IL126289A0 - Determining characteristic parameters by polarised light - Google Patents
Determining characteristic parameters by polarised lightInfo
- Publication number
- IL126289A0 IL126289A0 IL12628997A IL12628997A IL126289A0 IL 126289 A0 IL126289 A0 IL 126289A0 IL 12628997 A IL12628997 A IL 12628997A IL 12628997 A IL12628997 A IL 12628997A IL 126289 A0 IL126289 A0 IL 126289A0
- Authority
- IL
- Israel
- Prior art keywords
- characteristic parameters
- polarised light
- determining characteristic
- determining
- polarised
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
- G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N2021/216—Polarisation-affecting properties using circular polarised light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N2021/217—Measuring depolarisation or comparing polarised and depolarised parts of light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/12—Circuits of general importance; Signal processing
- G01N2201/123—Conversion circuit
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Drying Of Semiconductors (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AUPN8752A AUPN875296A0 (en) | 1996-03-19 | 1996-03-19 | Method and apparatus for monitoring materials processing |
PCT/AU1997/000181 WO1997035177A1 (en) | 1996-03-19 | 1997-03-19 | Determining characteristic parameters by polarised light |
Publications (1)
Publication Number | Publication Date |
---|---|
IL126289A0 true IL126289A0 (en) | 1999-05-09 |
Family
ID=3793065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL12628997A IL126289A0 (en) | 1996-03-19 | 1997-03-19 | Determining characteristic parameters by polarised light |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP2001519891A (en) |
KR (1) | KR20000064701A (en) |
CN (1) | CN1219236A (en) |
AU (1) | AUPN875296A0 (en) |
IL (1) | IL126289A0 (en) |
WO (1) | WO1997035177A1 (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19734646A1 (en) | 1997-08-11 | 1999-03-04 | Bosch Gmbh Robert | Ellipsometer measuring device |
US6583875B1 (en) | 2000-05-19 | 2003-06-24 | Therma-Wave, Inc. | Monitoring temperature and sample characteristics using a rotating compensator ellipsometer |
FR2809491B1 (en) * | 2000-05-26 | 2008-07-04 | Production Rech S Appliquees | METHOD AND APPARATUS FOR ELLIPSOMETRIC METROLOGY FOR SAMPLE CONTAINED IN A CHAMBER OR THE LIKE |
KR100688980B1 (en) * | 2005-07-01 | 2007-03-08 | 삼성전자주식회사 | Apparatus for monitoring plasma and method of monitoring plasma |
CN102507040B (en) * | 2011-11-10 | 2013-08-21 | 复旦大学 | Thin film temperature measurement method based on ellipsometer |
CN102519364B (en) * | 2011-11-30 | 2014-10-15 | 上海华力微电子有限公司 | Optical detection method and computer-aided system for plasma etching structure |
FR2994264B1 (en) * | 2012-08-02 | 2014-09-12 | Centre Nat Rech Scient | PROCESS FOR ANALYZING THE CRYSTALLINE STRUCTURE OF A POLY-CRYSTALLINE SEMICONDUCTOR MATERIAL |
EP2703773B1 (en) * | 2012-08-28 | 2014-12-24 | Texmag GmbH Vertriebsgesellschaft | Sensor for detecting a moving strip |
CN103076287B (en) * | 2013-01-25 | 2015-05-13 | 中国人民解放军陆军军官学院 | Method for detecting damage of first wall of tokamak fusion reactor with polarized light |
CN103486974B (en) * | 2013-09-23 | 2016-04-13 | 中国科学院微电子研究所 | A kind of Spectroscopic Ellipsometry measurement mechanism and method |
CN103759661B (en) * | 2013-11-04 | 2016-06-29 | 北京理工大学 | A kind of device for measuring film thickness and refractive index in medium |
MX361549B (en) * | 2014-03-07 | 2018-12-10 | Halliburton Energy Services Inc | Wavelength-dependent light intensity modulation in multivariate optical computing devices using polarizers. |
CN105136679B (en) * | 2015-09-02 | 2017-12-26 | 北京航玻新材料技术有限公司 | A kind of optical material surface method for evaluating quality and its application based on ellipsometer |
CN105445191B (en) * | 2015-11-30 | 2018-08-24 | 中国科学院长春应用化学研究所 | Multichannel in situ measurement atmosphere pond |
CN113281268B (en) * | 2021-05-31 | 2022-08-16 | 华中科技大学 | Data analysis method and system for rotating polarization device spectrum ellipsometer |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3985447A (en) * | 1975-08-29 | 1976-10-12 | Bell Telephone Laboratories, Incorporated | Measurement of thin films by polarized light |
FR2491234B1 (en) * | 1980-09-29 | 1986-06-20 | Labo Electronique Physique | ELECTRONIC DEVICE FOR THE ANALYSIS AND CALCULATION OF FOURIER COEFFICIENTS OF A PERIODIC FUNCTION, AND ELLIPSOMETER COMPRISING SUCH A DEVICE |
IT1184100B (en) * | 1985-04-23 | 1987-10-22 | Cselt Centro Studi Lab Telecom | STATIC INTERFEROMETRIC ELLIPSOMETER |
US4850711A (en) * | 1986-06-13 | 1989-07-25 | Nippon Kokan Kabushiki Kaisha | Film thickness-measuring apparatus using linearly polarized light |
DE4301889A1 (en) * | 1993-01-14 | 1994-07-21 | Sentech Instr Gmbh | Method for determining characteristic sizes of transparent layers by means of ellipsometry |
-
1996
- 1996-03-19 AU AUPN8752A patent/AUPN875296A0/en not_active Abandoned
-
1997
- 1997-03-19 JP JP53298597A patent/JP2001519891A/en active Pending
- 1997-03-19 CN CN97194713.9A patent/CN1219236A/en active Pending
- 1997-03-19 IL IL12628997A patent/IL126289A0/en unknown
- 1997-03-19 KR KR1019980707424A patent/KR20000064701A/en not_active Application Discontinuation
- 1997-03-19 WO PCT/AU1997/000181 patent/WO1997035177A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AUPN875296A0 (en) | 1996-04-18 |
JP2001519891A (en) | 2001-10-23 |
WO1997035177A1 (en) | 1997-09-25 |
KR20000064701A (en) | 2000-11-06 |
CN1219236A (en) | 1999-06-09 |
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