IL138552A - Lateral shift measurement using an optical technique - Google Patents

Lateral shift measurement using an optical technique

Info

Publication number
IL138552A
IL138552A IL138552A IL13855200A IL138552A IL 138552 A IL138552 A IL 138552A IL 138552 A IL138552 A IL 138552A IL 13855200 A IL13855200 A IL 13855200A IL 138552 A IL138552 A IL 138552A
Authority
IL
Israel
Prior art keywords
patterned structures
diffraction efficiency
site
structures
lateral shift
Prior art date
Application number
IL138552A
Other languages
English (en)
Other versions
IL138552A0 (en
Original Assignee
Nova Measuring Instr Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to IL138552A priority Critical patent/IL138552A/en
Application filed by Nova Measuring Instr Ltd filed Critical Nova Measuring Instr Ltd
Priority to PCT/IL2001/000884 priority patent/WO2002025723A2/en
Priority to EP17202850.8A priority patent/EP3333884A1/de
Priority to US10/257,544 priority patent/US6974962B2/en
Priority to EP01974638.7A priority patent/EP1410435B1/de
Priority to AU2001294149A priority patent/AU2001294149A1/en
Publication of IL138552A0 publication Critical patent/IL138552A0/xx
Priority to US11/271,773 priority patent/US7122817B2/en
Publication of IL138552A publication Critical patent/IL138552A/en
Priority to US11/580,997 priority patent/US7301163B2/en
Priority to US11/945,058 priority patent/US7715007B2/en
Priority to US12/775,883 priority patent/US8363219B2/en
Priority to US13/747,937 priority patent/US8941832B2/en
Priority to US14/594,627 priority patent/US9310192B2/en
Priority to US15/093,242 priority patent/US9785059B2/en
Priority to US15/728,744 priority patent/US20180031983A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
IL138552A 2000-09-19 2000-09-19 Lateral shift measurement using an optical technique IL138552A (en)

Priority Applications (14)

Application Number Priority Date Filing Date Title
IL138552A IL138552A (en) 2000-09-19 2000-09-19 Lateral shift measurement using an optical technique
PCT/IL2001/000884 WO2002025723A2 (en) 2000-09-19 2001-09-20 Lateral shift measurement using an optical technique
EP17202850.8A EP3333884A1 (de) 2000-09-19 2001-09-20 Lateralversatzmessung mit verwendung einer optischen technik
US10/257,544 US6974962B2 (en) 2000-09-19 2001-09-20 Lateral shift measurement using an optical technique
EP01974638.7A EP1410435B1 (de) 2000-09-19 2001-09-20 Messung einer lateralversetzung mit optischer technik
AU2001294149A AU2001294149A1 (en) 2000-09-19 2001-09-20 Lateral shift measurement using an optical technique
US11/271,773 US7122817B2 (en) 2000-09-19 2005-11-14 Lateral shift measurement using an optical technique
US11/580,997 US7301163B2 (en) 2000-09-19 2006-10-16 Lateral shift measurement using an optical technique
US11/945,058 US7715007B2 (en) 2000-09-19 2007-11-26 Lateral shift measurement using an optical technique
US12/775,883 US8363219B2 (en) 2000-09-19 2010-05-07 Lateral shift measurement using an optical technique
US13/747,937 US8941832B2 (en) 2000-09-19 2013-01-23 Lateral shift measurement using an optical technique
US14/594,627 US9310192B2 (en) 2000-09-19 2015-01-12 Lateral shift measurement using an optical technique
US15/093,242 US9785059B2 (en) 2000-09-19 2016-04-07 Lateral shift measurement using an optical technique
US15/728,744 US20180031983A1 (en) 2000-09-19 2017-10-10 Lateral shift measurement using an optical technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL138552A IL138552A (en) 2000-09-19 2000-09-19 Lateral shift measurement using an optical technique

Publications (2)

Publication Number Publication Date
IL138552A0 IL138552A0 (en) 2001-10-31
IL138552A true IL138552A (en) 2006-08-01

Family

ID=11074652

Family Applications (1)

Application Number Title Priority Date Filing Date
IL138552A IL138552A (en) 2000-09-19 2000-09-19 Lateral shift measurement using an optical technique

Country Status (5)

Country Link
US (9) US6974962B2 (de)
EP (2) EP1410435B1 (de)
AU (1) AU2001294149A1 (de)
IL (1) IL138552A (de)
WO (1) WO2002025723A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108700512A (zh) * 2015-12-31 2018-10-23 齐戈股份有限公司 用于优化干涉仪的光学性能的方法和装置

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US8363219B2 (en) 2013-01-29
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US7301163B2 (en) 2007-11-27
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US20160327384A1 (en) 2016-11-10
EP3333884A1 (de) 2018-06-13

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