IL135565A0 - Compositions for the stripping of photoresists in the fabrication of integrated circuits - Google Patents

Compositions for the stripping of photoresists in the fabrication of integrated circuits

Info

Publication number
IL135565A0
IL135565A0 IL13556500A IL13556500A IL135565A0 IL 135565 A0 IL135565 A0 IL 135565A0 IL 13556500 A IL13556500 A IL 13556500A IL 13556500 A IL13556500 A IL 13556500A IL 135565 A0 IL135565 A0 IL 135565A0
Authority
IL
Israel
Prior art keywords
photoresists
stripping
fabrication
compositions
integrated circuits
Prior art date
Application number
IL13556500A
Other languages
English (en)
Original Assignee
Atochem Elf Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atochem Elf Sa filed Critical Atochem Elf Sa
Publication of IL135565A0 publication Critical patent/IL135565A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Detergent Compositions (AREA)
IL13556500A 1999-04-26 2000-04-10 Compositions for the stripping of photoresists in the fabrication of integrated circuits IL135565A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9905237A FR2792737B1 (fr) 1999-04-26 1999-04-26 Compositions pour le decapage de photoresists dans la fabrication de circuits integres

Publications (1)

Publication Number Publication Date
IL135565A0 true IL135565A0 (en) 2001-05-20

Family

ID=9544843

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13556500A IL135565A0 (en) 1999-04-26 2000-04-10 Compositions for the stripping of photoresists in the fabrication of integrated circuits

Country Status (14)

Country Link
US (1) US6291410B1 (zh)
EP (1) EP1048986B1 (zh)
JP (1) JP2000347423A (zh)
KR (1) KR20000077072A (zh)
CN (1) CN1130454C (zh)
AT (1) ATE230126T1 (zh)
CA (1) CA2306673A1 (zh)
DE (1) DE60001008T2 (zh)
FR (1) FR2792737B1 (zh)
IL (1) IL135565A0 (zh)
MY (1) MY135996A (zh)
PL (1) PL339886A1 (zh)
SG (1) SG90132A1 (zh)
TW (1) TW576952B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6276548B1 (en) * 2000-10-05 2001-08-21 David Mitchell Collapsible basket
FR2815359B1 (fr) * 2000-10-17 2003-05-16 Atofina Nettoyage apres gravure d'un dielectrique associe au cuivre
JP4532039B2 (ja) * 2001-09-28 2010-08-25 シャープ株式会社 レジスト剥離方法及び薄膜回路素子の形成方法
JP3833650B2 (ja) * 2003-12-04 2006-10-18 関東化学株式会社 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法
JP6126551B2 (ja) * 2013-05-20 2017-05-10 富士フイルム株式会社 パターン剥離方法、電子デバイスの製造方法
EP4022395A4 (en) * 2019-08-30 2023-05-31 Dow Global Technologies LLC PHOTOSENSITIVE RESIN STRIPPING COMPOSITION
CN114879457A (zh) * 2022-05-26 2022-08-09 诺而曼环保科技（江苏）有限公司 一种用于去除半导体生产用光刻胶的清洗剂及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5556482A (en) * 1991-01-25 1996-09-17 Ashland, Inc. Method of stripping photoresist with composition containing inhibitor
JP3160344B2 (ja) * 1991-01-25 2001-04-25 アシュランド インコーポレーテッド 有機ストリッピング組成物
US5496491A (en) * 1991-01-25 1996-03-05 Ashland Oil Company Organic stripping composition
JP3048207B2 (ja) * 1992-07-09 2000-06-05 イー．ケー．シー．テクノロジー．インコーポレイテッド 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤組成物およびこれを使用した基板の洗浄方法
US5308745A (en) * 1992-11-06 1994-05-03 J. T. Baker Inc. Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
US5407788A (en) * 1993-06-24 1995-04-18 At&T Corp. Photoresist stripping method
EP0782610A4 (en) * 1994-09-23 1999-07-28 Church & Dwight Co Inc AQUEOUS CLEANER FOR METALS
US5709756A (en) * 1996-11-05 1998-01-20 Ashland Inc. Basic stripping and cleaning composition
FR2764278B1 (fr) 1997-06-09 1999-07-30 Maurice Granger Appareil distributeur de materiaux d'essuyage pouvant etre distribues sous forme non pliee

Also Published As

Publication number Publication date
CN1130454C (zh) 2003-12-10
US6291410B1 (en) 2001-09-18
ATE230126T1 (de) 2003-01-15
JP2000347423A (ja) 2000-12-15
MY135996A (en) 2008-07-31
SG90132A1 (en) 2002-07-23
EP1048986B1 (fr) 2002-12-18
KR20000077072A (ko) 2000-12-26
CN1280172A (zh) 2001-01-17
EP1048986A1 (fr) 2000-11-02
FR2792737B1 (fr) 2001-05-18
FR2792737A1 (fr) 2000-10-27
PL339886A1 (en) 2000-11-06
CA2306673A1 (fr) 2000-10-26
DE60001008D1 (de) 2003-01-30
TW576952B (en) 2004-02-21
DE60001008T2 (de) 2003-07-24

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