IE45575L - Scale for calibrating electron beam instruments - Google Patents
Scale for calibrating electron beam instrumentsInfo
- Publication number
- IE45575L IE45575L IE771797A IE179777A IE45575L IE 45575 L IE45575 L IE 45575L IE 771797 A IE771797 A IE 771797A IE 179777 A IE179777 A IE 179777A IE 45575 L IE45575 L IE 45575L
- Authority
- IE
- Ireland
- Prior art keywords
- scale
- layers
- metals
- deposited
- thick
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B3/00—Measuring instruments characterised by the use of mechanical techniques
- G01B3/30—Bars, blocks, or strips in which the distance between a pair of faces is fixed, although it may be preadjustable, e.g. end measure, feeler strip
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49789—Obtaining plural product pieces from unitary workpiece
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Electroplating Methods And Accessories (AREA)
- Sampling And Sample Adjustment (AREA)
- Microscoopes, Condenser (AREA)
- Luminescent Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/736,978 US4068381A (en) | 1976-10-29 | 1976-10-29 | Scanning electron microscope micrometer scale and method for fabricating same |
Publications (2)
Publication Number | Publication Date |
---|---|
IE45575L true IE45575L (en) | 1978-04-29 |
IE45575B1 IE45575B1 (en) | 1982-10-06 |
Family
ID=24962098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IE1797/77A IE45575B1 (en) | 1976-10-29 | 1977-08-29 | A scale for calibrating electron beam instruments and methhod of fabricating the same |
Country Status (11)
Country | Link |
---|---|
US (2) | US4068381A ( ) |
JP (1) | JPS5355953A ( ) |
AU (1) | AU505385B2 ( ) |
BE (1) | BE860196A ( ) |
CA (1) | CA1080369A ( ) |
DE (1) | DE2740224A1 ( ) |
FR (1) | FR2369544A1 ( ) |
GB (1) | GB1540780A ( ) |
IE (1) | IE45575B1 ( ) |
IT (1) | IT1090530B ( ) |
NL (1) | NL7711544A ( ) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE455736B (sv) * | 1984-03-15 | 1988-08-01 | Sarastro Ab | Forfaringssett och anordning for mikrofotometrering och efterfoljande bildsammanstellning |
US4655884A (en) * | 1985-08-19 | 1987-04-07 | General Electric Company | Nickel plating of refractory metals |
US4818873A (en) * | 1987-10-30 | 1989-04-04 | Vickers Instruments (Canada) Inc. | Apparatus for automatically controlling the magnification factor of a scanning electron microscope |
US5923430A (en) * | 1993-06-17 | 1999-07-13 | Ultrapointe Corporation | Method for characterizing defects on semiconductor wafers |
US5479252A (en) * | 1993-06-17 | 1995-12-26 | Ultrapointe Corporation | Laser imaging system for inspection and analysis of sub-micron particles |
JP2746125B2 (ja) * | 1994-06-17 | 1998-04-28 | 日本電気株式会社 | 電子線露光装置の装置較正用基準マーク及び装置較正方法。 |
US5822875A (en) * | 1995-08-09 | 1998-10-20 | Siemens Aktiengesellschaft | Scanning electron microscopic ruler and method |
DE19604348C2 (de) * | 1996-02-07 | 2003-10-23 | Deutsche Telekom Ag | Verfahren zur Herstellung einer kalibrierten Längenskala im Nanometerbereich für technische Geräte, die der hochauflösenden bis ultrahochauflösenden Abbildung von Strukturen dienen |
US6148114A (en) * | 1996-11-27 | 2000-11-14 | Ultrapointe Corporation | Ring dilation and erosion techniques for digital image processing |
JPH1125898A (ja) * | 1997-05-08 | 1999-01-29 | Hitachi Ltd | 電子顕微鏡の分解能評価方法および分解能評価用試料 |
JP4727777B2 (ja) * | 1999-05-24 | 2011-07-20 | 株式会社日立製作所 | 走査形電子顕微鏡による測長方法 |
