IE83509B1 - The cleaning of instruments used in the semiconductor industry using a flammable solvent - Google Patents
The cleaning of instruments used in the semiconductor industry using a flammable solventInfo
- Publication number
- IE83509B1 IE83509B1 IE2000/0384A IE20000384A IE83509B1 IE 83509 B1 IE83509 B1 IE 83509B1 IE 2000/0384 A IE2000/0384 A IE 2000/0384A IE 20000384 A IE20000384 A IE 20000384A IE 83509 B1 IE83509 B1 IE 83509B1
- Authority
- IE
- Ireland
- Prior art keywords
- washing
- space
- instruments
- washing space
- gas
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims description 14
- 239000004065 semiconductor Substances 0.000 title claims description 7
- 239000002904 solvent Substances 0.000 title description 16
- 238000005406 washing Methods 0.000 claims description 142
- 239000007788 liquid Substances 0.000 claims description 56
- 239000007789 gas Substances 0.000 claims description 43
- 239000000203 mixture Substances 0.000 claims description 27
- 239000011261 inert gas Substances 0.000 claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 238000011084 recovery Methods 0.000 claims description 6
- 239000002360 explosive Substances 0.000 claims description 5
- 238000011010 flushing procedure Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 2
- 239000008246 gaseous mixture Substances 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 238000004064 recycling Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 6
- 239000003570 air Substances 0.000 description 5
- 238000004880 explosion Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000012080 ambient air Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 239000003599 detergent Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Description
Patents Act, 1992
2000/0384
THE CLEANING OF INSTRUMENTS USED IN THE SEMICONDUCTOR
INDUSTRY USING A FLAMMABLE SOLVENT
KOJAIR TECH OY
The invention relates to a method for washing instruments used in
semiconductor industry with an inflammable and/or explosive washing liquid.
The invention also relates to an equipment for washing instruments
used in semiconductor industry with an inflammable and/or explosive washing
liquid.
in semiconductor industry, light—sensitive materials, or resists, are
used in various manufacturing processes. in some processes, specific
instruments, such as resist cups and the like, are used when such materials
are handled, and therefore some material is left on the surface of the
instruments. Before the instruments can be used again, the material residuals
must be removed. At present, the instruments are cleaned by washing them
with a suitable solvent in a commonly used fume cupboard, the solvent
vapours generated in the cabinet being exhausted with an exhauster and the
used liquiform solvent recovered. A problem with the current process is that
ventilation for the removal of the solvent vapours is rather difficult and
expensive to arrange, and solvent vapours released into the ambient
atmosphere cause environmental problems. A further problem is high
consumption of the solvent used as washing liquid per unit to be washed.
An object of the present invention is to provide a method and an
equipment which allow an automated washing of these instruments which is
both convenient and safe. The method of the invention is characterized in that
the instruments to be washed are placed into a substantially gas—tight|y closed
washing space; that the air in the enclosed washing space is removed from the
washing space by supplying an inert gas or gas mixture to the space, while
allowing, at the same time, a gas mixture containing air in the washing space to
be discharged from the washing space; that the instruments are first washed by
spraying them with the already used washing liquid and that in a last phase the
instruments are flushed with a clean washing liquid, the washing liquid sprayed
into the washing space being removed from the washing space; and that after
the washing is completed, the gas mixture containing washing liquid vapour that
is generated in the washing space is removed from the washing space by
supplying an inert gas/gas mixture to the washing space and by discharging, at
the same time, the gas mixture containing washing liquid vapour from the
washing space.
Further, the equipment of the invention is characterized in that the
equipment comprises a substantially gas-tightly closed washing space where
the instruments to be washed are placed for the washing; means for spraying
already used washing liquid onto the instruments; means for flushing the
instruments with a clean washing liquid in a last phase; means for supplying an
inert gas/gas mixture to the washing space; means for removing a gaseous
mixture containing washing liquid vapour that is in the washing space from the
washing space; and control means for controlling the equipment.
A basic idea of the invention is that the instruments to be washed
are washed with an automated washing equipment, in a substantially gas-
tightly closed washing space included in the equipment, the instruments to be
washed being cleaned by flushing them with a suitable liquid. Another
essential idea of the invention is that when the units to be washed are placed
into the washing space, which is then closed, the air in the space is removed
before the washing begins by supplying an inert gas or gas mixture, preferably
nitrogen, to the space, thus eliminating the risk of fire or explosion. A yet
further essential idea of the invention is that after the washing is completed,
the solvent vapours in the washing space are removed by supplying again an
inert gas or gas mixture to the space, thereby allowing solvent emissions to be
recovered for further processing.
