IL191885A0 - Multiple - Google Patents

Multiple

Info

Publication number
IL191885A0
IL191885A0 IL191885A IL19188508A IL191885A0 IL 191885 A0 IL191885 A0 IL 191885A0 IL 191885 A IL191885 A IL 191885A IL 19188508 A IL19188508 A IL 19188508A IL 191885 A0 IL191885 A0 IL 191885A0
Authority
IL
Israel
Application number
IL191885A
Original Assignee
Camtek Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Camtek Ltd filed Critical Camtek Ltd
Publication of IL191885A0 publication Critical patent/IL191885A0/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/70—Determining position or orientation of objects or cameras
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30141—Printed circuit board [PCB]
IL191885A 2007-06-03 2008-06-02 Multiple IL191885A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US94167207P 2007-06-03 2007-06-03

Publications (1)

Publication Number Publication Date
IL191885A0 true IL191885A0 (en) 2009-02-11

Family

ID=40197909

Family Applications (1)

Application Number Title Priority Date Filing Date
IL191885A IL191885A0 (en) 2007-06-03 2008-06-02 Multiple

Country Status (5)

Country Link
JP (1) JP2008298784A (en)
KR (1) KR100972425B1 (en)
CN (1) CN101526481A (en)
IL (1) IL191885A0 (en)
TW (1) TW200916763A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101496993B1 (en) * 2013-09-02 2015-03-02 (주) 인텍플러스 inspection method for display panel
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
KR101785069B1 (en) 2015-03-27 2017-11-21 (주)오로스 테크놀로지 Darkfield illumination device
CN108072659B (en) * 2016-11-11 2022-05-31 三星显示有限公司 Multi-optical vision apparatus
TWI778078B (en) * 2017-06-14 2022-09-21 以色列商肯提克有限公司 Method and system for automatic defect classification and related non-transitory computer program product
CN109827759B (en) * 2019-03-28 2020-11-24 歌尔光学科技有限公司 Defect detection method and device applied to optical module
JP7441469B2 (en) 2019-05-31 2024-03-01 株式会社昭和電気研究所 Visual inspection equipment
CN116223515B (en) * 2023-05-05 2023-07-11 成都中航华测科技有限公司 Conductive pattern defect detection method for circuit board test process

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3519813B2 (en) * 1995-03-14 2004-04-19 オリンパス株式会社 Defect detection method and defect detection device
JP3657694B2 (en) * 1995-03-31 2005-06-08 リンテック株式会社 Lighting device
JP2000283931A (en) * 1999-03-30 2000-10-13 Idemitsu Petrochem Co Ltd Surface inspection device and surface inspection method
US20040156539A1 (en) * 2003-02-10 2004-08-12 Asm Assembly Automation Ltd Inspecting an array of electronic components
JP2004279236A (en) 2003-03-17 2004-10-07 Nec Semiconductors Kyushu Ltd Appearance inspection device and method

Also Published As

Publication number Publication date
CN101526481A (en) 2009-09-09
KR20080106491A (en) 2008-12-08
TW200916763A (en) 2009-04-16
KR100972425B1 (en) 2010-07-27
JP2008298784A (en) 2008-12-11

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