US6545275B1 (en) * | 1999-09-03 | 2003-04-08 | Applied Materials, Inc. | Beam evaluation |
US6570157B1 (en) | 2000-06-09 | 2003-05-27 | Advanced Micro Devices, Inc. | Multi-pitch and line calibration for mask and wafer CD-SEM system |
US6573498B1 (en) | 2000-06-30 | 2003-06-03 | Advanced Micro Devices, Inc. | Electric measurement of reference sample in a CD-SEM and method for calibration |
US6573497B1 (en) | 2000-06-30 | 2003-06-03 | Advanced Micro Devices, Inc. | Calibration of CD-SEM by e-beam induced current measurement |
US6750447B2 (en) * | 2002-04-12 | 2004-06-15 | Agere Systems, Inc. | Calibration standard for high resolution electron microscopy |
DE10225193B4 (de) * | 2002-06-06 | 2004-08-12 | Leica Microsystems (Schweiz) Ag | Verfahren zur Kalibrierung der Vergrößerung eines Mikroskops sowie kalibrierbares Mikroskop |
US6875982B2 (en) * | 2003-08-29 | 2005-04-05 | International Business Machines Corporation | Electron microscope magnification standard providing precise calibration in the magnification range 5000X-2000,000X |
US7323350B2 (en) * | 2004-09-30 | 2008-01-29 | Hitachi Global Storage Technologies Netherlands B.V. | Method of fabricating thin film calibration features for electron/ion beam image based metrology |
JP4650113B2 (ja) * | 2005-06-09 | 2011-03-16 | 富士ゼロックス株式会社 | 積層構造体、ドナー基板、および積層構造体の製造方法 |
JP5380460B2 (ja) * | 2008-11-05 | 2014-01-08 | 株式会社日立ハイテクノロジーズ | 校正用標準部材およびその作製方法並びにそれを用いた走査電子顕微鏡 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2116927A (en) * | 1935-04-20 | 1938-05-10 | Germer Edmund | Electrical discharge device |
US2859158A (en) * | 1957-01-31 | 1958-11-04 | Glenn R Schaer | Method of making a nickel-chromium diffusion alloy |
DE1932926A1 (de) * | 1969-06-28 | 1971-01-21 | Siemens Ag | Vorrichtung zur Justierung des Elektronenstrahles einer Mikrosonde |
US3987529A (en) * | 1971-11-01 | 1976-10-26 | Asahi Kasei Kogyo Kabushiki Kaisha | Valve and method for manufacturing the same |
US3954420A (en) * | 1975-06-24 | 1976-05-04 | Whyco Chromium Co., Inc. | Non-ferrous corrosion resistant undercoating |
US4005527A (en) * | 1975-12-22 | 1977-02-01 | Wilson Ralph S | Depth gauge |
-
1976
- 1976-10-29 US US05/736,978 patent/US4068381A/en not_active Expired - Lifetime
-
1977
- 1977-08-16 CA CA284,770A patent/CA1080369A/en not_active Expired
- 1977-08-22 AU AU28086/77A patent/AU505385B2/en not_active Expired
- 1977-08-23 GB GB35371/77A patent/GB1540780A/en not_active Expired
- 1977-08-29 IE IE1797/77A patent/IE45575B1/en unknown
- 1977-09-07 DE DE19772740224 patent/DE2740224A1/de not_active Withdrawn
- 1977-10-19 IT IT51471/77A patent/IT1090530B/it active
- 1977-10-19 FR FR7731492A patent/FR2369544A1/fr not_active Withdrawn
- 1977-10-20 NL NL7711544A patent/NL7711544A/xx unknown
- 1977-10-24 JP JP12747877A patent/JPS5355953A/ja active Pending
- 1977-10-27 BE BE182135A patent/BE860196A/xx unknown
- 1977-11-03 US US05/848,176 patent/US4139933A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA1080369A (en) | 1980-06-24 |
AU505385B2 (en) | 1979-11-15 |
JPS5355953A (en) | 1978-05-20 |
FR2369544A1 (fr) | 1978-05-26 |
BE860196A (fr) | 1978-02-15 |
GB1540780A (en) | 1979-02-14 |
US4139933A (en) | 1979-02-20 |
IE45575B1 (en) | 1982-10-06 |
US4068381A (en) | 1978-01-17 |
DE2740224A1 (de) | 1978-05-11 |
AU2808677A (en) | 1979-03-01 |
IT1090530B (it) | 1985-06-26 |
NL7711544A (nl) | 1978-05-03 |
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