HK9483A - Methods for photoresist development - Google Patents

Methods for photoresist development

Info

Publication number
HK9483A
HK9483A HK9483A HK9483A HK9483A HK 9483 A HK9483 A HK 9483A HK 9483 A HK9483 A HK 9483A HK 9483 A HK9483 A HK 9483A HK 9483 A HK9483 A HK 9483A
Authority
HK
Hong Kong
Prior art keywords
methods
photoresist development
photoresist
development
Prior art date
Application number
HK9483A
Other languages
English (en)
Original Assignee
Allied Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chem filed Critical Allied Chem
Publication of HK9483A publication Critical patent/HK9483A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
HK9483A 1977-05-06 1983-03-17 Methods for photoresist development HK9483A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79468277A 1977-05-06 1977-05-06

Publications (1)

Publication Number Publication Date
HK9483A true HK9483A (en) 1983-03-17

Family

ID=25163339

Family Applications (1)

Application Number Title Priority Date Filing Date
HK9483A HK9483A (en) 1977-05-06 1983-03-17 Methods for photoresist development

Country Status (5)

Country Link
JP (1) JPS53138676A (ja)
DE (1) DE2817256A1 (ja)
FR (1) FR2389926A1 (ja)
GB (1) GB1595887A (ja)
HK (1) HK9483A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155353A (en) * 1979-05-22 1980-12-03 Tokyo Ohka Kogyo Co Ltd Developer composition
DE3924889A1 (de) * 1989-07-27 1991-01-31 Kali Chemie Ag Reinigungszusammensetzungen aus dichlortrifluorenthanen und alkanolen

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3607767A (en) * 1969-10-10 1971-09-21 Union Carbide Corp Azeothropic composition of 1,1,2-trifluoroethane,methylene chloride,and cyclopentane
JPS4988603A (ja) * 1972-12-29 1974-08-24
DE2418609A1 (de) * 1974-04-18 1975-10-30 Grace W R & Co Verfahren zur herstellung lichtempfindlicher deckschichten

Also Published As

Publication number Publication date
JPS53138676A (en) 1978-12-04
GB1595887A (en) 1981-08-19
DE2817256A1 (de) 1978-11-09
FR2389926A1 (ja) 1978-12-01

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