IL143115A - Method for producing bulk zinc sulfide by progressive chemical vapor deposition - Google Patents
Method for producing bulk zinc sulfide by progressive chemical vapor depositionInfo
- Publication number
- IL143115A IL143115A IL143115A IL14311599A IL143115A IL 143115 A IL143115 A IL 143115A IL 143115 A IL143115 A IL 143115A IL 14311599 A IL14311599 A IL 14311599A IL 143115 A IL143115 A IL 143115A
- Authority
- IL
- Israel
- Prior art keywords
- zinc
- temperature
- hours
- zinc sulfide
- substrate
- Prior art date
Links
- 229910052984 zinc sulfide Inorganic materials 0.000 title claims description 30
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 title claims description 30
- 239000005083 Zinc sulfide Substances 0.000 title claims description 27
- 238000005229 chemical vapour deposition Methods 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title description 3
- 230000000750 progressive effect Effects 0.000 title description 2
- 239000011701 zinc Substances 0.000 claims description 58
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 47
- 229910052725 zinc Inorganic materials 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 19
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 15
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 description 22
- 230000008021 deposition Effects 0.000 description 22
- 239000000047 product Substances 0.000 description 13
- 238000001513 hot isostatic pressing Methods 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 229910002804 graphite Inorganic materials 0.000 description 8
- 239000010439 graphite Substances 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 239000012159 carrier gas Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 230000003292 diminished effect Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- HYWYRSMBCFDLJT-UHFFFAOYSA-N nimesulide Chemical compound CS(=O)(=O)NC1=CC=C([N+]([O-])=O)C=C1OC1=CC=CC=C1 HYWYRSMBCFDLJT-UHFFFAOYSA-N 0.000 description 1
- 229960000965 nimesulide Drugs 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0005—Separation of the coating from the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0026—Activation or excitation of reactive gases outside the coating chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
- C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/305—Sulfides, selenides, or tellurides
- C23C16/306—AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/018,969 US6083561A (en) | 1998-02-05 | 1998-02-05 | Low scatter, high quality water clear zinc sulfide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL143115A true IL143115A (en) | 2007-02-11 |
Family
ID=21790693
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL143115A IL143115A (en) | 1998-02-05 | 1999-02-02 | Method for producing bulk zinc sulfide by progressive chemical vapor deposition |
| IL12834699A IL128346A (en) | 1998-02-05 | 1999-02-02 | Low scatter, high quality water-clear zinc sulfide |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL12834699A IL128346A (en) | 1998-02-05 | 1999-02-02 | Low scatter, high quality water-clear zinc sulfide |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6083561A (de) |
| EP (1) | EP0935012B1 (de) |
| DE (1) | DE69938944D1 (de) |
| IL (2) | IL143115A (de) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6221482B1 (en) * | 1999-04-07 | 2001-04-24 | Cvd Inc. | Low stress, water-clear zinc sulfide |
| EP1331308A1 (de) * | 2002-01-25 | 2003-07-30 | Georgia-Pacific France | Gekrepptes Blatt eines saugfähigen Papiers, Prägewalze wie auch entsprechendes Verfahren |
| RU2221906C1 (ru) * | 2002-12-25 | 2004-01-20 | Институт химии высокочистых веществ РАН | Способ получения поликристаллического сульфида цинка |
| DE602004016440D1 (de) * | 2003-11-06 | 2008-10-23 | Rohm & Haas Elect Mat | Optischer Gegenstand mit leitender Struktur |
| US20090000700A1 (en) * | 2007-06-29 | 2009-01-01 | Hogan Patrick K | Treatment method for optically transmissive body |
| US7790072B2 (en) * | 2007-12-18 | 2010-09-07 | Raytheon Company | Treatment method for optically transmissive bodies |
| US8252823B2 (en) * | 2008-01-28 | 2012-08-28 | New York University | Oxazole and thiazole compounds as beta-catenin modulators and uses thereof |
