HUE058020T2 - Homogén vonalmenti párologtatóforrás fûtõeszközzel - Google Patents

Homogén vonalmenti párologtatóforrás fûtõeszközzel

Info

Publication number
HUE058020T2
HUE058020T2 HUE17749398A HUE17749398A HUE058020T2 HU E058020 T2 HUE058020 T2 HU E058020T2 HU E17749398 A HUE17749398 A HU E17749398A HU E17749398 A HUE17749398 A HU E17749398A HU E058020 T2 HUE058020 T2 HU E058020T2
Authority
HU
Hungary
Prior art keywords
heater
evaporation source
linear evaporation
homogeneous linear
homogeneous
Prior art date
Application number
HUE17749398A
Other languages
English (en)
Inventor
Reto Pfeiffer
Original Assignee
Flisom Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Flisom Ag filed Critical Flisom Ag
Publication of HUE058020T2 publication Critical patent/HUE058020T2/hu

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
HUE17749398A 2016-08-05 2017-07-21 Homogén vonalmenti párologtatóforrás fûtõeszközzel HUE058020T2 (hu)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201662371545P 2016-08-05 2016-08-05

Publications (1)

Publication Number Publication Date
HUE058020T2 true HUE058020T2 (hu) 2022-06-28

Family

ID=59564147

Family Applications (1)

Application Number Title Priority Date Filing Date
HUE17749398A HUE058020T2 (hu) 2016-08-05 2017-07-21 Homogén vonalmenti párologtatóforrás fûtõeszközzel

Country Status (3)

Country Link
EP (1) EP3494243B1 (hu)
HU (1) HUE058020T2 (hu)
WO (1) WO2018024510A1 (hu)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109136855B (zh) * 2018-09-05 2021-03-02 京东方科技集团股份有限公司 一种蒸发源及蒸镀装置
CN111206222A (zh) * 2018-11-02 2020-05-29 北京铂阳顶荣光伏科技有限公司 一种镀膜设备及镀膜方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1041169B1 (de) * 1999-03-29 2007-09-26 ANTEC Solar Energy AG Vorrichtung und Verfahren zur Beschichtung von Substraten durch Aufdampfen mittels eines PVD-Verfahrens
US20030168013A1 (en) * 2002-03-08 2003-09-11 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device
KR100645688B1 (ko) * 2005-08-30 2006-11-14 삼성에스디아이 주식회사 증착장치의 히터 및 이를 채용한 증발원
JP4468474B1 (ja) * 2008-12-24 2010-05-26 三菱重工業株式会社 真空蒸着装置及び温度調整方法
US20130112288A1 (en) * 2011-11-04 2013-05-09 First Solar, Inc. System and method providing a heater-orifice and heating zone controls for a vapor deposition system
JP2015010257A (ja) * 2013-06-28 2015-01-19 株式会社日立ハイテクファインシステムズ 真空蒸着装置の蒸発源並びにそれを用いた真空蒸着装置及び真空蒸着方法

Also Published As

Publication number Publication date
EP3494243B1 (en) 2021-12-29
EP3494243A1 (en) 2019-06-12
WO2018024510A1 (en) 2018-02-08

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