An advantage of the invention is that the risk of fire or explosion can
be avoided because there is no oxygen in the washing space that would cause
a fire or an explosion. Moreover, the quantity of solvent vapour emissions per
wash is low because it depends on the quantity of vapours that can evaporate
into the washing space in different circumstances. A further advantage is that
when the solvent vapours are removed from the washing space to recovery by
supplying inert gas to the washing space, the washing space can then be
safely opened without any harmful vapours or gases being released into the
atmosphere.
The invention will be described in greater detail with reference to
the accompanying Figure which is a schematic view of the equipment of the
invention.
The Figure is a schematic view of the equipment of the invention.
The equipment comprises an actual washing device 1 comprising a washing
space 2 for washing instruments 3. The instruments to be washed can be
placed into the washing space 2 either in a separate basket or on a wire tray,
or other suitable holder, included in the washing space 2. The washing space
further comprises nozzles 4 which spray the solvent, or the like, used as a
detergent onto the surface of the instruments to be washed in order to clean
them. The bottom of the washing space 2 forms a basin into which the
sprayed washing liquid collects, and at the bottom of the basin there is a duct
through which the washing liquid can be supplied to a recycle container 6.
The equipment further comprises a pump 7 for pumping the washing liquid into
the nozzles 4. In addition, the equipment comprises a feed container 8 where
new, unused washing liquid is kept and from where it can be supplied to the
pump 7. Depending on the washing phase, either used washing liquid from the
recycle container 6 or clean washing liquid from the feed container 8 is
supplied to the pump 7, the duct for supplying the washing liquid to the pump 7
being selected by means of a valve 9. in the Figure, the washing liquid
container 6 and 8 are shown as open receptacles, which is only for the sake of
clarity. in practice, inflammable and explosive washing liquid can naturally only
be stored in closed containers which do not allow the washing liquid to
evaporate into ambient air.
The equipment may comprise a gas container 10, such as a gas
cylinder, or the like, that can be connected to the washing space 2 via a gas
supply duct 11 provided with a valve 12. instead of the gas container, in a
factory or laboratory gas can be supplied from a fixed gas system, shown with
a dashed line 11’, if one is available. On the opposite side of the washing
space with respect to the gas supply duct 11, there is a gas removal duct 13
which can be connected through a valve 14 either to a removal duct arranged
for organic materials or to a recovery device 15, for example, at the factory or
laboratory. The gas container 10 contains an inert gas or gas mixture, a most
preferred one of which is common nitrogen. The equipment further comprises
control means, such as a control unit 16, which controls the pump and the
valves as well as other functions of the equipment according to predetermined
settings.
The process for washing the units 3 to be washed with the
equipment proceeds as follows. The units 3 to be washed are placed into the
washing space 2 in a position which allows washing liquid to flow from the
units to the bottom of the washing space 2. The washing space 2 is provided
with a door 2a, arranged either at the side of the washing space, as in the
example, or on top of it, which is tightly closed, an enclosed washing space
being thereby formed. Inert gas, such as nitrogen, contained in the gas
container 10 is supplied to the washing space 2, whereby the gas that flows
into the washing space pushes out the plain air the space contains. The gas
removal duct 13 can in this case be connected to the atmosphere because all
the gas coming out of the duct can be discharged directly into the atmosphere
without causing any harm or damage.
When the washing space 2 has been flushed so that it no longer
contains any oxygenous air but only inert gas supplied to the space, the gas
supply and removal ducts 11 and 13 are closed. The pump 7 is then switched
on to pump used washing liquid from the recycle container 6 through the
nozzles 4 onto the instruments to be washed to prewash them, i.e. to detach
and remove materials from the instruments. If desired, it is also possible to use
several recycle containers to collect washing liquids of varying degrees of
dirtiness from the different washing phases, the dirtiest liquid being used for
the first wash, after which a less dirty washing liquid may be used in the
subsequent wash, etc. An essential aspect is that there is still solvent ability
left in a liquid containing resists or similar impurities, therefore it can very well
be used for dissolving and removing a material so that no solid material is left
on the surface of the instruments to be washed. in the last washing phase the
pump 7 is connected via the valve 9 to the feed container 8 of clean washing
liquid, the last flush being carried out using fully unused, new washing liquid in
order to remove even the last residuals from the instruments to be washed.
