HK78491A - Polymers and radiosensitive compositions containing them - Google Patents

Polymers and radiosensitive compositions containing them

Info

Publication number
HK78491A
HK78491A HK784/91A HK78491A HK78491A HK 78491 A HK78491 A HK 78491A HK 784/91 A HK784/91 A HK 784/91A HK 78491 A HK78491 A HK 78491A HK 78491 A HK78491 A HK 78491A
Authority
HK
Hong Kong
Prior art keywords
hydrogen
formula
alkoxy
atoms
polymer
Prior art date
Application number
HK784/91A
Other languages
English (en)
Inventor
Arnold Dr Dipl-Chem Schneller
Juergen Dr Dipl-Chem Sander
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of HK78491A publication Critical patent/HK78491A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Cosmetics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
HK784/91A 1985-08-13 1991-10-03 Polymers and radiosensitive compositions containing them HK78491A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19853528930 DE3528930A1 (de) 1985-08-13 1985-08-13 Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch

Publications (1)

Publication Number Publication Date
HK78491A true HK78491A (en) 1991-10-11

Family

ID=6278339

Family Applications (1)

Application Number Title Priority Date Filing Date
HK784/91A HK78491A (en) 1985-08-13 1991-10-03 Polymers and radiosensitive compositions containing them

Country Status (7)

Country Link
US (1) US4910119A (xx)
EP (1) EP0212439B1 (xx)
JP (1) JPH0796584B2 (xx)
KR (1) KR940007777B1 (xx)
AT (1) ATE52793T1 (xx)
DE (2) DE3528930A1 (xx)
HK (1) HK78491A (xx)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63303343A (ja) * 1987-06-03 1988-12-09 Konica Corp 感光性組成物及び感光性平版印刷版
JPS6435436A (en) * 1987-07-30 1989-02-06 Mitsubishi Chem Ind Photosensitive planographic printing plate
JP2625743B2 (ja) * 1987-07-31 1997-07-02 三菱化学株式会社 感光性平版印刷版
DE3731439A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2777665B2 (ja) * 1988-11-15 1998-07-23 コニカ株式会社 画像形成方法
US5100768A (en) * 1989-05-09 1992-03-31 Kabushiki Kaisha Toshiba Photosensitive composition
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4106558C2 (de) * 1991-03-01 2000-05-31 Clariant Gmbh Polymere mit Einheiten aus Estern von alpha,beta-ungesättigten Carbonsäuren und damit hergestelltes strahlungsempfindliches Gemisch
EP0716344A1 (en) * 1994-12-05 1996-06-12 Konica Corporation Light-sensitive composition and light-sensitive lithographic printing plate using the same
DE19507618A1 (de) * 1995-03-04 1996-09-05 Hoechst Ag Polymere und diese enthaltendes lichtempfindliches Gemisch
JP4023867B2 (ja) * 1997-05-09 2007-12-19 沖電気工業株式会社 レジスト用感光性樹脂組成物
KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
US7148265B2 (en) * 2002-09-30 2006-12-12 Rohm And Haas Electronic Materials Llc Functional polymer
JP4699053B2 (ja) * 2005-03-10 2011-06-08 東京応化工業株式会社 カラーフィルタ用感光性樹脂組成物およびカラーフィルタ
WO2010007915A1 (ja) * 2008-07-16 2010-01-21 日産化学工業株式会社 ポジ型レジスト組成物及びマイクロレンズの製造方法
JP5954252B2 (ja) * 2012-05-16 2016-07-20 信越化学工業株式会社 レジスト材料並びにこれを用いたパターン形成方法
JP5939112B2 (ja) * 2012-09-27 2016-06-22 日油株式会社 カテコール基含有重合体
US10177383B2 (en) * 2014-03-31 2019-01-08 National Institute For Materials Science Nano-coating material, method for manufacturing same, coating agent, functional material, and method for manufacturing same
JP2019147857A (ja) * 2018-02-26 2019-09-05 国立大学法人 東京大学 ガロール基様側鎖を有する共重合体を含む接着剤組成物
US11822242B2 (en) 2019-11-14 2023-11-21 Merck Patent Gmbh DNQ-type photoresist composition including alkali-soluble acrylic resins

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB119667A (en) * 1917-04-03 1918-10-17 Vinton Ulric Dahlgren Pierce Improvements in and relating to Machine Guns.
US3409589A (en) * 1964-09-02 1968-11-05 Rohm & Haas Addition copolymers of alkoxy-substituted phenyl esters of acrylic or methacrylic acid
GB1375461A (xx) * 1972-05-05 1974-11-27
US3869282A (en) * 1972-09-21 1975-03-04 Patrick M Curran Method of cleaning nickel alloy by filtering
JPS5748570B2 (xx) * 1973-01-11 1982-10-16
US4025710A (en) * 1975-07-16 1977-05-24 Xerox Corporation Intrachain charge transfer complexes
JPS5228401A (en) * 1975-08-29 1977-03-03 Koken Boring Machine Co Hydraulic percussion device
DE2861843D1 (en) * 1977-07-19 1982-07-08 Ciba Geigy Ag Acrylic polymers substituted by n-heterocyclic rings and their use as light protection agents
DE2748362A1 (de) * 1977-10-28 1979-05-03 Hoechst Ag Polymere substituierter piperidine, ihre herstellung und verwendung
DE3479651D1 (en) * 1983-05-20 1989-10-12 Showa Denko Kk Naphthalene derivative, polymerizable composition containing the same and polymer obtainable by polymerizing this composition
DE3326036A1 (de) * 1983-07-20 1985-01-31 Basf Ag, 6700 Ludwigshafen Zur herstellung von reliefbildern oder resistmustern geeignetes lichtempfindliches aufzeichnungsmaterial

Also Published As

Publication number Publication date
KR870002480A (ko) 1987-03-31
EP0212439B1 (de) 1990-05-16
JPH0796584B2 (ja) 1995-10-18
US4910119A (en) 1990-03-20
DE3671235D1 (de) 1990-06-21
EP0212439A2 (de) 1987-03-04
JPS6239603A (ja) 1987-02-20
KR940007777B1 (ko) 1994-08-25
DE3528930A1 (de) 1987-02-26
EP0212439A3 (en) 1987-12-23
ATE52793T1 (de) 1990-06-15

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)