged particle beam device and method of operating the same |
| JP6554288B2 (ja) | 2015-01-26 | 2019-07-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US9905391B2 (en) * | 2015-04-29 | 2018-02-27 | Kla-Tencor Corporation | System and method for imaging a sample with an electron beam with a filtered energy spread |
-
2018
- 2018-07-12 IL IL272196A patent/IL272196B2/he unknown
- 2018-07-12 KR KR1020207002554A patent/KR20200020921A/ko not_active Ceased
- 2018-07-12 KR KR1020247009044A patent/KR20240042162A/ko active Pending
- 2018-07-12 KR KR1020237002181A patent/KR102650124B1/ko active Active
- 2018-07-12 CN CN201880048462.7A patent/CN110945621B/zh active Active
- 2018-07-12 JP JP2019570815A patent/JP7135009B2/ja active Active
- 2018-07-12 EP EP18740812.5A patent/EP3659172A1/en active Pending
- 2018-07-12 WO PCT/EP2018/068980 patent/WO2019020396A1/en not_active Ceased
- 2018-07-12 CN CN202211651256.XA patent/CN115881498A/zh active Pending
- 2018-07-25 TW TW113107741A patent/TW202501531A/zh unknown
- 2018-07-25 TW TW108145372A patent/TWI747099B/zh active
- 2018-07-25 TW TW107125610A patent/TWI682422B/zh active
- 2018-07-25 TW TW110140028A patent/TWI836284B/zh active
- 2018-07-27 US US16/047,987 patent/US11328894B2/en active Active
-
2022
- 2022-05-09 US US17/662,453 patent/US12469668B2/en active Active
- 2022-08-31 JP JP2022138254A patent/JP7526234B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090218506A1 (en) * | 2005-07-26 | 2009-09-03 | Ebara Corporation | Electron beam apparatus |
| EP2405460A1 (en) * | 2010-07-09 | 2012-01-11 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron beam device with tilting and dispersion compensation, and method of operating same |
| US20150155134A1 (en) * | 2013-12-02 | 2015-06-04 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH | Multi-beam system for high throughput ebi |
Also Published As
| Publication number | Publication date |
|---|---|
| IL272196A (he) | 2020-03-31 |
| US20220262594A1 (en) | 2022-08-18 |
| TW202501531A (zh) | 2025-01-01 |
| JP2022172256A (ja) | 2022-11-15 |
| TW202030761A (zh) | 2020-08-16 |
| CN110945621A (zh) | 2020-03-31 |
| CN110945621B (zh) | 2023-01-03 |
| TWI836284B (zh) | 2024-03-21 |
| KR20200020921A (ko) | 2020-02-26 |
| US11328894B2 (en) | 2022-05-10 |
| US12469668B2 (en) | 2025-11-11 |
| US20190035595A1 (en) | 2019-01-31 |
| KR102650124B1 (ko) | 2024-03-22 |
| WO2019020396A1 (en) | 2019-01-31 |
| TW201921406A (zh) | 2019-06-01 |
| TWI747099B (zh) | 2021-11-21 |
| KR20240042162A (ko) | 2024-04-01 |
| JP7135009B2 (ja) | 2022-09-12 |
| EP3659172A1 (en) | 2020-06-03 |
| IL272196B1 (he) | 2024-11-01 |
| KR20230016709A (ko) | 2023-02-02 |
| JP2020528197A (ja) | 2020-09-17 |
| TWI682422B (zh) | 2020-01-11 |
| JP7526234B2 (ja) | 2024-07-31 |
| CN115881498A (zh) | 2023-03-31 |
| TW202232555A (zh) | 2022-08-16 |
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