| CN101760725B (zh) * | 2008-12-25 | 2011-09-07 | 北京有色金属研究总院 | 一种高光学质量硫化锌头罩的制备方法 |
| EP2511236B1 (de) | 2011-04-14 | 2015-07-01 | Rohm and Haas Company | Multispektrales Zinksulfid mit verbesserter Qualität |
| EP2634157B1 (de) | 2011-05-24 | 2016-08-10 | Rohm and Haas Company | Multispektrales Zinksulfid mit verbesserter Qualität |
| CN103469160B (zh) * | 2013-08-26 | 2015-10-21 | 莫儒就 | 远红外线能量发热管专用生产设备 |
| TWI583629B (zh) | 2013-09-26 | 2017-05-21 | 羅門哈斯電子材料有限公司 | 增加硫化鋅硬度之方法 |
| CN107604340B (zh) * | 2017-08-31 | 2023-09-01 | 安徽光智科技有限公司 | 化学气相沉积炉 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4944900A (en) * | 1983-03-16 | 1990-07-31 | Raytheon Company | Polycrystalline zinc sulfide and zinc selenide articles having improved optical quality |
| US4978577A (en) * | 1989-04-12 | 1990-12-18 | Cvd Incorporated | Method for preparing laminates of ZnSe and ZnS |
| US5077092A (en) * | 1989-06-30 | 1991-12-31 | Texas Instruments Incorporated | Method and apparatus for deposition of zinc sulfide films |
| US5183689A (en) * | 1991-07-15 | 1993-02-02 | Cvd, Inc. | Process for an improved laminated of znse and zns |
| US5507987A (en) * | 1994-04-28 | 1996-04-16 | Saint Gobain/Norton Industrial Ceramics Corp. | Method of making a free-standing diamond film with reduced bowing |
-
1998
- 1998-02-05 US US09/018,969 patent/US6083561A/en not_active Expired - Lifetime
-
1999
- 1999-02-02 EP EP99300763A patent/EP0935012B1/de not_active Expired - Lifetime
- 1999-02-02 DE DE69938944T patent/DE69938944D1/de not_active Expired - Lifetime
- 1999-02-02 IL IL143115A patent/IL143115A/en not_active IP Right Cessation
- 1999-02-02 IL IL12834699A patent/IL128346A/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| IL128346A0 (en) | 2000-01-31 |
| US6083561A (en) | 2000-07-04 |
| EP0935012B1 (de) | 2008-06-25 |
| EP0935012A3 (de) | 2001-01-31 |
| EP0935012A2 (de) | 1999-08-11 |
| DE69938944D1 (de) | 2008-08-07 |
| IL128346A (en) | 2002-09-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6083561A (en) | Low scatter, high quality water clear zinc sulfide | |
| CA1325793C (en) | Plasma deposited coatings and low temperature, plasma method of making same | |
| CA1222912A (en) | Chemical vapor deposition of titanium nitride and like films | |
| DK168664B1 (da) | Fremgangsmåde til fremstilling af et pladeglasprodukt | |
| US5939201A (en) | Method for depositing a reflective layer on glass, and products obtained | |
| EP0397292B1 (de) | Verfahren zur Herstellung einer dünnen Metalloxidbeschichtung auf einem Substrat, insbesondere Glas und deren Verwendung als Verglasung | |
| US4194022A (en) | Transparent, colorless, electrically conductive coating | |
| US5643505A (en) | Method for making low cost infrared windows | |
| EP2853618A1 (de) | Erhöhung der Zinksulfidhärte | |
| US6472057B2 (en) | Low stress, water-clear zinc sulfide | |
| GB2028376A (en) | Electrically Conductive Coatings | |
| Hayashi et al. | Chemical vapour deposition of rutile films | |
| Fu et al. | Single films and heat mirrors produced by plasma ion assisted deposition | |
| EP0353461B1 (de) | Chemische Abscheidung von Wismuthoxid aus der Gasphase | |
| Kim et al. | Microstructure comparison of transparent and opaque CVD SiC | |
| EP0486236B1 (de) | Optische Elemente aus Zinksulfid | |
| JPH11504615A (ja) | ガラス上に反射層を被着する方法及び得られる製品 | |
| US5547706A (en) | Optical thin films and method for their production | |
| EP0955392B1 (de) | Präzisionsreplikation mittels chemischer Dampfphasenabscheidung | |
| Parttow et al. | CVD diamond coatings for the infrared by optical brazing | |
| EP3417088B1 (de) | Verfahren zur chemischen dampfabscheidung zur abscheidung einer beschichtung | |
| JP3247838B2 (ja) | 熱分解窒化ほう素ルツボ及びその製造方法 | |
| EP3697737B1 (de) | Verfahren zur herstellung eines reflektierenden beschichteten glasgegenstandes | |
| Taylor et al. | Erosion Resistant FLIR Windows: Colorless ZnS | |
| Sugimoto | Corrosion Resistance of Nb2O5 Films Formed by MOCVD |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| KB | Patent renewed | ||
| KB | Patent renewed | ||
| EXP | Patent expired |