HK41890A - Semiconductor device and fabrication process thereof - Google Patents

Semiconductor device and fabrication process thereof

Info

Publication number
HK41890A
HK41890A HK418/90A HK41890A HK41890A HK 41890 A HK41890 A HK 41890A HK 418/90 A HK418/90 A HK 418/90A HK 41890 A HK41890 A HK 41890A HK 41890 A HK41890 A HK 41890A
Authority
HK
Hong Kong
Prior art keywords
semiconductor device
fabrication process
fabrication
semiconductor
Prior art date
Application number
HK418/90A
Other languages
English (en)
Inventor
Muratajun
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of HK41890A publication Critical patent/HK41890A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/53204—Conductive materials
    • H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
    • H01L23/53257—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being a refractory metal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
HK418/90A 1983-12-23 1990-05-31 Semiconductor device and fabrication process thereof HK41890A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58241963A JPS60134466A (ja) 1983-12-23 1983-12-23 半導体装置およびその製造方法

Publications (1)

Publication Number Publication Date
HK41890A true HK41890A (en) 1990-06-08

Family

ID=17082176

Family Applications (1)

Application Number Title Priority Date Filing Date
HK418/90A HK41890A (en) 1983-12-23 1990-05-31 Semiconductor device and fabrication process thereof

Country Status (4)

Country Link
JP (1) JPS60134466A (ja)
KR (1) KR850005138A (ja)
GB (1) GB2151847B (ja)
HK (1) HK41890A (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1235824A (en) * 1985-06-28 1988-04-26 Vu Q. Ho Vlsi mosfet circuits using refractory metal and/or refractory metal silicide
JPH0799738B2 (ja) * 1985-09-05 1995-10-25 三菱電機株式会社 半導体装置の製造方法
GB2179792B (en) * 1985-08-28 1988-10-12 Mitsubishi Electric Corp Method for fabricating bipolar transistor in integrated circuit
WO1989011732A1 (en) * 1988-05-24 1989-11-30 Micron Technology, Inc. Tisi2 local interconnects
WO1989011733A1 (en) * 1988-05-24 1989-11-30 Micron Technology, Inc. Alpha shielded tisi2 local interconnects
US5053349A (en) * 1988-06-16 1991-10-01 Kabushiki Kaisha Toshiba Method for interconnecting semiconductor devices
US5219784A (en) * 1990-04-02 1993-06-15 National Semiconductor Corporation Spacer formation in a bicmos device
US5107321A (en) * 1990-04-02 1992-04-21 National Semiconductor Corporation Interconnect method for semiconductor devices
US5231042A (en) * 1990-04-02 1993-07-27 National Semiconductor Corporation Formation of silicide contacts using a sidewall oxide process
US5254874A (en) * 1990-05-02 1993-10-19 Quality Semiconductor Inc. High density local interconnect in a semiconductor circuit using metal silicide
US5223456A (en) * 1990-05-02 1993-06-29 Quality Semiconductor Inc. High density local interconnect in an integrated circit using metal silicide
JP2757927B2 (ja) * 1990-06-28 1998-05-25 インターナショナル・ビジネス・マシーンズ・コーポレイション 半導体基板上の隔置されたシリコン領域の相互接続方法
EP0463373A3 (en) * 1990-06-29 1992-03-25 Texas Instruments Incorporated Local interconnect using a material comprising tungsten
US5124280A (en) * 1991-01-31 1992-06-23 Sgs-Thomson Microelectronics, Inc. Local interconnect for integrated circuits
JPH0520771A (ja) * 1991-07-11 1993-01-29 Mitsubishi Electric Corp アレイ形デイスク装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4128670A (en) * 1977-11-11 1978-12-05 International Business Machines Corporation Fabrication method for integrated circuits with polysilicon lines having low sheet resistance
DE2815605C3 (de) * 1978-04-11 1981-04-16 Siemens AG, 1000 Berlin und 8000 München Halbleiterspeicher mit Ansteuerleitungen hoher Leitfähigkeit
US4276557A (en) * 1978-12-29 1981-06-30 Bell Telephone Laboratories, Incorporated Integrated semiconductor circuit structure and method for making it
NL186352C (nl) * 1980-08-27 1990-11-01 Philips Nv Werkwijze ter vervaardiging van een halfgeleiderinrichting.
JPS5780739A (en) * 1980-11-07 1982-05-20 Hitachi Ltd Semiconductor integrated circuit device and manufacture thereof

Also Published As

Publication number Publication date
GB2151847B (en) 1987-11-25
GB8431761D0 (en) 1985-01-30
JPS60134466A (ja) 1985-07-17
KR850005138A (ko) 1985-08-21
GB2151847A (en) 1985-07-24

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