The new washing liquid is usually not recycled in the flushing, but it is
collected into the recycle container 6. However, the new washing liquid can be
recycled for example through the pipes, valves and the pump to clean off
various residuals from them as thoroughly as possible. Instead of the above
mentioned container, new washing liquid can naturally be also taken directly
from the washing liquid system of the factory or laboratory, provided that one
is available, the feed container 8 then supplying clean washing liquid to the
entire system.
After the washing is completed and the supply of washing liquid
through the nozzles has stopped, the gas supply duct 11 is again opened by
means of the valve 12 to supply inert gas to the washing space. Since the
washing space contains a mixture of the washing liquid vapour evaporated
from the washing liquid and the inert gas, the gas removal duct 13 is
connected through the valve 14 to the recovery device 15, for example. The
inert gas or gas mixture supplied to the washing space pushes the mixture
containing the washing liquid vapour in the washing space 2 into the duct 13
and further to the recovery device 15. When the washing space again contains
only an inert gas or gas mixture, the gas supply and removal ducts 11 and 13
are closed, and the door 2a of the washing space 2 can be opened and the
washed instruments removed from the washing equipment.
The gas recovery device 15 may consist of a container alone, or it
may comprise for example a compressor or other devices for compressing the
gas removed from the washing space, etc. Various other techniques fully
known per se can also be used to extract solvent vapours from the gas, and
the recovered solvent vapour can be liquefied and returned for re-use. An
essential aspect is that the mixture which is removed from the washing space
2 and which contains washing liquid vapour is recovered and not released into
the atmosphere, whereby for example a mixture recovered at suitable intervals
can be further processed in a suitable manner for example by condensing the
washing liquid vapours into a liquid to be returned for re-use.
The above description and the related drawing only illustrate an
example of the invention, the invention not being in any way restricted to the
example. The essential idea is that when washing liquids involving a risk of fire
or explosion are used, the washing takes place in a closed space where an
inert gas or gas mixture is first used to flush away the gas mixture containing
oxygen so as to eliminate the risk and, alter the washing, the mixture
containing washing liquid vapour is flushed and recovered so that when the
washing space is opened after the washing, the inert gas or gas mixture in the
space can mix with the ambient air without any risk or damage being caused.
Claims (5)
1. A method for washing instruments used in semiconductor industry with an inflammable and/or explosive washing fluid, characterised in that the instruments to be washed are placed into a substantially gas- tightly closed washing space (2); that the air in the closed washing space (2) is removed from the washing space by supplying an inert gas or gas mixture to the space while allowing, at the same time, a gas mixture containing air in the washing space to be discharged from the washing space; that the instruments (3) are washed by spraying them with the already used washing liquid and that in a last phase the instruments (3) are flushed with a clean washing liquid, the washing liquid sprayed into the washing space (2) being removed from the washing space; and that after the washing is completed, the gas mixture containing washing liquid vapour that is generated in the washing space is removed from the washing space by supplying an inert gas/gas mixture to the washing space and by discharging, at the same time, the gas mixture containing washing liquid vapour from the washing space (2).
2. A method according to claim 1, characterised in that the gas used is nitrogen.
3. A method according to claim 1 or 2, characterised in that the gas mixture containing washing liquid vapours that is removed from the washing space is supplied from the washing space to a recovery device (15) for recovering the vapours.
4. An semiconductor industry with a flammable and/or explosive washing liquid, equipment for washing instruments used in characterised in that the equipment comprises a substantially gas-tightly closed washing space (2) where the instruments (3) to be washed are placed for the washing; means (4, 7) for spraying already used washing liquid onto the instruments (3); means for flushing the instruments (3) with a clean washing liquid in a last phase; means (10 to 12) for supplying an inert gas/gas mixture to the washing space (2); means for removing a 10 gaseous mixture containing washing liquid vapour that is in the washing space from the washing space (2); and control means (16) for controlling the equipment.
5. An equipment according to claim 4, characterised in that the equipment comprises a recycle container (6) for recovering used washing liquid and for recycling it with a pump (7) so as to be sprayed again into the washing space (2) and a container (8) for clean washing liquid to be used for the last phase to flush the instruments (3). F. R. KELLY & CO., AGENTS FOR THE APPLICANTS
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FIFINLAND21/05/1999991160 | |||
FI991160A FI113750B (en) | 1999-05-21 | 1999-05-21 | Method and apparatus for cleaning tools for the semiconductor industry |
Publications (2)
Publication Number | Publication Date |
---|---|
IE20000384A1 IE20000384A1 (en) | 2001-02-21 |
IE83509B1 true IE83509B1 (en) | 2004-07-14 |
Family
ID=
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